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Recent advances in non-chemically amplified photoresists for next generation IC technology

RSC advances, 2016-01, Vol.6 (78), p.74462-74481

2016

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Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications

ACS applied materials & interfaces, 2017-01, Vol.9 (1), p.17-21

2017

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Design, development, EUVL applications and nano mechanical properties of a new HfO2 based hybrid non-chemically amplified resist

RSC advances, 2016-01, Vol.6 (71), p.67143-67149

2016

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Biomedical Nanostructures

1. Aufl., 2007

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Enhanced mechanical properties of the high-resolution EUVL patterns of hybrid photoresists containing hexafluoroantimonate

Microelectronic engineering, 2018-07, Vol.194, p.100-108

2018

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Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning

ACS applied electronic materials, 2021-05, Vol.3 (5), p.1996-2004

2021

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Ferrocene Bearing Non-ionic Poly-aryl Tosylates: Synthesis, Characterization and Electron Beam Lithography Applications

Journal of Photopolymer Science and Technology, 2018/12/15, Vol.31(6), pp.669-678

2018

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Engineering Multifunctionality in Hybrid Polyoxometalates: Aromatic Sulfonium Octamolybdates as Excellent Photochromic Materials and Self-Separating Catalysts for Epoxidation

Inorganic chemistry, 2017-09, Vol.56 (17), p.10325-10336

2017

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Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography

ACS applied materials & interfaces, 2020-04, Vol.12 (17), p.19616-19624

2020

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New Anionic Photoacid Generator Bound Polymer Resists for EUV Lithography

Macromolecules, 2007-11, Vol.40 (23), p.8220-8224

2007

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A hybrid polymeric material bearing a ferrocene-based pendant organometallic functionality: synthesis and applications in nanopatterning using EUV lithography

RSC advances, 2014-01, Vol.4 (14), p.59817-5982

2014

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Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness

AIP advances, 2017-08, Vol.7 (8), p.085314-085314-9

2017

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Co and terpolymer reactivity ratios of chemically amplified resists

Polymer (Guilford), 2017-06, Vol.118, p.201-214

2017

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Aromatic Sulfonium Polyoxomolybdates: Solid-State Photochromic Materials with Tunable Properties

Chemistry : a European journal, 2015-12, Vol.21 (51), p.18557-18562

2015

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Organotin bearing polymeric resists for electron beam lithography

Microelectronic engineering, 2022-05, Vol.260, p.111795, Article 111795

2022

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Influence of the Chitosan Surface Profile on the Nucleation and Growth of Calcium Carbonate Films

Langmuir, 1998-11, Vol.14 (23), p.6761-6766

1998

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EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study

Journal of photochemistry and photobiology. A, Chemistry., 2018-09, Vol.364, p.373-381

2018

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Organic-inorganic hybrid photoresists containing hexafluoroantimonate: design, synthesis and high resolution EUV lithography studies

Materials chemistry frontiers, 2017-01, Vol.1 (12), p.2613-2619

2017

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Lithography application of a novel photoresist for patterning of cells

Biomaterials, 2004-05, Vol.25 (11), p.2055-2063

2004

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New Polyoxometalates Containing Hybrid Polymers and Their Potential for Nano-Patterning

Chemistry : a European journal, 2015-01, Vol.21 (5), p.2250-2258

2015

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Novel Anionic Photoacid Generators (PAGs) and Corresponding PAG Bound Polymers

Macromolecular rapid communications., 2006-09, Vol.27 (18), p.1590-1595

2006

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Radiation-Sensitive Novel Polymeric Resist Materials: Iterative Synthesis and Their EUV Fragmentation Studies

ACS applied materials & interfaces, 2014-03, Vol.6 (6), p.4223-4232

2014

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Polarization Dependence in the Carbon K‑Edge Photofragmentation of MAPDST Photoresist: An Experimental and Theoretical Study

Journal of physical chemistry. C, 2018-12, Vol.122 (50), p.28619-28628

2018

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Organotin in Nonchemically Amplified Polymeric Hybrid Resist Imparts Better Resolution with Sensitivity for Next-Generation Lithography

ACS applied polymer materials, 2020-05, Vol.2 (5), p.1790-1799

2020

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Resists for Helium Ion Beam Lithography: Recent Advances

ACS applied electronic materials, 2020-12, Vol.2 (12), p.3805-3817

2020

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Recent advances in non-chemically amplified photoresists for next generation IC technology

Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications

Design, development, EUVL applications and nano mechanical properties of a new HfO2 based hybrid non-chemically amplified resist

Biomedical Nanostructures

Enhanced mechanical properties of the high-resolution EUVL patterns of hybrid photoresists containing hexafluoroantimonate

Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning

Ferrocene Bearing Non-ionic Poly-aryl Tosylates: Synthesis, Characterization and Electron Beam Lithography Applications

Engineering Multifunctionality in Hybrid Polyoxometalates: Aromatic Sulfonium Octamolybdates as Excellent Photochromic Materials and Self-Separating Catalysts for Epoxidation

Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography

New Anionic Photoacid Generator Bound Polymer Resists for EUV Lithography

A hybrid polymeric material bearing a ferrocene-based pendant organometallic functionality: synthesis and applications in nanopatterning using EUV lithography

Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness

Co and terpolymer reactivity ratios of chemically amplified resists

Aromatic Sulfonium Polyoxomolybdates: Solid-State Photochromic Materials with Tunable Properties

Organotin bearing polymeric resists for electron beam lithography

Influence of the Chitosan Surface Profile on the Nucleation and Growth of Calcium Carbonate Films

EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study

Organic-inorganic hybrid photoresists containing hexafluoroantimonate: design, synthesis and high resolution EUV lithography studies

Lithography application of a novel photoresist for patterning of cells

New Polyoxometalates Containing Hybrid Polymers and Their Potential for Nano-Patterning

Novel Anionic Photoacid Generators (PAGs) and Corresponding PAG Bound Polymers

Radiation-Sensitive Novel Polymeric Resist Materials: Iterative Synthesis and Their EUV Fragmentation Studies

Polarization Dependence in the Carbon K‑Edge Photofragmentation of MAPDST Photoresist: An Experimental and Theoretical Study

Organotin in Nonchemically Amplified Polymeric Hybrid Resist Imparts Better Resolution with Sensitivity for Next-Generation Lithography

Resists for Helium Ion Beam Lithography: Recent Advances

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