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Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions

ACS nano, 2016-05, Vol.10 (5), p.4889-4894

2016

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Thermal Atomic Layer Etching of Al2O3, HfO2, and ZrO2 Using Sequential Hydrogen Fluoride and Dimethylaluminum Chloride Exposures

Journal of physical chemistry. C, 2019-08, Vol.123 (30), p.18455-18466

2019

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Thermal Atomic Layer Etching of ZnO by a “Conversion-Etch” Mechanism Using Sequential Exposures of Hydrogen Fluoride and Trimethylaluminum

Chemistry of materials, 2017-02, Vol.29 (3), p.1183-1191

2017

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Selectivity in Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions

Chemistry of materials, 2016-11, Vol.28 (21), p.7657-7665

2016

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WO3 and W Thermal Atomic Layer Etching Using “Conversion-Fluorination” and “Oxidation-Conversion-Fluorination” Mechanisms

ACS applied materials & interfaces, 2017-10, Vol.9 (39), p.34435-34447

2017

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Trimethylaluminum as the Metal Precursor for the Atomic Layer Etching of Al2O3 Using Sequential, Self-Limiting Thermal Reactions

Chemistry of materials, 2016-05, Vol.28 (9), p.2994-3003

2016

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Thermal Atomic Layer Etching of SiO2 by a “Conversion-Etch” Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride

ACS applied materials & interfaces, 2017-03, Vol.9 (11), p.10296-10307

2017

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Surface Chemistry for Molecular Layer Deposition of Organic and Hybrid Organic−Inorganic Polymers

Accounts of chemical research, 2009-04, Vol.42 (4), p.498-508

2009

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Effect of Al2O3 Coating on Stabilizing LiNi0.4Mn0.4Co0.2O2 Cathodes

Chemistry of materials, 2015-09, Vol.27 (17), p.6146-6154

2015

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Competition between Al2O3 atomic layer etching and AlF3 atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride

The Journal of chemical physics, 2017-02, Vol.146 (5), p.052819-052819

2017

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Mechanisms of Thermal Atomic Layer Etching

Accounts of chemical research, 2020-06, Vol.53 (6), p.1151-1160

George, Steven M.

2020

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Tin Monosulfide Thin Films Grown by Atomic Layer Deposition Using Tin 2,4-Pentanedionate and Hydrogen Sulfide

Journal of physical chemistry. C, 2010-10, Vol.114 (41), p.17597-17603

2010

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Atomic Layer Deposition: An Overview

Chemical reviews, 2010-01, Vol.110 (1), p.111-131

George, Steven M

2010

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Fe3O4 Nanoparticles Confined in Mesocellular Carbon Foam for High Performance Anode Materials for Lithium-Ion Batteries

Advanced functional materials, 2011-07, Vol.21 (13), p.2430-2438

2011

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Progress and future directions for atomic layer deposition and ALD-based chemistry

MRS bulletin, 2011-11, Vol.36 (11), p.865-871

2011

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Reversible High-Capacity Si Nanocomposite Anodes for Lithium-ion Batteries Enabled by Molecular Layer Deposition

Advanced materials (Weinheim), 2014-03, Vol.26 (10), p.1596-1601

2014

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Ultrathin Direct Atomic Layer Deposition on Composite Electrodes for Highly Durable and Safe Li-Ion Batteries

Advanced materials (Weinheim), 2010-05, Vol.22 (19), p.2172-2176

2010

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Pseudocapacitance of Amorphous TiO2 Thin Films Anchored to Graphene and Carbon Nanotubes Using Atomic Layer Deposition

Journal of physical chemistry. C, 2013-11, Vol.117 (44), p.22497-22508

2013

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Surface-Coating Regulated Lithiation Kinetics and Degradation in Silicon Nanowires for Lithium Ion Battery

ACS nano, 2015-05, Vol.9 (5), p.5559-5566

2015

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Electrochemical effects of ALD surface modification on combustion synthesized LiNi1/3Mn1/3Co1/3O2 as a layered-cathode material

Journal of power sources, 2011-03, Vol.196 (6), p.3317-3324

2011

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Unexpected Improved Performance of ALD Coated LiCoO2/Graphite Li-Ion Batteries

Advanced energy materials, 2013-02, Vol.3 (2), p.213-219

2013

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Ultralow Thermal Conductivity of Atomic/Molecular Layer-Deposited Hybrid Organic–Inorganic Zincone Thin Films

Nano letters, 2013-11, Vol.13 (11), p.5594-5599

2013

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Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3 and Rapid SiO2 Atomic Layer Deposition

Journal of physical chemistry. C, 2008-03, Vol.112 (12), p.4573-4580

2008

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Ultrathin Oxide Films by Atomic Layer Deposition on Graphene

Nano letters, 2012-07, Vol.12 (7), p.3706-3710

2012

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Area-Selective Atomic Layer Deposition of ZnO on Si\SiO2 Modified with Tris(dimethylamino)methylsilane

Materials, 2023-06, Vol.16 (13), p.4688

2023

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