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Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization

Langmuir, 2024-02, Vol.40 (6), p.3015-3023

2024

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Kinetics driving nanocomposite thin-film deposition in low-pressure misty plasma processes

Journal of physics. D, Applied physics, 2022-12, Vol.55 (50), p.505303

2022

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Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source

Scientific reports, 2020-12, Vol.10 (1), p.21952-21952, Article 21952

2020

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TEM analysis of photocatalytic TiO2 thin films deposited on polymer substrates by low-temperature ICP-PECVD

Applied surface science, 2019-10, Vol.491, p.116-122

2019

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Topology of force networks in compressed granular media

Europhysics letters, 2012-03, Vol.97 (5), p.54001

2012

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TiO2-SiO2 mixed oxide deposited by low pressure PECVD: Insights on optical and nanoscale electrical properties

Applied surface science, 2021-03, Vol.541, p.148510, Article 148510

2021

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Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD

Applied surface science, 2019-02, Vol.466, p.63-69

2019

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Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry

Journal of physics. D, Applied physics, 2021-11, Vol.54 (44)

2021

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Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect

Journal of physics. D, Applied physics, 2013-02, Vol.46 (6), p.65308-1-7

2013

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Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method

Nano express, 2024-03, Vol.5 (1), p.015010

2024

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Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma

Thin solid films, 2015-08, Vol.589, p.783-791

2015

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In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition

Applied surface science, 2013-10, Vol.283, p.234-239

2013

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Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS

Surface & coatings technology, 2014-07, Vol.250, p.21-25

2014

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Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma

Thin solid films, 2012-11, Vol.522, p.366-371

2012

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Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering

Applied surface science, 2015-12, Vol.357, p.838-844

2015

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Microstructure and Photocatalytic Properties of TiO2–Reduced Graphene Oxide Nanocomposites Prepared by Solvothermal Method

Journal of electronic materials, 2018-12, Vol.47 (12), p.7372-7379

2018

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Persistence of force networks in compressed granular media

Physical review. E, Statistical, nonlinear, and soft matter physics, 2013-04, Vol.87 (4), p.042207-042207, Article 042207

2013

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Annealing and biasing effects on the structural and optical properties of PECVD-grown TiO2 films from TTIP/O2 plasma

Journal of materials science. Materials in electronics, 2018-08, Vol.29 (15), p.13254-13264

2018

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Structural and dielectric characterization of sputtered Tantalum Titanium Oxide thin films for high temperature capacitor applications

Thin solid films, 2016-05, Vol.606, p.127-132

2016

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Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor

Vacuum, 2016-09, Vol.131, p.231-239

2016

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Scaling properties of force networks for compressed particulate systems

Physical review. E, 2016-04, Vol.93 (4), p.042903-042903, Article 042903

2016

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Effect of surface preparation and interfacial layer on the quality of SiO2/GaN interfaces

Journal of applied physics, 2011-04, Vol.109 (8)

2011

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A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor

Thin solid films, 2000-01, Vol.359 (2), p.188-196

2000

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Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas

Thin solid films, 2006-08, Vol.514 (1), p.45-51

2006

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Dielectric relaxation study of amorphous TiTaO thin films in a large operating temperature range

Journal of applied physics, 2012-11, Vol.112 (9)

2012

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Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization

Kinetics driving nanocomposite thin-film deposition in low-pressure misty plasma processes

Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source

TEM analysis of photocatalytic TiO2 thin films deposited on polymer substrates by low-temperature ICP-PECVD

Topology of force networks in compressed granular media

TiO2-SiO2 mixed oxide deposited by low pressure PECVD: Insights on optical and nanoscale electrical properties

Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD

Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry

Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect

Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method

Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma

In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition

Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS

Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma

Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering

Microstructure and Photocatalytic Properties of TiO2–Reduced Graphene Oxide Nanocomposites Prepared by Solvothermal Method

Persistence of force networks in compressed granular media

Annealing and biasing effects on the structural and optical properties of PECVD-grown TiO2 films from TTIP/O2 plasma

Structural and dielectric characterization of sputtered Tantalum Titanium Oxide thin films for high temperature capacitor applications

Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor

Scaling properties of force networks for compressed particulate systems

Effect of surface preparation and interfacial layer on the quality of SiO2/GaN interfaces

A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor

Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas

Dielectric relaxation study of amorphous TiTaO thin films in a large operating temperature range

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