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High temperature operation of InGaAsP/InP heterostructure lasers and integrated back facet monitors fabricated by chemically assisted ion beam etching

Applied physics letters, 1993-05, Vol.62 (20), p.2486-2488

1993

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Decapsulation and Photoresist Stripping in Oxygen Microwave Plasmas

Journal of the Electrochemical Society, 1982-11, Vol.129 (11), p.2537-2541

1982

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Optical spectroscopy during reactive ion beam etching of Si and Al targets

Journal of applied physics, 1982-06, Vol.53 (6), p.4389-4394

1982

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ECR Plasma Deposition of Dielectrics for Optoelectronic Applications

MRS proceedings, 1989, Vol.165, Article 91

Dzioba, Steven

1989

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On the kinetic energies of sputtered excited particles: II. Theory and applications to group IIA fluorides

Surface science, 1980, Vol.100 (1), p.119-134

1980

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On the kinetic energies of sputtered excited particles, I. Atoms sputtered from Li, LiF, and NaCl

Radiation effects, 1980-01, Vol.45 (3-4), p.235-245

1980

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Downstream Plasma Induced Deposition of SiN x on Si, InP , and InGaAs

Journal of the Electrochemical Society, 1987-10, Vol.134 (10), p.2599-2603

1987

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On the kinetic energies of sputtered excited particles

Surface science, 1980-10, Vol.100 (1), p.119-134

1980

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The Sputtering of High Energy Particles

Dzioba, Steven

1981

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Recoil implantation from a thin source

Journal of nuclear materials, 1978-09, Vol.76-77, p.175-182

1978

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Dielectric thin film deposition by electron cyclotron resonance plasma chemical vapor deposition for optoelectronics

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1994-01, Vol.12 (1), p.433-440

1994

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On the kinetic energies of sputtered excited particles: III. Recoil sputtering as a source of high-energy particles

Nuclear instruments & methods, 1981, Vol.182, p.207-213

1981

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Recoil implantation from a thin source: II. Extension to the problems of recoil sputtering and of moderately thick sources

Journal of nuclear materials, 1978, Vol.76, p.175-182

1978

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On the kinetic energies of sputtered excited particles

Nuclear instruments & methods, 1981-04, Vol.182-183, p.207-213

1981

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On the kinetic energies of sputtered excited particles

Surface science letters, 1980-10, Vol.100 (1), p.A386

1980

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On the kinetic energies of sputtered excited particles: II. Theory and applications to group IIA fluorides

Surface science letters, 1980, Vol.100 (1), p.A386-A386

1980

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On the problem of whether the transition probability plays a role in describing secondary-photon yields

Surface science, 1980-01, Vol.97 (1), p.243-256

1980

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On the surface-normal energy distribution of sputtered recoils

Radiation effects, 1979-01, Vol.45 (1-2), p.45-48

1979

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On the problem of whether the transition probability plays a role in describing secondary-photon yields

Surface science letters, 1980-07, Vol.97 (1), p.A246-A246

1980

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Wafer scale processing of InGaAsP/InP lasers

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1994-07, Vol.12 (4), p.2848-2851

1994

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Refractory Disseminated Coccidioidomycosis and Mycobacteriosis in Interferon-γ Receptor 1 Deficiency

Clinical infectious diseases, 2009-09, Vol.49 (6), p.e62-e65

2009

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High temperature operation of InGaAsP/InP heterostructure lasers and integrated back facet monitors fabricated by chemically assisted ion beam etching

Decapsulation and Photoresist Stripping in Oxygen Microwave Plasmas

Optical spectroscopy during reactive ion beam etching of Si and Al targets

ECR Plasma Deposition of Dielectrics for Optoelectronic Applications

On the kinetic energies of sputtered excited particles: II. Theory and applications to group IIA fluorides

On the kinetic energies of sputtered excited particles, I. Atoms sputtered from Li, LiF, and NaCl

Downstream Plasma Induced Deposition of SiN x on Si, InP , and InGaAs

On the kinetic energies of sputtered excited particles

The Sputtering of High Energy Particles

Recoil implantation from a thin source

Dielectric thin film deposition by electron cyclotron resonance plasma chemical vapor deposition for optoelectronics

On the kinetic energies of sputtered excited particles: III. Recoil sputtering as a source of high-energy particles

Recoil implantation from a thin source: II. Extension to the problems of recoil sputtering and of moderately thick sources

On the kinetic energies of sputtered excited particles

On the kinetic energies of sputtered excited particles

On the kinetic energies of sputtered excited particles: II. Theory and applications to group IIA fluorides

On the problem of whether the transition probability plays a role in describing secondary-photon yields

On the surface-normal energy distribution of sputtered recoils

On the problem of whether the transition probability plays a role in describing secondary-photon yields

Wafer scale processing of InGaAsP/InP lasers

Refractory Disseminated Coccidioidomycosis and Mycobacteriosis in Interferon-γ Receptor 1 Deficiency

Association of Primary Tumor Volume With Survival in Patients With T3 Glottic Cancer Treated With Radiotherapy: A Study of the Canadian Head & Neck Collaborative Research Initiative

Tumor volumes in T3 supraglottic cancers treated with radiotherapy in the modern era: A study of the Canadian Head & Neck Collaborative Research Initiative

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