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Raman Spectroscopy and Electron Microscopy Studies of Ga FIB and Post-FIB Ar Ion Milling's Impact on Si TEM Specimens

Microscopy and microanalysis, 2022-08, Vol.28 (S1), p.52-53

2022

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Investigation of the Effects of Low-Energy Plasma Treatment on Amorphous Carbon and Graphene Support Films for Cryo-Electron Microscopy

Microscopy and microanalysis, 2019-08, Vol.25 (S2), p.996-997

2019

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Investigations on the Microstructure and Microanalysis of the Gas Shale Sample Prepared by SEM Ion Mill by Off-Centering the Ion Beams

Microscopy and microanalysis, 2014-08, Vol.20 (S3), p.2108-2109

2014

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Characterization of Shales by Mass Spectrometry during Ion Milling

Microscopy and microanalysis, 2014-08, Vol.20 (S3), p.1724-1725

2014

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Delayering of Microelectronic Devices Using an Adjustable Broad-Beam Ion Source

Journal of physics. Conference series, 2013-01, Vol.471 (1), p.12046-4

2013

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Low-Energy Argon Broad Ion Beam and Narrow Ion Beam Milling of In Situ Lift-Out FIB Specimens

Microscopy and microanalysis, 2018-08, Vol.24 (S1), p.862-863

2018

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Post-FIB Specimen Preparation of Atom Probe Specimens under Controlled Environments for Correlative Microscopy

Microscopy and microanalysis, 2019-08, Vol.25 (S2), p.2554-2555

2019

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Controlled Environments from Sample Preparation to Electron Microscopy Characterization

Microscopy and microanalysis, 2019-08, Vol.25 (S2), p.698-699

2019

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Sample preparation for aberration-corrected microscopy of high-quality TEM specimens of advanced integrated circuits

Microscopy and microanalysis, 2018-08, Vol.24 (S1), p.150-151

2018

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Automated Sample Preparation of Nanoscale Devices for FESEM

Microscopy and microanalysis, 2009-07, Vol.15 (S2), p.1076-1077

2009

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Automatic End-point Detection for Ar+ Milling of FIB in situ and ex situ Lift-out Specimens from Semiconductor Devices

Microscopy and microanalysis, 2018-08, Vol.24 (S1), p.854-855

2018

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Removal of Ga Implantation on FIB-prepared Atom Probe Specimens Using Small Beam and Low Energy Ar+ Milling

Microscopy and microanalysis, 2018-08, Vol.24 (S1), p.1118-1119

2018

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Nanomilling for Aberration – Corrected TEM and HAADF STEM

Microscopy and microanalysis, 2009-07, Vol.15 (S2), p.348-349

2009

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The Use of a Cold Gas Plasma for the Final Processing of Contamination-Free Tem Specimens

MRS proceedings, 1997, Vol.480, p.225-234, Article 225

1997

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Recent Developments in Automated Sample Preparation for FESEM

Microscopy and microanalysis, 2003-08, Vol.9 (S02), p.804-805

2003

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In-Plane Magnetic Field Lorentz Stage for Use in a TEM/STEM

Microscopy and microanalysis, 2004-08, Vol.10 (S02), p.522-523

2004

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Aberration correction: Some Advantages and Alternatives

Microscopy and microanalysis, 2004-08, Vol.10 (S03), p.22-23

2004

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Applications of Plasma Cleaning for Electron Microscopy of Semiconducting Materials

MRS proceedings, 1998, Vol.523, Article 31

1998

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Automated Sample Preparation for Environmentally Reactive Materials Systems

Microscopy and microanalysis, 2010-07, Vol.16 (S2), p.684-685

2010

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Study of FIB Damage in Carbonaceous Materials using XANES

Microscopy and microanalysis, 2008-08, Vol.14 (S2), p.1008-1009

2008

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Plasma Cleaning and Its Applications for Electron Microscopy

Microscopy and microanalysis, 1999-03, Vol.5 (2), p.126-135

1999

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Towards Low-Damage TEM Sample Preparation of Carbonaceous Materials in the Focused Ion Beam

Microscopy and microanalysis, 2009-07, Vol.15 (S2), p.342-343

2009

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Automated Sample Preparation of Low-k Dielectrics for FESEM

Microscopy and microanalysis, 2005-08, Vol.11 (S02), p.2108-2109

2005

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An Ultra-High-Tilt Two-Contact Electrical Biasing Specimen Holder for Electron Holography and Electron Tomography of Semiconductor Devices

Microscopy and microanalysis, 2004-08, Vol.10 (S02), p.1012-1013

2004

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Raising the Standard of Specimen Preparation for Aberration-Corrected TEM and STEM

Microscopy today, 2011-01, Vol.19 (1), p.16-19

2011

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Raman Spectroscopy and Electron Microscopy Studies of Ga FIB and Post-FIB Ar Ion Milling's Impact on Si TEM Specimens

Investigation of the Effects of Low-Energy Plasma Treatment on Amorphous Carbon and Graphene Support Films for Cryo-Electron Microscopy

Investigations on the Microstructure and Microanalysis of the Gas Shale Sample Prepared by SEM Ion Mill by Off-Centering the Ion Beams

Characterization of Shales by Mass Spectrometry during Ion Milling

Delayering of Microelectronic Devices Using an Adjustable Broad-Beam Ion Source

Low-Energy Argon Broad Ion Beam and Narrow Ion Beam Milling of In Situ Lift-Out FIB Specimens

Post-FIB Specimen Preparation of Atom Probe Specimens under Controlled Environments for Correlative Microscopy

Controlled Environments from Sample Preparation to Electron Microscopy Characterization

Sample preparation for aberration-corrected microscopy of high-quality TEM specimens of advanced integrated circuits

Automated Sample Preparation of Nanoscale Devices for FESEM

Automatic End-point Detection for Ar+ Milling of FIB in situ and ex situ Lift-out Specimens from Semiconductor Devices

Removal of Ga Implantation on FIB-prepared Atom Probe Specimens Using Small Beam and Low Energy Ar+ Milling

Nanomilling for Aberration – Corrected TEM and HAADF STEM

The Use of a Cold Gas Plasma for the Final Processing of Contamination-Free Tem Specimens

Recent Developments in Automated Sample Preparation for FESEM

In-Plane Magnetic Field Lorentz Stage for Use in a TEM/STEM

Aberration correction: Some Advantages and Alternatives

Applications of Plasma Cleaning for Electron Microscopy of Semiconducting Materials

Automated Sample Preparation for Environmentally Reactive Materials Systems

Study of FIB Damage in Carbonaceous Materials using XANES

Plasma Cleaning and Its Applications for Electron Microscopy

Towards Low-Damage TEM Sample Preparation of Carbonaceous Materials in the Focused Ion Beam

Automated Sample Preparation of Low-k Dielectrics for FESEM

An Ultra-High-Tilt Two-Contact Electrical Biasing Specimen Holder for Electron Holography and Electron Tomography of Semiconductor Devices

Raising the Standard of Specimen Preparation for Aberration-Corrected TEM and STEM

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