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Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputtering

Surface & coatings technology, 2004-03, Vol.180, p.538-543

2004

Volltextzugriff (PDF)

Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering

Surface & coatings technology, 2003-09, Vol.174-175, p.774-778

2003

Volltextzugriff (PDF)

Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings

Thin solid films, 2006-04, Vol.502 (1), p.29-33

2006

Volltextzugriff (PDF)

Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering

Surface & coatings technology, 2004-03, Vol.180, p.616-620

2004

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High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications

Thin solid films, 2003-12, Vol.445 (2), p.251-258

2003

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Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering

Surface & coatings technology, 1996-07, Vol.82 (1-2), p.169-175

1996

Volltextzugriff (PDF)

Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering

Surface & coatings technology, 2000-10, Vol.132 (2), p.244-250

2000

Volltextzugriff (PDF)

Pulsed magnetron sputter technology

Surface & coatings technology, 1993-12, Vol.61 (1), p.331-337

1993

Volltextzugriff (PDF)

The deposition of hard crystalline Al2O3 layers by means of bipolar pulsed magnetron sputtering

Surface & coatings technology, 1996-12, Vol.86-87 (1-3), p.657-663

1996

Volltextzugriff (PDF)

A versatile coating tool for reactive in-line sputtering in different pulse modes

Surface & coatings technology, 2001-07, Vol.142, p.628-634

2001

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Adhesion behavior of PVD coatings on ECR plasma and ion beam treated polymer films

Thin solid films, 1996-06, Vol.279 (1), p.169-173

1996

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Different pulse techniques for stationary reactive sputtering with double ring magnetron

Surface & coatings technology, 1999-11, Vol.120, p.723-727

1999

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The double ring magnetron process module —a tool for stationary deposition of metals, insulators and reactive sputtered compounds

Surface & coatings technology, 1997-03, Vol.90 (1), p.75-81

1997

Volltextzugriff (PDF)

Ensuring long-term stability of process and film parameters during target lifetime in reactive magnetron sputtering

Surface & coatings technology, 2002-02, Vol.150 (1), p.88-94

2002

Volltextzugriff (PDF)

In situ-force measurement for the determination of the evaporation rate with high-rate electron beam evaporation

Surface & coatings technology, 1998, Vol.98 (1), p.944-947

1998

Volltextzugriff (PDF)

Plasma-activated electron beam deposition with diffuse cathodic vacuum arc discharge (SAD): a technique for coating strip steel

Surface & coatings technology, 1996-12, Vol.86 (1-3), p.769-775

1996

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Plasma-activated high rate electron beam evaporation using a spotless cathodic arc

Surface & coatings technology, 1994-12, Vol.68, p.799-803

1994

Volltextzugriff (PDF)

Electron beam-PVD for enhanced surface properties on metallic strips and sheets

Surface & coatings technology, 1997-10, Vol.94 (1-3), p.663-668

1997

Volltextzugriff (PDF)

Rod cathode arc-activated deposition (RAD) — a new plasma-activated electron beam PVD process

Surface & coatings technology, 1999-11, Vol.120, p.718-722

1999

Volltextzugriff (PDF)

Application of the magnetron activated deposition process (MAD-process) to coat polymer films with alumina in web coaters

Surface & coatings technology, 1996-12, Vol.86 (1-3), p.776-782

1996

Volltextzugriff (PDF)

Structure and properties of Al2O3 layers deposited by plasma activated electron beam evaporation

Surface & coatings technology, 2002-03, Vol.151-152, p.14-20

2002

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The magnetron-activated deposition process

Surface & coatings technology, 1995-12, Vol.76, p.763-769

1995

Volltextzugriff (PDF)

Large-area pretreatment for physical vapor deposition

Surface & coatings technology, 1995-12, Vol.76, p.725-730

1995

Volltextzugriff (PDF)

Plasma-activated high-rate electron-beam evaporation for coating metal strips

Materials science & engineering. A, Structural materials : properties, microstructure and processing, 1993-05, Vol.163 (2), p.149-156

1993

Volltextzugriff (PDF)

Transformer-free semiconductor switches for the energization of a pulsed PVD plasma

Surface & coatings technology, 1998, Vol.98 (1), p.1240-1244

1998

Volltextzugriff (PDF)

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Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputtering

Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering

Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings

Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering

High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications

Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering

Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering

Pulsed magnetron sputter technology

The deposition of hard crystalline Al2O3 layers by means of bipolar pulsed magnetron sputtering

A versatile coating tool for reactive in-line sputtering in different pulse modes

Adhesion behavior of PVD coatings on ECR plasma and ion beam treated polymer films

Different pulse techniques for stationary reactive sputtering with double ring magnetron

The double ring magnetron process module —a tool for stationary deposition of metals, insulators and reactive sputtered compounds

Ensuring long-term stability of process and film parameters during target lifetime in reactive magnetron sputtering

In situ-force measurement for the determination of the evaporation rate with high-rate electron beam evaporation

Plasma-activated electron beam deposition with diffuse cathodic vacuum arc discharge (SAD): a technique for coating strip steel

Plasma-activated high rate electron beam evaporation using a spotless cathodic arc

Electron beam-PVD for enhanced surface properties on metallic strips and sheets

Rod cathode arc-activated deposition (RAD) — a new plasma-activated electron beam PVD process

Application of the magnetron activated deposition process (MAD-process) to coat polymer films with alumina in web coaters

Structure and properties of Al2O3 layers deposited by plasma activated electron beam evaporation

The magnetron-activated deposition process

Large-area pretreatment for physical vapor deposition

Plasma-activated high-rate electron-beam evaporation for coating metal strips

Transformer-free semiconductor switches for the energization of a pulsed PVD plasma

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