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Etch-pit formation mechanism induced on HPHT and CVD diamond single crystals by H2/O2 plasma etching treatment

Physica status solidi. A, Applications and materials science, 2012-09, Vol.209 (9), p.1715-1720

2012

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Reduction of dislocation densities in single crystal CVD diamond by using self-assembled metallic masks

Diamond and related materials, 2015-09, Vol.58, p.62-68

2015

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Impact of ultra-low Pt loadings on the performance of anode/cathode in a proton-exchange membrane fuel cell

Journal of power sources, 2010-05, Vol.195 (9), p.2737-2746

2010

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Self-assembled subnanolayers as interfacial adhesion enhancers and diffusion barriers for integrated circuits

Applied physics letters, 2003-07, Vol.83 (2), p.383-385

2003

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Influence of surface misorientation of HPHT diamond substrates on crystal morphologies and threading dislocations propagation

Physica status solidi. A, Applications and materials science, 2013-10, Vol.210 (10), p.1985-1990

2013

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Electrodes for carbon nanotube devices by focused electron beam induced deposition of gold

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2005-11, Vol.23 (6), p.3174-3177

2005

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Vanadium Oxide Films Synthesized by CVD and Used as Positive Electrodes in Secondary Lithium Batteries

Journal of the Electrochemical Society, 2004, Vol.151 (3), p.A368

2004

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Study of the Li+ insertion into V2O5 films deposited by CVD onto various substrates

Journal of power sources, 2007-11, Vol.174 (1), p.312-320

2007

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Textured ZnO thin films by sol–gel process: Synthesis and characterizations

Thin solid films, 2016-10, Vol.617, p.156-160

2016

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2-Methyl-1-hexen-3-yne Lewis Base Stabilized β-Diketonate Copper(I) Complexes: X-ray Structures, Theoretical Study, and Low-Temperature Chemical Vapor Deposition of Copper Metal

Chemistry of materials, 2001-11, Vol.13 (11), p.3993-4004

2001

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Etch‐pit formation mechanism induced on HPHT and CVD diamond single crystals by H 2 /O 2 plasma etching treatment: Part of Topical Section on Fundamentals and Applications of Diamond

Physica status solidi. A, Applications and materials science, 2012-09, Vol.209 (9), p.1715-1720

2012

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Electron beam induced deposition of rhodium from the precursor [RhCl(PF 3) 2] 2: morphology, structure and chemical composition

Journal of crystal growth, 2004-05, Vol.265 (3), p.619-626

2004

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Why is coordination chemistry stretching the limits of micro-electronics technology?

Coordination chemistry reviews, 1998-12, Vol.178, p.1785-1809

Doppelt, Pascal

1998

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Comparative Study of Cu Precursors for 3D Focused Electron Beam Induced Deposition

Journal of the Electrochemical Society, 2004, Vol.151 (8), p.C535

2004

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Copper nucleation by chemical vapour deposition on organosilane treated SiO2 surfaces

Surface science, 2004-08, Vol.562 (1-3), p.157-169

2004

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Evaluation of (hfac)Cu(MHY) for Cu CVD

Microelectronic engineering, 2002-10, Vol.64 (1), p.107-115

2002

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Auger electron spectroscopy analysis of high metal content micro-structures grown by electron beam induced deposition

Applied surface science, 2005-03, Vol.242 (1), p.107-113

2005

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Comparative Study of Cu-Precursors for 3D Focused Electron Beam Induced Deposition

Journal of the Electrochemical Society, 2004, Vol.151 (9), p.C590

2004

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Formation Study and X-ray Structures of Dinuclear β-Diketonate Copper(I) Complexes with Conjugated Ene−Yne Lewis Base. Implications for the Use of (hfac)Cu(MHY) as a Precursor for Copper CVD

Inorganic chemistry, 2001-11, Vol.40 (24), p.6167-6171

2001

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An experimental and theoretical study of [RhCl(PF3)2]2 fragmentation

Physical chemistry chemical physics : PCCP, 2003-01, Vol.5 (2), p.268-274

2003

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High affinity self-assembled monolayers for copper CVD

Microelectronic engineering, 2004-10, Vol.76 (1-4), p.113-118

2004

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Comparative Study of Cu-Precursors for 3D Focused Electron Beam Induced Deposition [J. Electrochem. Soc., 151, C535 (2004)] [J. Electrochem. Soc., 151, C590 (2004)]

Journal of the Electrochemical Society, 2005, Vol.152 (1), p.L1

2005

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Electron beam induced deposition of metallic tips and wires for microelectronics applications

Microelectronic engineering, 2000-06, Vol.53 (1), p.261-264

2000

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Study of platinum thin films deposited by MOCVD as electrodes for oxide applications

Microelectronic engineering, 2002-10, Vol.64 (1), p.457-463

2002

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Laser-assisted deposition of Pd-doped diamond-like films from liquid hydrocarbons and their use for glass metallization

Applied surface science, 2002-01, Vol.186 (1), p.227-231

2002

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Etch-pit formation mechanism induced on HPHT and CVD diamond single crystals by H2/O2 plasma etching treatment

Reduction of dislocation densities in single crystal CVD diamond by using self-assembled metallic masks

Impact of ultra-low Pt loadings on the performance of anode/cathode in a proton-exchange membrane fuel cell

Self-assembled subnanolayers as interfacial adhesion enhancers and diffusion barriers for integrated circuits

Influence of surface misorientation of HPHT diamond substrates on crystal morphologies and threading dislocations propagation

Electrodes for carbon nanotube devices by focused electron beam induced deposition of gold

Vanadium Oxide Films Synthesized by CVD and Used as Positive Electrodes in Secondary Lithium Batteries

Study of the Li+ insertion into V2O5 films deposited by CVD onto various substrates

Textured ZnO thin films by sol–gel process: Synthesis and characterizations

2-Methyl-1-hexen-3-yne Lewis Base Stabilized β-Diketonate Copper(I) Complexes: X-ray Structures, Theoretical Study, and Low-Temperature Chemical Vapor Deposition of Copper Metal

Etch‐pit formation mechanism induced on HPHT and CVD diamond single crystals by H 2 /O 2 plasma etching treatment: Part of Topical Section on Fundamentals and Applications of Diamond

Electron beam induced deposition of rhodium from the precursor [RhCl(PF 3) 2] 2: morphology, structure and chemical composition

Why is coordination chemistry stretching the limits of micro-electronics technology?

Comparative Study of Cu Precursors for 3D Focused Electron Beam Induced Deposition

Copper nucleation by chemical vapour deposition on organosilane treated SiO2 surfaces

Evaluation of (hfac)Cu(MHY) for Cu CVD

Auger electron spectroscopy analysis of high metal content micro-structures grown by electron beam induced deposition

Comparative Study of Cu-Precursors for 3D Focused Electron Beam Induced Deposition

Formation Study and X-ray Structures of Dinuclear β-Diketonate Copper(I) Complexes with Conjugated Ene−Yne Lewis Base. Implications for the Use of (hfac)Cu(MHY) as a Precursor for Copper CVD

An experimental and theoretical study of [RhCl(PF3)2]2 fragmentation

High affinity self-assembled monolayers for copper CVD

Comparative Study of Cu-Precursors for 3D Focused Electron Beam Induced Deposition [J. Electrochem. Soc., 151, C535 (2004)] [J. Electrochem. Soc., 151, C590 (2004)]

Electron beam induced deposition of metallic tips and wires for microelectronics applications

Study of platinum thin films deposited by MOCVD as electrodes for oxide applications

Laser-assisted deposition of Pd-doped diamond-like films from liquid hydrocarbons and their use for glass metallization

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