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X-ray ptychographic computed tomography at 16 nm isotropic 3D resolution

Scientific reports, 2014-01, Vol.4 (1), p.3857-3857, Article 3857

2014

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Ultra-high resolution zone-doubled diffractive X-ray optics for the multi-keV regime

Optics express, 2011-01, Vol.19 (1), p.175-184

2011

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Controlling the refractive index and third-order nonlinearity of polyimide/Ta2O5 nanolaminates for optical applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-11, Vol.37 (6)

2019

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Passivation of copper surfaces for selective-area ALD using a thiol self-assembled monolayer

Semiconductor science and technology, 2012-07, Vol.27 (7), p.74004

2012

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Surface modification of thermoplastics by atomic layer deposition of Al2O3 and TiO2 thin films

European polymer journal, 2008-11, Vol.44 (11), p.3564-3570

2008

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High resolution double-sided diffractive optics for hard X-ray microscopy

Optics express, 2015-01, Vol.23 (2), p.776-786

2015

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Selective-area atomic layer deposition with microcontact printed self-assembled octadecyltrichlorosilane monolayers as mask layers

Thin solid films, 2008-11, Vol.517 (2), p.972-975

2008

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Programming nanostructured soft biological surfaces by atomic layer deposition

Nanotechnology, 2013-06, Vol.24 (24), p.245701-245701

2013

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As2S3 thin films deposited by atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2017-01, Vol.35 (1)

2017

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Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100 keV electron beam lithography

Nanotechnology, 2010-07, Vol.21 (28), p.285305-285305

2010

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Photocatalytic and Gas Sensitive Multiwalled Carbon Nanotube/TiO2-ZnO and ZnO-TiO2 Composites Prepared by Atomic Layer Deposition

Nanomaterials (Basel, Switzerland), 2020-01, Vol.10 (2), p.252

2020

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Selective-Area Atomic Layer Deposition Using Poly(vinyl pyrrolidone) as a Passivation Layer

Journal of the Electrochemical Society, 2010, Vol.157 (1), p.K10

2010

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High Aspect-Ratio Iridium-Coated Nanopillars for Highly Reproducible Surface-Enhanced Raman Scattering (SERS)

ACS applied materials & interfaces, 2015-06, Vol.7 (21), p.11452-11459

2015

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Self-Assembled Octadecyltrimethoxysilane Monolayers Enabling Selective-Area Atomic Layer Deposition of Iridium

Chemical vapor deposition, 2006-07, Vol.12 (7), p.415-417

2006

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Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers

Journal of physical chemistry. C, 2008-10, Vol.112 (40), p.15791-15795

2008

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Transparent superhydrophobic surfaces by self-assembly of hydrophobic monolayers on nanostructured surfaces

Physica status solidi. A, Applications and materials science, 2006-05, Vol.203 (6), p.1453-1458

2006

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Microcontact Printed RuO x Film as an Activation Layer for Selective-Area Atomic Layer Deposition of Ruthenium

Chemistry of materials, 2012-01, Vol.24 (2), p.275-278

2012

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Fabrication of nanocluster silicon surface with electric discharge and the application in desorption/ionization on silicon-mass spectrometry

Lab on a chip, 2010-07, Vol.1 (13), p.1689-1695

2010

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Selective Surface Patterning with an Electric Discharge in the Fabrication of Microfluidic Structures

Angewandte Chemie (International ed.), 2008-09, Vol.47 (39), p.7442-7445

2008

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High resolution double-sided diffractive optics for hard X-ray microscopy

Optics express, 2015-01, Vol.23 (2), p.776

2015

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Vapor-phase self-assembled monolayers for improved MEMS reliability

2010 IEEE Sensors, 2010, p.767-770

2010

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Photocatalytic and Gas Sensitive Multiwalled Carbon Nanotube/TiO 2 -ZnO and ZnO-TiO 2 Composites Prepared by Atomic Layer Deposition

Nanomaterials (Basel, Switzerland), 2020-01, Vol.10 (2)

2020

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Surface modification of thermoplastics by atomic layer deposition of Al 2O 3 and TiO 2 thin films

European polymer journal, 2008, Vol.44 (11), p.3564-3570

2008

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Selective Surface Patterning with an Electric Discharge in the Fabrication of Microfluidic Structures

Angewandte Chemie, 2008-09, Vol.120 (39), p.7552-7555

2008

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Selective Surface Patterning with an Electric Discharge in the Fabrication of Microfluidic Structures

Angewandte Chemie, 2008-09, Vol.120 (39), p.7552-7555

2008

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X-ray ptychographic computed tomography at 16 nm isotropic 3D resolution

Ultra-high resolution zone-doubled diffractive X-ray optics for the multi-keV regime

Controlling the refractive index and third-order nonlinearity of polyimide/Ta2O5 nanolaminates for optical applications

Passivation of copper surfaces for selective-area ALD using a thiol self-assembled monolayer

Surface modification of thermoplastics by atomic layer deposition of Al2O3 and TiO2 thin films

High resolution double-sided diffractive optics for hard X-ray microscopy

Selective-area atomic layer deposition with microcontact printed self-assembled octadecyltrichlorosilane monolayers as mask layers

Programming nanostructured soft biological surfaces by atomic layer deposition

As2S3 thin films deposited by atomic layer deposition

Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100 keV electron beam lithography

Photocatalytic and Gas Sensitive Multiwalled Carbon Nanotube/TiO2-ZnO and ZnO-TiO2 Composites Prepared by Atomic Layer Deposition

Selective-Area Atomic Layer Deposition Using Poly(vinyl pyrrolidone) as a Passivation Layer

High Aspect-Ratio Iridium-Coated Nanopillars for Highly Reproducible Surface-Enhanced Raman Scattering (SERS)

Self-Assembled Octadecyltrimethoxysilane Monolayers Enabling Selective-Area Atomic Layer Deposition of Iridium

Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers

Transparent superhydrophobic surfaces by self-assembly of hydrophobic monolayers on nanostructured surfaces

Microcontact Printed RuO x Film as an Activation Layer for Selective-Area Atomic Layer Deposition of Ruthenium

Fabrication of nanocluster silicon surface with electric discharge and the application in desorption/ionization on silicon-mass spectrometry

Selective Surface Patterning with an Electric Discharge in the Fabrication of Microfluidic Structures

High resolution double-sided diffractive optics for hard X-ray microscopy

Vapor-phase self-assembled monolayers for improved MEMS reliability

Photocatalytic and Gas Sensitive Multiwalled Carbon Nanotube/TiO 2 -ZnO and ZnO-TiO 2 Composites Prepared by Atomic Layer Deposition

Surface modification of thermoplastics by atomic layer deposition of Al 2O 3 and TiO 2 thin films

Selective Surface Patterning with an Electric Discharge in the Fabrication of Microfluidic Structures

Selective Surface Patterning with an Electric Discharge in the Fabrication of Microfluidic Structures

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