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Physics and technology of magnetron sputtering discharges

Plasma sources science & technology, 2020-11, Vol.29 (11), p.113001

Gudmundsson, J T

2020

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A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons

Plasma sources science & technology, 2017-11, Vol.26 (12), p.125003

2017

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Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputtering

Journal of physics. D, Applied physics, 2017-11, Vol.50 (50), p.505302

2017

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The role of surface quenching of the singlet delta molecule in a capacitively coupled oxygen discharge

Plasma sources science & technology, 2018-07, Vol.27 (7), p.74002

2018

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Oxygen discharges diluted with argon: dissociation processes

Plasma sources science & technology, 2007-05, Vol.16 (2), p.399-412

2007

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A benchmark study of a capacitively coupled oxygen discharge of the oopd1 particle-in-cell Monte Carlo code

Plasma sources science & technology, 2013-06, Vol.22 (3), p.35011-1-11

2013

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Recombination and detachment in oxygen discharges: the role of metastable oxygen molecules

Journal of physics. D, Applied physics, 2004-08, Vol.37 (15), p.2073-2081

Gudmundsson, J T

2004

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Low pressure hydrogen discharges diluted with argon explored using a global model

Plasma sources science & technology, 2010-12, Vol.19 (6), p.065008

2010

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The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge

Thin solid films, 2006-12, Vol.515 (4), p.1522-1526

2006

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Rutile TiO2 thin films grown by reactive high power impulse magnetron sputtering

Thin solid films, 2013-10, Vol.545, p.445-450

2013

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A global (volume averaged) model of a nitrogen discharge: I. Steady state

Plasma sources science & technology, 2009-11, Vol.18 (4), p.045001-045001 (15)

2009

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A global (volume averaged) model of a chlorine discharge

Plasma sources science & technology, 2010-02, Vol.19 (1), p.015001-015001 (15)

2010

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Morphology of TiN thin films grown on SiO2 by reactive high power impulse magnetron sputtering

Thin solid films, 2011-12, Vol.520 (5), p.1621-1624

2011

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An ionization region model for high-power impulse magnetron sputtering discharges

Plasma sources science & technology, 2011-12, Vol.20 (6), p.065007-1-10

2011

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On the effect of the electron energy distribution on the plasma parameters of an argon discharge: a global (volume-averaged) model study

Plasma sources science & technology, 2001-02, Vol.10 (1), p.76-81

Gudmundsson, J T

2001

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Ionization mechanism in the high power impulse magnetron sputtering (HiPIMS) discharge

Journal of physics. Conference series, 2008-03, Vol.100 (8), p.082013

Gudmundsson, J T

2008

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On the electron energy in the high power impulse magnetron sputtering discharge

Journal of applied physics, 2009-06, Vol.105 (12), p.123302-123302-3

2009

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Electronegativity of low-pressure high-density oxygen discharges

Journal of physics. D, Applied physics, 2001-04, Vol.34 (7), p.1100-1109

2001

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Growth and in-situ electrical characterization of ultrathin epitaxial TiN films on MgO

Thin solid films, 2011-07, Vol.519 (18), p.5861-5867

2011

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Tailored voltage waveforms applied to a capacitively coupled chlorine discharge

Plasma sources science & technology, 2020-08, Vol.29 (8), p.84004

2020

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On the influence of electrode surfaces on the plasma chemistry of a capacitive chlorine discharge

Plasma sources science & technology, 2024-06, Vol.33 (6)

2024

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Electron heating mode transitions in a low pressure capacitively coupled oxygen discharge

Plasma sources science & technology, 2019-04, Vol.28 (4), p.45012

2019

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Electron power absorption in radio frequency driven capacitively coupled chlorine discharge

Plasma sources science & technology, 2021-06, Vol.30 (6), p.65009

2021

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Plasma dynamics in a highly ionized pulsed magnetron discharge

Plasma sources science & technology, 2005-08, Vol.14 (3), p.525-531

2005

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On reactive high power impulse magnetron sputtering

Plasma physics and controlled fusion, 2016-01, Vol.58 (1), p.14002-8

Gudmundsson, J T

2016

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Physics and technology of magnetron sputtering discharges

A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons

Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputtering

The role of surface quenching of the singlet delta molecule in a capacitively coupled oxygen discharge

Oxygen discharges diluted with argon: dissociation processes

A benchmark study of a capacitively coupled oxygen discharge of the oopd1 particle-in-cell Monte Carlo code

Recombination and detachment in oxygen discharges: the role of metastable oxygen molecules

Low pressure hydrogen discharges diluted with argon explored using a global model

The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge

Rutile TiO2 thin films grown by reactive high power impulse magnetron sputtering

A global (volume averaged) model of a nitrogen discharge: I. Steady state

A global (volume averaged) model of a chlorine discharge

Morphology of TiN thin films grown on SiO2 by reactive high power impulse magnetron sputtering

An ionization region model for high-power impulse magnetron sputtering discharges

On the effect of the electron energy distribution on the plasma parameters of an argon discharge: a global (volume-averaged) model study

Ionization mechanism in the high power impulse magnetron sputtering (HiPIMS) discharge

On the electron energy in the high power impulse magnetron sputtering discharge

Electronegativity of low-pressure high-density oxygen discharges

Growth and in-situ electrical characterization of ultrathin epitaxial TiN films on MgO

Tailored voltage waveforms applied to a capacitively coupled chlorine discharge

On the influence of electrode surfaces on the plasma chemistry of a capacitive chlorine discharge

Electron heating mode transitions in a low pressure capacitively coupled oxygen discharge

Electron power absorption in radio frequency driven capacitively coupled chlorine discharge

Plasma dynamics in a highly ionized pulsed magnetron discharge

On reactive high power impulse magnetron sputtering

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