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Thickness dependence of the resistivity of platinum-group metal thin films

Journal of applied physics, 2017-07, Vol.122 (2)

2017

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Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S

Chemistry of materials, 2017-04, Vol.29 (7), p.2927-2938

2017

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A combinatorial study of SiGeAsTe thin films for application as an Ovonic threshold switch selector

Thin solid films, 2022-07, Vol.753, p.139278, Article 139278

2022

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Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper

ACS applied materials & interfaces, 2016-10, Vol.8 (39), p.26119-26125

2016

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Effective electrical passivation of Ge(100) for high- k gate dielectric layers using germanium oxide

Applied physics letters, 2007-08, Vol.91 (8), p.082904-082904-3

2007

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Diffusion‐Mediated Growth and Size‐Dependent Nanoparticle Reactivity during Ruthenium Atomic Layer Deposition on Dielectric Substrates

Advanced materials interfaces, 2018-12, Vol.5 (24), p.n/a

2018

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Synthesis of large area carbon nanosheets for energy storage applications

Carbon (New York), 2013-07, Vol.58, p.59-65

2013

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Metal-Insulator Transition in ALD VO2 Ultrathin Films and Nanoparticles: Morphological Control

Advanced functional materials, 2015, Vol.25 (5), p.679-686

2015

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Characterization of Porous Structures in Advanced Low-$k$ Films with Thin TaN Layers Using Monoenergetic Positron Beams

Japanese Journal of Applied Physics, 2013-10, Vol.52 (10), p.106501-106501-5

2013

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Microwave Characterization of Ba-Substituted PZT and ZnO Thin Films

IEEE transactions on ultrasonics, ferroelectrics, and frequency control, 2018-05, Vol.65 (5), p.881-888

2018

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Top-Pinned STT-MRAM Devices With High Thermal Stability Hybrid Free Layers for High-Density Memory Applications

IEEE transactions on magnetics, 2018-11, Vol.54 (11), p.1-5

2018

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Circular Dichroism and UV−Visible Absorption Spectra of the Langmuir−Blodgett Films of an Aggregating Helicene

Journal of the American Chemical Society, 1998-09, Vol.120 (34), p.8656-8660

1998

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GaAs clean up studied with synchrotron radiation photoemission

IOP conference series. Materials Science and Engineering, 2012-01, Vol.41 (1), p.12003-8

2012

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Control of Interlayer Exchange Coupling and Its Impact on Spin-Torque Switching of Hybrid Free Layers With Perpendicular Magnetic Anisotropy

IEEE transactions on magnetics, 2017-11, Vol.53 (11), p.1-5

2017

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Second-Order Nonlinear Optical Properties of Highly Symmetric Chiral Thin Films

Langmuir, 2001-08, Vol.17 (16), p.4685-4687

2001

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Influence of Carbon Alloying on the Thermal Stability and Resistive Switching Behavior of Copper-Telluride Based CBRAM Cells

ACS applied materials & interfaces, 2013-08, Vol.5 (15), p.6984-6989

2013

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Structural and Magnetic Properties of Mn3Ge Grown on a Thin Polycrystalline MgO Seed Layer

Physica status solidi. PSS-RRL. Rapid research letters, 2019-06, Vol.13 (6), p.n/a

2019

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Hf-based high-k dielectrics for p-Ge MOS gate stacks

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2014-05, Vol.32 (3)

2014

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Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-01, Vol.30 (1), p.01A127-01A127-10

2012

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Surface Chemistry and Interface Formation during the Atomic Layer Deposition of Alumina from Trimethylaluminum and Water on Indium Phosphide

Chemistry of materials, 2013-04, Vol.25 (7), p.1078-1091

2013

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Influence of the Reference Layer Composition on the Back-End-of-Line Compatibility of Co/Ni-Based Perpendicular Magnetic Tunnel Junction Stacks

IEEE transactions on magnetics, 2016-07, Vol.52 (7), p.1-4

2016

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Atomic layer deposition of high-k dielectrics on single-walled carbon nanotubes: a Raman study

Nanotechnology, 2013-06, Vol.24 (24), p.245703-245703

2013

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Leakage Control in 0.4-nm EOT Ru/SrTiOx/Ru Metal-Insulator-Metal Capacitors: Process Implications

IEEE electron device letters, 2014-07, Vol.35 (7), p.753-755

2014

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Low leakage stoichiometric SrTiO3 dielectric for advanced metal-insulator-metal capacitors

Physica status solidi. PSS-RRL. Rapid research letters, 2016-05, Vol.10 (5), p.420-425

2016

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Influence of carbon content on the copper-telluride phase formation and on the resistive switching behavior of carbon alloyed Cu-Te conductive bridge random access memory cells

Journal of applied physics, 2014-02, Vol.115 (5)

2014

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Thickness dependence of the resistivity of platinum-group metal thin films

Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S

A combinatorial study of SiGeAsTe thin films for application as an Ovonic threshold switch selector

Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper

Effective electrical passivation of Ge(100) for high- k gate dielectric layers using germanium oxide

Diffusion‐Mediated Growth and Size‐Dependent Nanoparticle Reactivity during Ruthenium Atomic Layer Deposition on Dielectric Substrates

Synthesis of large area carbon nanosheets for energy storage applications

Metal-Insulator Transition in ALD VO2 Ultrathin Films and Nanoparticles: Morphological Control

Characterization of Porous Structures in Advanced Low-$k$ Films with Thin TaN Layers Using Monoenergetic Positron Beams

Microwave Characterization of Ba-Substituted PZT and ZnO Thin Films

Top-Pinned STT-MRAM Devices With High Thermal Stability Hybrid Free Layers for High-Density Memory Applications

Circular Dichroism and UV−Visible Absorption Spectra of the Langmuir−Blodgett Films of an Aggregating Helicene

GaAs clean up studied with synchrotron radiation photoemission

Control of Interlayer Exchange Coupling and Its Impact on Spin-Torque Switching of Hybrid Free Layers With Perpendicular Magnetic Anisotropy

Second-Order Nonlinear Optical Properties of Highly Symmetric Chiral Thin Films

Influence of Carbon Alloying on the Thermal Stability and Resistive Switching Behavior of Copper-Telluride Based CBRAM Cells

Structural and Magnetic Properties of Mn3Ge Grown on a Thin Polycrystalline MgO Seed Layer

Hf-based high-k dielectrics for p-Ge MOS gate stacks

Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates

Surface Chemistry and Interface Formation during the Atomic Layer Deposition of Alumina from Trimethylaluminum and Water on Indium Phosphide

Influence of the Reference Layer Composition on the Back-End-of-Line Compatibility of Co/Ni-Based Perpendicular Magnetic Tunnel Junction Stacks

Atomic layer deposition of high-k dielectrics on single-walled carbon nanotubes: a Raman study

Leakage Control in 0.4-nm EOT Ru/SrTiOx/Ru Metal-Insulator-Metal Capacitors: Process Implications

Low leakage stoichiometric SrTiO3 dielectric for advanced metal-insulator-metal capacitors

Influence of carbon content on the copper-telluride phase formation and on the resistive switching behavior of carbon alloyed Cu-Te conductive bridge random access memory cells

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