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Two-Dimensional Pattern Formation Using Graphoepitaxy of PS‑b‑PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication

ACS nano, 2014-05, Vol.8 (5), p.5227-5232

2014

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The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions

Plasma sources science & technology, 2022-09, Vol.31 (9)

2022

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Ultra Low Contact Resistivities for CMOS Beyond 10-nm Node

IEEE electron device letters, 2013-06, Vol.34 (6), p.723-725

2013

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IEEE_Xplore

Dopant-Segregation Technique for Leakage Reduction and Performance Improvement in Trigate Transistors Without Raised Source/Drain Epitaxy

IEEE electron device letters, 2014-05, Vol.35 (5), p.512-514

2014

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IEEE_Xplore

Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-05, Vol.38 (3)

2020

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Highly selective dry etching of polystyrene-poly(methyl methacrylate) block copolymer by gas pulsing carbon monoxide-based plasmas

Journal of physics. D, Applied physics, 2017-05, Vol.50 (20), p.204001

2017

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Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2017-09, Vol.35 (5)

2017

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Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2016-01, Vol.34 (1)

2016

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Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k′ nitride spacer etch processes

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2018-05, Vol.36 (3)

2018

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Nitride etching with hydrofluorocarbons. II. Evaluation of C4H9F for tight pitch Si3N4 patterning applications

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2018-05, Vol.36 (3)

2018

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Nitride etching with hydrofluorocarbons. I. Selective etching of nitride over silicon and oxide materials by gas discharge optimization and selective deposition of fluorocarbon polymer

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2017-09, Vol.35 (5)

2017

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Application of cyclic fluorocarbon/argon discharges to device patterning

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2016-01, Vol.34 (1)

2016

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Application of cyclic fluorocarbon/argon discharges to device patterning

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2015-11, Vol.34 (1)

2015

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Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low T{sub e} plasma sources

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2016-01, Vol.34 (1)

2016

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Demonstration of record SiGe transconductance and short-channel current drive in High-Ge-Content SiGe PMOS FinFETs with improved junction and scaled EOT

2016 IEEE Symposium on VLSI Technology, 2016, p.1-2

2016

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IEEE_Xplore

High performance PMOS with strained high-Ge-content SiGe fins for advanced logic applications

2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA), 2017, p.1-2

2017

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First demonstration of high-Ge-content strained-Si1−xGex (x=0.5) on insulator PMOS FinFETs with high hole mobility and aggressively scaled fin dimensions and gate lengths for high-performance applications

2014 IEEE International Electron Devices Meeting, 2014, p.16.1.1-16.1.4

2014

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IEEE_Xplore

Subtractive W contact and local interconnect co-integration (CLIC)

2013 IEEE International Interconnect Technology Conference - IITC, 2013, p.1-3

2013

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IEEE_Xplore

Staphylococcal serine protease–like proteins are pacemakers of allergic airway reactions to Staphylococcus aureus

Journal of allergy and clinical immunology, 2017-02, Vol.139 (2), p.492-500.e8

2017

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Ureteroplasty with buccal mucosa graft without omental wrap: an effective method to treat ureteral strictures

World journal of urology, 2024-03, Vol.42 (1), p.116-116

2024

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A novel grading approach predicts worse outcomes in stage pT1 non-muscle-invasive bladder cancer

BJU international, 2024-02

2024

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Body Composition of Patients Undergoing Radical Cystectomy for Bladder Cancer: Sarcopenia, Low Psoas Muscle Index, and Myosteatosis Are Independent Risk Factors for Mortality

Cancers, 2023-03, Vol.15 (6), p.1778

2023

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Incidence of retinopathy of prematurity in Germany: evaluation of current screening criteria

Archives of disease in childhood. Fetal and neonatal edition, 2021-03, Vol.106 (2), p.189

2021

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Effects of anti-TNF therapy and immunomodulators on anxiety and depressive symptoms in patients with inflammatory bowel disease: a 5-year analysis

Therapeutic advances in gastroenterology, 2021, Vol.14, p.17562848211033763-17562848211033763

2021

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Two-Dimensional Pattern Formation Using Graphoepitaxy of PS‑b‑PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication

The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions

Ultra Low Contact Resistivities for CMOS Beyond 10-nm Node

Dopant-Segregation Technique for Leakage Reduction and Performance Improvement in Trigate Transistors Without Raised Source/Drain Epitaxy

Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations

Highly selective dry etching of polystyrene-poly(methyl methacrylate) block copolymer by gas pulsing carbon monoxide-based plasmas

Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns

Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources

Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k′ nitride spacer etch processes

Nitride etching with hydrofluorocarbons. II. Evaluation of C4H9F for tight pitch Si3N4 patterning applications

Nitride etching with hydrofluorocarbons. I. Selective etching of nitride over silicon and oxide materials by gas discharge optimization and selective deposition of fluorocarbon polymer

Application of cyclic fluorocarbon/argon discharges to device patterning

Application of cyclic fluorocarbon/argon discharges to device patterning

Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low T{sub e} plasma sources

Demonstration of record SiGe transconductance and short-channel current drive in High-Ge-Content SiGe PMOS FinFETs with improved junction and scaled EOT

High performance PMOS with strained high-Ge-content SiGe fins for advanced logic applications

First demonstration of high-Ge-content strained-Si1−xGex (x=0.5) on insulator PMOS FinFETs with high hole mobility and aggressively scaled fin dimensions and gate lengths for high-performance applications

Subtractive W contact and local interconnect co-integration (CLIC)

Staphylococcal serine protease–like proteins are pacemakers of allergic airway reactions to Staphylococcus aureus

Ureteroplasty with buccal mucosa graft without omental wrap: an effective method to treat ureteral strictures

A novel grading approach predicts worse outcomes in stage pT1 non-muscle-invasive bladder cancer

Body Composition of Patients Undergoing Radical Cystectomy for Bladder Cancer: Sarcopenia, Low Psoas Muscle Index, and Myosteatosis Are Independent Risk Factors for Mortality

Incidence of retinopathy of prematurity in Germany: evaluation of current screening criteria

Effects of anti-TNF therapy and immunomodulators on anxiety and depressive symptoms in patients with inflammatory bowel disease: a 5-year analysis

Treated Cases of Retinopathy of Prematurity in Germany: 10-Year Data from the Retina.net Retinopathy of Prematurity Registry

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