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Molecular phosphorus ion source for semiconductor technology

Review of scientific instruments, 2012-02, Vol.83 (2), p.02B311-02B311-3

2012

Volltextzugriff (PDF)

Deposition of tungsten disilicide films by DC magnetron sputtering at ultra-low operating pressure

Surface & coatings technology, 2021-09, Vol.422, p.127501, Article 127501

2021

Volltextzugriff (PDF)

Self-heated hollow cathode discharge system for charged particle sources and plasma generators

Review of scientific instruments, 2010-02, Vol.81 (2), p.02B305-02B305-3

2010

Volltextzugriff (PDF)

Plasma source based on ring-shaped anode layer thruster for a bipolar electron-optical system

Journal of physics. Conference series, 2019-11, Vol.1393 (1), p.12039

2019

Volltextzugriff (PDF)

Low-Current Discharge in a Flow of Atmospheric-Pressure Argon Under the Formation of Metal Atoms: Electric and Optical Characteristics

Russian physics journal, 2023-03, Vol.65 (11), p.1804-1811

2023

Volltextzugriff (PDF)

Planar Magnetron with Heated Boron Target for In Situ Investigation of Boron Film Deposition

Russian physics journal, 2023-12, Vol.66 (10), p.1108-1113

2023

Volltextzugriff (PDF)

Generation of atmospheric pressure plasma in molecular gas flows

Journal of physics. Conference series, 2019-11, Vol.1393 (1), p.12052

2019

Volltextzugriff (PDF)

Modification of the Material Surface by Boron Ions Based on Vacuum Arc Discharge Systems and a Planar Magnetron

Russian physics journal, 2021-02, Vol.63 (10), p.1820-1828

2021

Volltextzugriff (PDF)

Effect of the Enhanced Breakdown Strength in Plasma-Filled Optical System of Electron Beam Formation

Russian physics journal, 2018-01, Vol.60 (9), p.1515-1519

2018

Volltextzugriff (PDF)

Electrostatic plasma lens for focusing negatively charged particle beams

Review of scientific instruments, 2012-02, Vol.83 (2), p.02B723-02B723-3

2012

Volltextzugriff (PDF)

Generation of High Charge State Metal Ions in an Arc Plasma

Russian physics journal, 2017-12, Vol.60 (8), p.1392-1399

2017

Volltextzugriff (PDF)

High-energy metal ion implantation for reduction of surface resistivity of alumina ceramic

Review of scientific instruments, 2012-02, Vol.83 (2), p.02B908-02B908-3

2012

Volltextzugriff (PDF)

Boron ion source based on planar magnetron discharge in self-sputtering mode

Review of scientific instruments, 2010-02, Vol.81 (2), p.02B303-02B303-3

2010

Volltextzugriff (PDF)

Positive-Space-Charge Lens for Focusing and Manipulating High-Current Beams of Negatively Charged Particles

IEEE transactions on plasma science, 2011-06, Vol.39 (6), p.1408-1411

2011

Volltextzugriff (PDF)

Experimental comparison of time-of-flight mass analysis with magnetic mass analysis

Review of scientific instruments, 2008-02, Vol.79 (2), p.02B701-02B701-3

2008

Volltextzugriff (PDF)

Side extraction duoPIGatron-type ion source

Review of scientific instruments, 2008-02, Vol.79 (2), p.02B307-02B307-3

2008

Volltextzugriff (PDF)

Bernas ion source discharge simulation

Review of scientific instruments, 2008-02, Vol.79 (2), p.02B313-02B313-3

2008

Volltextzugriff (PDF)

Decaborane beam from ITEP Bernas ion source

Review of scientific instruments, 2006-03, Vol.77 (3), p.03C102-03C102-3

2006

Volltextzugriff (PDF)

Nanosecond high current and high repetition rate electron source

IEEE transactions on plasma science, 1999-08, Vol.27 (4), p.1055-1059

1999

Volltextzugriff (PDF)

Electron beam generation in a diode with a gaseous plasma electron source II: Plasma source based on a hollow anode ignited by a hollow-cathode source

Journal of applied physics, 2003-07, Vol.94 (1), p.55-61

2003

Volltextzugriff (PDF)

Status of ITEP decaborane ion source program

Review of scientific instruments, 2008-02, Vol.79 (2), p.02C501-02C501-4

2008

Volltextzugriff (PDF)

Ion Source of Pure Single Charged Boron Based on Planar Magnetron Discharge in Self-Sputtering Mode

AIP conference proceedings, 2010, Vol.1321 (1)

2010

Volltextzugriff (PDF)

Ion sources for energy extremes of ion implantation (invited)

Review of scientific instruments, 2008-02, Vol.79 (2), p.02C507-02C507-5

2008

Volltextzugriff (PDF)

Plasma Source for Bipolar Electron-Optical System

Russian physics journal, 2019-11, Vol.62 (7), p.1306-1311

2019

Volltextzugriff (PDF)

Molecular Ion Beam Transportation for Low Energy Ion Implantation

AIP conference proceedings, 2010-01, Vol.1321 (1)

2010

Volltextzugriff (PDF)

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Molecular phosphorus ion source for semiconductor technology

Deposition of tungsten disilicide films by DC magnetron sputtering at ultra-low operating pressure

Self-heated hollow cathode discharge system for charged particle sources and plasma generators

Plasma source based on ring-shaped anode layer thruster for a bipolar electron-optical system

Low-Current Discharge in a Flow of Atmospheric-Pressure Argon Under the Formation of Metal Atoms: Electric and Optical Characteristics

Planar Magnetron with Heated Boron Target for In Situ Investigation of Boron Film Deposition

Generation of atmospheric pressure plasma in molecular gas flows

Modification of the Material Surface by Boron Ions Based on Vacuum Arc Discharge Systems and a Planar Magnetron

Effect of the Enhanced Breakdown Strength in Plasma-Filled Optical System of Electron Beam Formation

Electrostatic plasma lens for focusing negatively charged particle beams

Generation of High Charge State Metal Ions in an Arc Plasma

High-energy metal ion implantation for reduction of surface resistivity of alumina ceramic

Boron ion source based on planar magnetron discharge in self-sputtering mode

Positive-Space-Charge Lens for Focusing and Manipulating High-Current Beams of Negatively Charged Particles

Experimental comparison of time-of-flight mass analysis with magnetic mass analysis

Side extraction duoPIGatron-type ion source

Bernas ion source discharge simulation

Decaborane beam from ITEP Bernas ion source

Nanosecond high current and high repetition rate electron source

Electron beam generation in a diode with a gaseous plasma electron source II: Plasma source based on a hollow anode ignited by a hollow-cathode source

Status of ITEP decaborane ion source program

Ion Source of Pure Single Charged Boron Based on Planar Magnetron Discharge in Self-Sputtering Mode

Ion sources for energy extremes of ion implantation (invited)

Plasma Source for Bipolar Electron-Optical System

Molecular Ion Beam Transportation for Low Energy Ion Implantation

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