UB Paderborn / Katalog / Suche / in CDI

Sortiert nach

Einfacher Volltextzugriff von (fast) überall

Installieren Sie die LibKey Nomad-Browsererweiterung und erhalten Sie von vielen Webseiten einfachen Zugriff auf lizenzierte Volltexte oder Open Access Publikationen. Mehr erfahren...

Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputtering

Surface & coatings technology, 2004-03, Vol.180, p.538-543

2004

Volltextzugriff (PDF)

Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering

Surface & coatings technology, 2003-09, Vol.174-175, p.774-778

2003

Volltextzugriff (PDF)

Reactive pulse magnetron sputtered SiOxNy coatings on polymers

Thin solid films, 2009-03, Vol.517 (10), p.3110-3114

2009

Volltextzugriff (PDF)

Effect of structure and morphology on photocatalytic properties of TiO2 layers

Surface & coatings technology, 2008-02, Vol.202 (11), p.2488-2493

2008

Volltextzugriff (PDF)

Roughness and optical losses of rugate coatings

Applied optics (2004), 2014-02, Vol.53 (4), p.A351

2014

Volltextzugriff (PDF)

Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering

Surface & coatings technology, 2004-03, Vol.180, p.616-620

2004

Volltextzugriff (PDF)

Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings

Thin solid films, 2006-04, Vol.502 (1), p.29-33

2006

Volltextzugriff (PDF)

Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.967-971

2005

Volltextzugriff (PDF)

Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems

Thin solid films, 2006-02, Vol.496 (1), p.126-130

2006

Volltextzugriff (PDF)

Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films

Thin solid films, 2003-12, Vol.445 (2), p.207-212

2003

Volltextzugriff (PDF)

Deposition of photocatalytic TiO2 layers by pulse magnetron sputtering and by plasma-activated evaporation

Vacuum, 2006-05, Vol.80 (7), p.679-683

2006

Volltextzugriff (PDF)

Multifunctional high-reflective and antireflective layer systems with easy-to-clean properties

Thin solid films, 2008-05, Vol.516 (14), p.4487-4489

2008

Volltextzugriff (PDF)

High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications

Thin solid films, 2003-12, Vol.445 (2), p.251-258

2003

Volltextzugriff (PDF)

Electrically insulating Al2O3 and SiO2 films for sensor and photovoltaic applications deposited by reactive pulse magnetron sputtering, hollow cathode arc activated deposition and magnetron-PECVD

Surface & coatings technology, 2008-08, Vol.202 (22-23), p.5680-5683

2008

Volltextzugriff (PDF)

Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering

Surface & coatings technology, 2000-10, Vol.132 (2), p.244-250

2000

Volltextzugriff (PDF)

Modeling the stability of reactive sputtering processes

Surface & coatings technology, 2001-07, Vol.142, p.192-200

2001

Volltextzugriff (PDF)

A versatile coating tool for reactive in-line sputtering in different pulse modes

Surface & coatings technology, 2001-07, Vol.142, p.628-634

2001

Volltextzugriff (PDF)

High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems

Science and technology of advanced materials, 2006-01, Vol.7 (1), p.56-61

2006

Volltextzugriff (PDF)

Different pulse techniques for stationary reactive sputtering with double ring magnetron

Surface & coatings technology, 1999-11, Vol.120, p.723-727

1999

Volltextzugriff (PDF)

Ensuring long-term stability of process and film parameters during target lifetime in reactive magnetron sputtering

Surface & coatings technology, 2002-02, Vol.150 (1), p.88-94

2002

Volltextzugriff (PDF)

Heat transfer model of dropwise condensation and experimental validation for surface with coating and groove at low pressure

Heat and mass transfer, 2016-01, Vol.52 (1), p.113-126

2016

Volltextzugriff (PDF)

High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications

Thin solid films, 2003-10

Frach, P

2003

Volltextzugriff (PDF)

The double ring magnetron process module —a tool for stationary deposition of metals, insulators and reactive sputtered compounds

Surface & coatings technology, 1997-03, Vol.90 (1), p.75-81

1997

Volltextzugriff (PDF)

Aspects and results of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputtering

Surface & coatings technology, 1993-10, Vol.59 (1-3), p.177-182

1993

Volltextzugriff (PDF)

Precision coating on an industrial scale: requirements, technologies, equipment

Nanoindustry Russia, 2015 (6), p.70-74

2015

Volltextzugriff (PDF)

1 – 25 von 65

Suche als RSS-Feed

Suchergebnisse filtern

Filter anzeigen

Nur zeigen

Geprüft (Peer-Review)
(59)
Mit Volltextzugriff
(63)

Publikationsform

Sprache

Englisch
(62)
Deutsch
(3)

Erscheinungsjahr

n.n

Menü

Weitere Dienste

Einstellungen

Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputtering

Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering

Reactive pulse magnetron sputtered SiOxNy coatings on polymers

Effect of structure and morphology on photocatalytic properties of TiO2 layers

Roughness and optical losses of rugate coatings

Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering

Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings

Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature

Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems

Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films

Deposition of photocatalytic TiO2 layers by pulse magnetron sputtering and by plasma-activated evaporation

Multifunctional high-reflective and antireflective layer systems with easy-to-clean properties

High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications

Electrically insulating Al2O3 and SiO2 films for sensor and photovoltaic applications deposited by reactive pulse magnetron sputtering, hollow cathode arc activated deposition and magnetron-PECVD

Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering

Modeling the stability of reactive sputtering processes

A versatile coating tool for reactive in-line sputtering in different pulse modes

High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems

Different pulse techniques for stationary reactive sputtering with double ring magnetron

Ensuring long-term stability of process and film parameters during target lifetime in reactive magnetron sputtering

Heat transfer model of dropwise condensation and experimental validation for surface with coating and groove at low pressure

High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications

The double ring magnetron process module —a tool for stationary deposition of metals, insulators and reactive sputtered compounds

Aspects and results of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputtering

Precision coating on an industrial scale: requirements, technologies, equipment

Suchergebnisse filtern