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Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2009-05, Vol.27 (3), p.1142-1155

2009

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Investigation of plasma etch damage to porous oxycarbosilane ultra low-k dielectric

Journal of physics. D, Applied physics, 2013-07, Vol.46 (26), p.265303-1-6

2013

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Electron beam generated plasmas: Characteristics and etching of silicon nitride

Microelectronic engineering, 2017-01, Vol.168, p.89-96

2017

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Plasma-surface interactions of model polymers for advanced photoresists using C4F8∕Ar discharges and energetic ion beams

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2007-07, Vol.25 (4), p.1353-1364

2007

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The effects of vacuum ultraviolet radiation on low- k dielectric films

Journal of applied physics, 2012-12, Vol.112 (11)

2012

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Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2008-09, Vol.26 (5), p.1637-1646

2008

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Plasma processing for advanced microelectronics beyond CMOS

Multicenter analytical performance evaluation of a fully automated anti-Müllerian hormone assay and reference interval determination

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Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation

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Perfusion maintains functional potential in denervated mimic muscles in early persistent facial paralysis which requires early microsurgical treatment - the histoanatomic basis of the extratemporal facial nerve trunk assessing axonal load in the context of possible nerve transfers

Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma

Investigation of plasma etch damage to porous oxycarbosilane ultra low-k dielectric

Electron beam generated plasmas: Characteristics and etching of silicon nitride

Plasma-surface interactions of model polymers for advanced photoresists using C4F8∕Ar discharges and energetic ion beams

The effects of vacuum ultraviolet radiation on low- k dielectric films

Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation

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