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Surface Hydration and Its Effect on Fluorinated SAM Formation on SiO2 Surfaces

Langmuir, 2005-12, Vol.21 (25), p.11795-11801

2005

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Electrical and spectroscopic comparison of HfO2/Si interfaces on nitrided and un-nitrided Si(100)

Journal of applied physics, 2002-04, Vol.91 (7), p.4353-4363

2002

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Template fabrication schemes for step and flash imprint lithography

Microelectronic engineering, 2002-07, Vol.61, p.461-467

2002

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The effect of an iodine source on nucleation and film properties of Ru films deposited by chemical vapor deposition

Thin solid films, 2009-11, Vol.518 (1), p.36-42

2009

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Experimental and Theoretical Investigation on Surfactant Segregation in Imprint Lithography

Langmuir, 2007-01, Vol.23 (3), p.1166-1170

2007

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Nucleation and growth study of atomic layer deposited HfO2 gate dielectrics resulting in improved scaling and electron mobility

Journal of applied physics, 2006-01, Vol.99 (2)

2006

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Surface chemistry of (2,4-dimethylpentadienyl)(ethylcyclopentadienyl)Ru on polycrystalline Ta

Surface science, 2009-03, Vol.603 (6), p.921-932

2009

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Growth and characterization of epitaxial anatase TiO2(001) on SrTiO3-buffered Si(001) using atomic layer deposition

Thin solid films, 2012-08, Vol.520 (21), p.6525-6530

2012

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Oxidation resistance of thin boron carbo-nitride films on Ge(100) and Ge nanowires

Thin solid films, 2009-05, Vol.517 (13), p.3686-3694

2009

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Low-temperature chemical vapor deposition and scaling limit of ultrathin Ru films

Applied physics letters, 2004-02, Vol.84 (8), p.1380-1382

2004

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Low-threshold field emission from cesiated silicon nanowires

Applied physics letters, 2005-11, Vol.87 (21), p.213115-213115-3

2005

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Low temperature chemical vapor deposition of tungsten carbide for copper diffusion barriers

Thin solid films, 2001-10, Vol.397 (1), p.109-115

2001

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Vinyl ether formulations for step and flash imprint lithography

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2005-11, Vol.23 (6), p.2967-2971

2005

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Iridium precursor pyrolysis and oxidation reactions and direct liquid injection chemical vapor deposition of iridium films

Thin solid films, 2001-06, Vol.388 (1), p.126-133

2001

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Fabrication of multi-tiered structures on step and flash imprint lithography templates

Microelectronic engineering, 2003-06, Vol.67, p.221-228

2003

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Role of Surface Chemistry in Semiconductor Thin Film Processing

Chemical reviews, 1996-06, Vol.96 (4), p.1499-1518

1996

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Role of the Oxygen Molecule and of the Photogenerated Electron in TiO2-Photocatalyzed Air Oxidation Reactions

Journal of physical chemistry (1952), 1995-04, Vol.99 (15), p.5633-5638

1995

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Iridium film growth with iridium tris-acetylacetonate : oxygen and substrate effects

Thin solid films, 1999-06, Vol.346 (1-2), p.100-107

1999

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Atomic layer deposition of TaSix thin films on SiO2 using TaF5 and Si2H6

Thin solid films, 2005-09, Vol.488 (1-2), p.9-14

2005

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Ultra thin tungsten nitride film growth on dielectric surfaces

Thin solid films, 2004-06, Vol.458 (1), p.251-256

2004

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Improved step and flash imprint lithography templates for nanofabrication

Microelectronic engineering, 2003-09, Vol.69 (2), p.412-419

2003

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Chemical and thermal reduction of thin films of copper ( II ) oxide and copper ( I ) oxide

Journal of applied physics, 2001-10, Vol.90 (8), p.4256-4264

2001

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Interfacial chemistry of the Sr/SiOxNy/Si(100) nanostructure

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-09, Vol.19 (5), p.2222-2231

2001

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Growth of Group III Nitrides. A Review of Precursors and Techniques

Chemistry of materials, 1996-01, Vol.8 (1), p.9-25

1996

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Optical second harmonic spectra of silicon-adatom surfaces : theory and experiment

Thin solid films, 2000-03, Vol.364 (1-2), p.1-5

2000

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Surface Hydration and Its Effect on Fluorinated SAM Formation on SiO2 Surfaces

Electrical and spectroscopic comparison of HfO2/Si interfaces on nitrided and un-nitrided Si(100)

Template fabrication schemes for step and flash imprint lithography

The effect of an iodine source on nucleation and film properties of Ru films deposited by chemical vapor deposition

Experimental and Theoretical Investigation on Surfactant Segregation in Imprint Lithography

Nucleation and growth study of atomic layer deposited HfO2 gate dielectrics resulting in improved scaling and electron mobility

Surface chemistry of (2,4-dimethylpentadienyl)(ethylcyclopentadienyl)Ru on polycrystalline Ta

Growth and characterization of epitaxial anatase TiO2(001) on SrTiO3-buffered Si(001) using atomic layer deposition

Oxidation resistance of thin boron carbo-nitride films on Ge(100) and Ge nanowires

Low-temperature chemical vapor deposition and scaling limit of ultrathin Ru films

Low-threshold field emission from cesiated silicon nanowires

Low temperature chemical vapor deposition of tungsten carbide for copper diffusion barriers

Vinyl ether formulations for step and flash imprint lithography

Iridium precursor pyrolysis and oxidation reactions and direct liquid injection chemical vapor deposition of iridium films

Fabrication of multi-tiered structures on step and flash imprint lithography templates

Role of Surface Chemistry in Semiconductor Thin Film Processing

Role of the Oxygen Molecule and of the Photogenerated Electron in TiO2-Photocatalyzed Air Oxidation Reactions

Iridium film growth with iridium tris-acetylacetonate : oxygen and substrate effects

Atomic layer deposition of TaSix thin films on SiO2 using TaF5 and Si2H6

Ultra thin tungsten nitride film growth on dielectric surfaces

Improved step and flash imprint lithography templates for nanofabrication

Chemical and thermal reduction of thin films of copper ( II ) oxide and copper ( I ) oxide

Interfacial chemistry of the Sr/SiOxNy/Si(100) nanostructure

Growth of Group III Nitrides. A Review of Precursors and Techniques

Optical second harmonic spectra of silicon-adatom surfaces : theory and experiment

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