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Surface analysis of Nb materials for SRF cavities

Surface and interface analysis, 2011-01, Vol.43 (1-2), p.151-153

2011

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Quantification in dynamic SIMS: Current status and future needs

Applied surface science, 2008-12, Vol.255 (4), p.1364-1367

2008

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Etching characteristics of chromium thin films by an electron beam induced surface reaction

Semiconductor science and technology, 2003-04, Vol.18 (4), p.199-205

2003

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SIMS analysis of zinc oxide LED structures: quantification and analysis issues

Surface and interface analysis, 2013-01, Vol.45 (1), p.352-355

2013

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SIMS analysis of high-performance accelerator niobium

Surface and interface analysis, 2014-11, Vol.46 (S1), p.288-290

2014

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Optimization of secondary ion mass spectrometry detection limit for N in SiC

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2003-09, Vol.21 (5), p.1649-1654

2003

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Chemically enhanced focused ion beam micromachining of copper

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2001-11, Vol.19 (6), p.2539-2542

2001

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Focused Ion Beam Characterization of Bicomponent Polymer Fibers

Microscopy and microanalysis, 2010-06, Vol.16 (3), p.282-290

2010

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Channeling effects during focused-ion-beam micromachining of copper

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2000-07, Vol.18 (4), p.1061-1065

2000

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Circuit editing of copper and low‐k dielectrics in nanotechnology devices

Journal of microscopy (Oxford), 2004-06, Vol.214 (3), p.246-251

2004

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SIMS quantification of matrix and impurity species in AlxGa1-xN

Applied surface science, 2006-07, Vol.252 (19), p.7228-7231

2006

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Back side SIMS analysis of hafnium silicate

Applied surface science, 2006-07, Vol.252 (19), p.7179-7181

2006

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Improved charge neutralization method for depth profiling of bulk insulators using O 2+ primary beam on a magnetic sector SIMS instrument

Applied surface science, 2004-06, Vol.231, p.786-790

2004

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TEM and SIMS Analysis of (100), (110), and (111) Single Crystal Niobium

AIP conference proceedings, 2007, Vol.927 (1), p.72-83

2007

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Quantification of cesium surface contamination on silicon resulting from SIMS analysis

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2012-05, Vol.30 (3), p.031203-031203-5

2012

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A Wide Range of FIB Applications in a Multidisciplinary Analytical Facility

Microscopy and microanalysis, 2006-08, Vol.12 (S02), p.1328-1329

2006

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Effects of Beam and Scan Parameters on 3-Dimensional Carbon Structure Growth Using Electron Beam Induced Chemistry

Microscopy and microanalysis, 2006-08, Vol.12 (S02), p.1284-1285

2006

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Discrimination between adsorption and coprecipitation in aquatic particle standards by surface analysis techniques: lead distributions in calcium carbonates

Environmental science & technology, 1988-04, Vol.22 (4), p.463-467

1988

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Improvements in focused ion beam micromachining of interconnect materials

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2002-11, Vol.20 (6), p.2700-2704

2002

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A microcomputer based digital imaging system for ion microanalysis

Journal of microscopy (Oxford), 1985-04, Vol.138 (1), p.15-28

1985

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Secondary ion mass spectrometry characterization of anomalous behavior for low dose ion implanted phosphorus in silicon

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2010-05, Vol.28 (3), p.511-516

2010

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Model study of electron beam charge compensation for positive secondary ion mass spectrometry using a positive primary ion beam

Applied surface science, 2008-02, Vol.254 (9), p.2708-2711

2008

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Focused Ion Beam: Much More Than a Sample Preparation Tool

Microscopy and microanalysis, 2002-08, Vol.8 (S02), p.54-55

2002

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Improved understanding of an electron beam charge compensation method for magnetic sector secondary ion mass spectrometer analysis of insulators

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2007-07, Vol.25 (4), p.769-774

2007

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SIMS quantification of matrix and impurity species in Al x Ga 1− x N

Applied surface science, 2006-07, Vol.252 (19), p.7228-7231

2006

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Surface analysis of Nb materials for SRF cavities

Quantification in dynamic SIMS: Current status and future needs

Etching characteristics of chromium thin films by an electron beam induced surface reaction

SIMS analysis of zinc oxide LED structures: quantification and analysis issues

SIMS analysis of high-performance accelerator niobium

Optimization of secondary ion mass spectrometry detection limit for N in SiC

Chemically enhanced focused ion beam micromachining of copper

Focused Ion Beam Characterization of Bicomponent Polymer Fibers

Channeling effects during focused-ion-beam micromachining of copper

Circuit editing of copper and low‐k dielectrics in nanotechnology devices

SIMS quantification of matrix and impurity species in AlxGa1-xN

Back side SIMS analysis of hafnium silicate

Improved charge neutralization method for depth profiling of bulk insulators using O 2+ primary beam on a magnetic sector SIMS instrument

TEM and SIMS Analysis of (100), (110), and (111) Single Crystal Niobium

Quantification of cesium surface contamination on silicon resulting from SIMS analysis

A Wide Range of FIB Applications in a Multidisciplinary Analytical Facility

Effects of Beam and Scan Parameters on 3-Dimensional Carbon Structure Growth Using Electron Beam Induced Chemistry

Discrimination between adsorption and coprecipitation in aquatic particle standards by surface analysis techniques: lead distributions in calcium carbonates

Improvements in focused ion beam micromachining of interconnect materials

A microcomputer based digital imaging system for ion microanalysis

Secondary ion mass spectrometry characterization of anomalous behavior for low dose ion implanted phosphorus in silicon

Model study of electron beam charge compensation for positive secondary ion mass spectrometry using a positive primary ion beam

Focused Ion Beam: Much More Than a Sample Preparation Tool

Improved understanding of an electron beam charge compensation method for magnetic sector secondary ion mass spectrometer analysis of insulators

SIMS quantification of matrix and impurity species in Al x Ga 1− x N

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