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Hybrid simulation of a dc-enhanced radio-frequency capacitive discharge in hydrogen

Journal of physics. D, Applied physics, 2012-05, Vol.45 (17), p.175204-1-14

2012

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Negative ion destruction by O(3P) atoms and O2(a 1Δg) molecules in an oxygen plasma

Plasma sources science & technology, 2005-08, Vol.14, p.532

2005

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The anomalous skin effect in gas discharge plasmas

Plasma sources science & technology, 1997-05, Vol.6 (2), p.R1-R17

1997

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Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4

Plasma sources science & technology, 2015-12, Vol.25 (1)

2015

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Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: excitation dynamics and ion flux asymmetry

Plasma sources science & technology, 2016-08, Vol.25 (4), p.45019

2016

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Pulsed plasma etching for semiconductor manufacturing

Journal of physics. D, Applied physics, 2014-07, Vol.47 (30), p.303001-27

Economou, Demetre J

2014

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Spatiotemporal electron dynamics in radio-frequency glow discharges: fluid versus dynamic Monte Carlo simulations

Journal of physics. D, Applied physics, 1995-04, Vol.28 (4), p.727-737

1995

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Bifurcation Analysis of Thermal Runaway in Microwave Heating of Ceramics

Journal of the Electrochemical Society, 1999-12, Vol.146 (12), p.4659-4665

1999

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Plasma molding over surface topography: Simulation of ion flow, and energy and angular distributions over steps in RF high-density plasmas

IEEE transactions on plasma science, 2002-10, Vol.30 (5), p.2048-2058

2002

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Fluid simulations of glow discharges : effect of metastable atoms in argon

Journal of applied physics, 1993-04, Vol.73 (8), p.3668-3679

1993

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Fluid simulation of a pulsed-power inductively coupled argon plasma

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1998-03, Vol.16 (2), p.564-571

1998

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Anisotropic etching of polymer films by high energy (∼100s of eV) oxygen atom neutral beams

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-03, Vol.19 (2), p.398-404

2001

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Spatio-temporal evolution of a pulsed chlorine discharge

Plasma sources science & technology, 2000-08, Vol.9 (3), p.256-269

2000

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Control of ion energy distributions using a pulsed plasma with synchronous bias on a boundary electrode

Plasma sources science & technology, 2011-10, Vol.20 (5), p.55001-1-9

2011

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Plasma molding over surface topography: Simulation and measurement of ion fluxes, energies and angular distributions over trenches in RF high density plasmas

IEEE transactions on plasma science, 2003-08, Vol.31 (4), p.691-702

2003

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Direct simulation Monte Carlo (DSMC) of rarefied gas flow during etching of large diameter (300-mm) wafers

IEEE transactions on plasma science, 1996-02, Vol.24 (1), p.131-132

1996

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Spatially Resolved Measurements of Argon Metastable (1) Density in a High Pressure Microdischarge Using Diode Laser Absorption Spectroscopy

IEEE transactions on plasma science, 2009-06, Vol.37 (6), p.852-858

2009

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Ion energy distributions in inductively coupled plasmas having a biased boundary electrode

Plasma sources science & technology, 2012-12, Vol.21 (6), p.65009-1-13

2012

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Simulation images from a low-pressure chlorine plasma reactor using DSMC

IEEE transactions on plasma science, 1996-02, Vol.24 (1), p.127-128

1996

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Plasma enhanced layer-by-layer deposition and nanocrystallization of hydrogenated amorphous silicon films

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2013-11, Vol.31 (6), p.61209

2013

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Ion–ion plasmas and double layer formation in weakly collisional electronegative discharges

Applied physics letters, 1998-02, Vol.72 (6), p.656-658

1998

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Particle-in-cell simulation of ion flow through a hole in contact with plasma

IEEE transactions on plasma science, 2005-04, Vol.33 (2), p.232-233

2005

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Deposition of high quality YBa2Cu3O7-δ thin films over large areas by pulsed laser ablation with substrate scanning

Journal of applied physics, 1991-05, Vol.69 (10), p.7182-7188

1991

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Chemical vapor infiltration of SiC with microwave heating

Journal of materials research, 1993-05, Vol.8 (5), p.1057-1067

1993

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Negative ion density fronts during ignition and extinction of plasmas in electronegative gases

Physical review letters, 2000-02, Vol.84 (9), p.1918-1921

2000

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Hybrid simulation of a dc-enhanced radio-frequency capacitive discharge in hydrogen

Negative ion destruction by O(3P) atoms and O2(a 1Δg) molecules in an oxygen plasma

The anomalous skin effect in gas discharge plasmas

Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4

Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: excitation dynamics and ion flux asymmetry

Pulsed plasma etching for semiconductor manufacturing

Spatiotemporal electron dynamics in radio-frequency glow discharges: fluid versus dynamic Monte Carlo simulations

Bifurcation Analysis of Thermal Runaway in Microwave Heating of Ceramics

Plasma molding over surface topography: Simulation of ion flow, and energy and angular distributions over steps in RF high-density plasmas

Fluid simulations of glow discharges : effect of metastable atoms in argon

Fluid simulation of a pulsed-power inductively coupled argon plasma

Anisotropic etching of polymer films by high energy (∼100s of eV) oxygen atom neutral beams

Spatio-temporal evolution of a pulsed chlorine discharge

Control of ion energy distributions using a pulsed plasma with synchronous bias on a boundary electrode

Plasma molding over surface topography: Simulation and measurement of ion fluxes, energies and angular distributions over trenches in RF high density plasmas

Direct simulation Monte Carlo (DSMC) of rarefied gas flow during etching of large diameter (300-mm) wafers

Spatially Resolved Measurements of Argon Metastable (1) Density in a High Pressure Microdischarge Using Diode Laser Absorption Spectroscopy

Ion energy distributions in inductively coupled plasmas having a biased boundary electrode

Simulation images from a low-pressure chlorine plasma reactor using DSMC

Plasma enhanced layer-by-layer deposition and nanocrystallization of hydrogenated amorphous silicon films

Ion–ion plasmas and double layer formation in weakly collisional electronegative discharges

Particle-in-cell simulation of ion flow through a hole in contact with plasma

Deposition of high quality YBa2Cu3O7-δ thin films over large areas by pulsed laser ablation with substrate scanning

Chemical vapor infiltration of SiC with microwave heating

Negative ion density fronts during ignition and extinction of plasmas in electronegative gases

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