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Growth and characterization of epitaxial anatase TiO2(001) on SrTiO3-buffered Si(001) using atomic layer deposition

Thin solid films, 2012-08, Vol.520 (21), p.6525-6530

2012

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Core-Shell Germanium-Silicon Nanocrystal Floating Gate for Nonvolatile Memory Applications

IEEE transactions on electron devices, 2008-12, Vol.55 (12), p.3610-3614

2008

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Template fabrication schemes for step and flash imprint lithography

Microelectronic engineering, 2002-07, Vol.61, p.461-467

2002

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Mechanisms of Thiophene Hydrodesulfurization on Model Molybdenum Catalysts

Journal of catalysis, 1998-08, Vol.178 (1), p.226-233

1998

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Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology

Journal of Photopolymer Science and Technology, 2002, Vol.15(3), pp.481-486

2002

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Iridium precursor pyrolysis and oxidation reactions and direct liquid injection chemical vapor deposition of iridium films

Thin solid films, 2001-06, Vol.388 (1), p.126-133

2001

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Fabrication of multi-tiered structures on step and flash imprint lithography templates

Microelectronic engineering, 2003-06, Vol.67, p.221-228

2003

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Optical second harmonic spectra of silicon-adatom surfaces : theory and experiment

Thin solid films, 2000-03, Vol.364 (1-2), p.1-5

2000

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The effect of an iodine source on nucleation and film properties of Ru films deposited by chemical vapor deposition

Thin solid films, 2009-11, Vol.518 (1), p.36-42

2009

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Chemical vapor deposition growth and properties of TaCxNy

Thin solid films, 2002-10, Vol.418 (2), p.145-150

2002

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The surface characteristics required for isosynthesis over zirconium dioxide and modified zirconium dioxide

Journal of catalysis, 1990-11, Vol.126 (1), p.31-45

1990

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Low-temperature Si(100) etching: facile abstraction of SiH3(a) by thermal hydrogen atoms

Surface science, 1997-12, Vol.394 (1-3), p.L162-L167

1997

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Surface chemistry of (2,4-dimethylpentadienyl)(ethylcyclopentadienyl)Ru on polycrystalline Ta

Surface science, 2009-03, Vol.603 (6), p.921-932

2009

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A Raman and ultraviolet diffuse reflectance spectroscopic investigation of silica-supported molybdenum oxide

Journal of physical chemistry (1952), 1991-10, Vol.95 (22), p.8781-8791

1991

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Oxidation resistance of thin boron carbo-nitride films on Ge(100) and Ge nanowires

Thin solid films, 2009-05, Vol.517 (13), p.3686-3694

2009

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A Raman and ultraviolet diffuse reflectance spectroscopic investigation of alumina-supported molybdenum oxide

Journal of physical chemistry (1952), 1991-10, Vol.95 (22), p.8791-8797

1991

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The Absence of Molybdenum Precursor Effects for Methanol Oxidation over Molybdenum Oxide Supported on Silica

Journal of catalysis, 1993-06, Vol.141 (2), p.430-437

1993

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Methanol formation on zirconium dioxide

Journal of catalysis, 1984-01, Vol.90 (1), p.17-23

1984

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Mechanisms of GaAs atomic layer epitaxy: a review of progress

Surface science, 1994, Vol.299 (1-3), p.892-908

1994

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Low temperature chemical vapor deposition of tungsten carbide for copper diffusion barriers

Thin solid films, 2001-10, Vol.397 (1), p.109-115

2001

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Atomic layer deposition of TaSix thin films on SiO2 using TaF5 and Si2H6

Thin solid films, 2005-09, Vol.488 (1-2), p.9-14

2005

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Surface science investigations of atomic layer deposition half-reactions using TaF 5 and Si 2 H 6

Surface science, 2003-07, Vol.538 (3), p.191-203

2003

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Surface chemistry of TaCl 5 on polycrystalline Ta

Surface science, 2003, Vol.527 (1), p.124-136

2003

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Ultra thin tungsten nitride film growth on dielectric surfaces

Thin solid films, 2004-06, Vol.458 (1), p.251-256

2004

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Hydrodesulfurization Studies with a Single-Layer Molybdenum Disulfide Catalyst

Journal of catalysis, 2000-07, Vol.193 (1), p.96-102

2000

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Growth and characterization of epitaxial anatase TiO2(001) on SrTiO3-buffered Si(001) using atomic layer deposition

Core-Shell Germanium-Silicon Nanocrystal Floating Gate for Nonvolatile Memory Applications

Template fabrication schemes for step and flash imprint lithography

Mechanisms of Thiophene Hydrodesulfurization on Model Molybdenum Catalysts

Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology

Iridium precursor pyrolysis and oxidation reactions and direct liquid injection chemical vapor deposition of iridium films

Fabrication of multi-tiered structures on step and flash imprint lithography templates

Optical second harmonic spectra of silicon-adatom surfaces : theory and experiment

The effect of an iodine source on nucleation and film properties of Ru films deposited by chemical vapor deposition

Chemical vapor deposition growth and properties of TaCxNy

The surface characteristics required for isosynthesis over zirconium dioxide and modified zirconium dioxide

Low-temperature Si(100) etching: facile abstraction of SiH3(a) by thermal hydrogen atoms

Surface chemistry of (2,4-dimethylpentadienyl)(ethylcyclopentadienyl)Ru on polycrystalline Ta

A Raman and ultraviolet diffuse reflectance spectroscopic investigation of silica-supported molybdenum oxide

Oxidation resistance of thin boron carbo-nitride films on Ge(100) and Ge nanowires

A Raman and ultraviolet diffuse reflectance spectroscopic investigation of alumina-supported molybdenum oxide

The Absence of Molybdenum Precursor Effects for Methanol Oxidation over Molybdenum Oxide Supported on Silica

Methanol formation on zirconium dioxide

Mechanisms of GaAs atomic layer epitaxy: a review of progress

Low temperature chemical vapor deposition of tungsten carbide for copper diffusion barriers

Atomic layer deposition of TaSix thin films on SiO2 using TaF5 and Si2H6

Surface science investigations of atomic layer deposition half-reactions using TaF 5 and Si 2 H 6

Surface chemistry of TaCl 5 on polycrystalline Ta

Ultra thin tungsten nitride film growth on dielectric surfaces

Hydrodesulfurization Studies with a Single-Layer Molybdenum Disulfide Catalyst

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