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2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA), 2016, p.1-2
2016
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IEEE transactions on electron devices, 2008-05, Vol.55 (5), p.1259-1264
- NOORI, Atif M
- BALSEANU, Mihaela
- LAUWERS, Anne
- LEE, Wen-Chin
- JIANXIN LEI
- MANDREKAR, Tushar
- SCHREUTELKAMP, Robert
- SHAH, Kavita
- THOMPSON, Scott E
- VERHEYEN, Peter
- WANG, Ching-Ya
- XIA, Li-Qun
- BOELEN, Pieter
- ARGHAVANI, Reza
- COCKBUM, Andrew
- DEMUYNCK, Steven
- FELCH, Susan
- GANDIKOTA, Srinivas
- JERRY GELATOS, A
- KHANDELWAL, Amit
- KITTL, Jorge A
2008
Link zum Volltext
2009 IEEE International Electron Devices Meeting (IEDM), 2009, p.1-4
- Veloso, A.
- Demuynck, S.
- Ercken, M.
- Goethals, A.M.
- Locorotondo, S.
- Lazzarino, F.
- Altamirano, E.
- Huffman, C.
- De Keersgieter, A.
- Brus, S.
- Demand, M.
- Struyf, H.
- De Backer, J.
- Hermans, J.
- Delvaux, C.
- Baudemprez, B.
- Vandeweyer, T.
- Van Roey, F.
- Baerts, C.
- Goossens, D.
- Dekkers, H.
- Ong, P.
- Heylen, N.
- Kellens, K.
- Volders, H.
- Hikavyy, A.
- Vrancken, C.
- Rakowski, M.
- Verhaegen, S.
- Dusa, M.
- Romijn, L.
- Pigneret, C.
- Van Dijk, A.
- Schreutelkamp, R.
- Cockburn, A.
- Gravey, V.
- Meiling, H.
- Hultermans, B.
- Lok, S.
- Shah, K.
- Rajagopalan, R.
- Gelatos, J.
- Richard, O.
- Bender, H.
- Vandenberghe, G.
- Beyer, G.P.
- Absil, P.
- Hoffmann, T.
- Ronse, K.
- Biesemans, S.
2009
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2012 International Electron Devices Meeting, 2012, p.18.3.1-18.3.4
2012
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2014 20th International Conference on Ion Implantation Technology (IIT), 2014, p.1-3
2014
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Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA), 2014, p.1-2
2014
- Link zum Volltext
2013 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA), 2013, p.1-2
2013
- Link zum Volltext
2007 IEEE International Interconnect Technology Conferencee, 2007, p.49-51
2007
- Link zum Volltext
2008 IEEE International Electron Devices Meeting, 2008, p.1-4
- Veloso, A.
- Demuynck, S.
- Ercken, M.
- Goethals, A.M.
- Demand, M.
- de Marneffe, J.-F.
- Altamirano, E.
- De Keersgieter, A.
- Delvaux, C.
- De Backer, J.
- Brus, S.
- Hermans, J.
- Baudemprez, B.
- Van Roey, F.
- Lorusso, G.F.
- Baerts, C.
- Goossens, D.
- Vrancken, C.
- Mertens, S.
- Versluijs, J.J.
- Truffert, V.
- Huffman, C.
- Laidler, D.
- Heylen, N.
- Ong, P.
- Parvais, B.
- Rakowski, M.
- Verhaegen, S.
- Hikavyy, A.
- Meiling, H.
- Hultermans, B.
- Romijn, L.
- Pigneret, C.
- Lok, S.
- Van Dijk, A.
- Shah, K.
- Noori, A.
- Gelatos, J.
- Arghavani, R.
- Schreutelkamp, R.
- Boelen, P.
- Richard, O.
- Bender, H.
- Witters, L.
- Collaert, N.
- Rooyackers, R.
- Absil, P.
- Lauwers, A.
- Jurczak, M.
- Hoffmann, T.
- Vanhaelemeersch, S.
- Cartuyvels, R.
- Ronse, K.
- Biesemans, S.
2008
- Link zum Volltext
A low temperature CVD Al plug and interconnect process for 0.25 /spl mu/m metallization technologies
1996
- Link zum Volltext
2017 Symposium on VLSI Technology, 2017, p.T216-T217
2017
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Materials Technology Co-Optimization of Self-Aligned Gate Contact for Advanced CMOS Technology Nodes
- Pal, A.
- Ferrell, J.
- Sachid, A.
- Bazizi, E. M.
- Cui, D.
- Wang, A.
- Cogorno, M.
- Bhatnagar, A.
- Ingle, N.
- Xu, Y.
- Lei, W.
- Lei, Y.
- Gelatos, A.
- Ha, T. H.
- Kashefizadeh, K.
- Seutter, S. M.
- Sato, T. E.
- Brown, B.
- Mikhaylichenko, K.
- Lee, C.
- Fung, N.
- Xu, W.
- Kawasaki, M.
- Luu, T.
- Wang, P.
- Colombeau, B.
- Alexander, B.
- Hwang, D.
- Natarajan, S.
- Ayyagari, B.
2020
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Applied physics letters, 1993-11, Vol.63 (20), p.2842-2844
1993
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Thin solid films, 1995-06, Vol.262 (1), p.52-59
1995
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Applied physics letters, 1990-09, Vol.57 (12), p.1197-1199
1990
Link zum Volltext
2013 Symposium on VLSI Technology, 2013, p.T200-T201
2013
- Link zum Volltext
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2003-07, Vol.21 (4), p.1466-1471
2003
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IEEE transactions on electron devices, 2002-01, Vol.49 (1), p.42-47
2002
- Link zum Volltext
Applied physics letters, 1985-01, Vol.47 (4), p.412-414
1985
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Applied physics letters, 1988-08, Vol.53 (5), p.403-405
1988
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MRS bulletin, 1994-08, Vol.19 (8), p.49-54
1994
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Journal of applied physics, 1992-05, Vol.71 (10), p.5022-5032
1992
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Applied physics letters, 1990-03, Vol.56 (10), p.940-942
1990
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Journal of non-crystalline solids, 1992, Vol.141 (1-3), p.142-154
1992
Link zum Volltext
Applied physics letters, 1990-08, Vol.57 (7), p.698-700
1990
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Kollektion
Zeitschrift / Serie
- Applied Physics Letters
- Journal Of Non-Crystalline Solids
- Mrs Proceedings
- Ieee Transactions On Electron Devices
- Physical Review. B, Condensed Matter
- Thin Solid Films
- Advanced Metallization And Processing For Semiconductor Devices And Circuits - Ii
- Amorphous Silicon Technology - 1989
- Amorphous Silicon Technology - 1990
- Amorphous Silicon Technology - 1991