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Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2008-09, Vol.26 (5), p.1732-1739

2008

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PIE-scope, integrated cryo-correlative light and FIB/SEM microscopy

Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating

Axilenses: Refractive micro-optical elements with arbitrary exponential profiles

Ultra-high resolution zone-doubled diffractive X-ray optics for the multi-keV regime

High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating

High Aspect Ratio Plasmonic Nanostructures for Sensing Applications

Assembly and Imaging set up of PIE-Scope

Fabrication of glass microlenses using focused Xe beam

Ultradeep microaxicons in lithium niobate by focused Xe ion beam milling

Refractive micro-lenses and micro-axicons in single-crystal lithium niobate

Hybrid refractive-diffractive microlenses in glass by focused Xe ion beam

Self-aligned structures by a single-step through-membrane 100-keV electron beam lithography

Hybrid refractive-diffractive axicons for Bessel-beam multiplexing and resolution improvement

Three-dimensional imaging on a chip using optofluidics light-sheet fluorescence microscopy

OpenFIBSEM: A universal API for FIBSEM control

Phase-contrast tomography at the nanoscale using hard x rays

Optimum design of aspect ratio limited x-ray zone plates

XMEMS: Dynamic Diffraction Gratings by MEMS Technology for X-ray Imaging Applications

Wettability and compositional analysis of hydroxyapatite films modified by low and high energy ion irradiation

Democratising in situ structural biology: when a field becomes a tool

3D Nanostructuring of hydrogen silsesquioxane resist by 100 keV electron beam lithography

Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100 keV electron beam lithography

High aspect ratio nanostructuring by high energy electrons and electroplating

Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication

Programmable proximity aperture lithography with MeV ion beams

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