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Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-07, Vol.30 (4)

2012

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PCR-based detection of Aspergillus fumigatus Cyp51A mutations on bronchoalveolar lavage: a multicentre validation of the AsperGenius assay® in 201 patients with haematological disease suspected for invasive aspergillosis

Journal of antimicrobial chemotherapy, 2016-12, Vol.71 (12), p.3528-3535

2016

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Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface

Journal of applied physics, 2012-05, Vol.111 (9)

2012

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Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

Applied physics letters, 2010-10, Vol.97 (15)

2010

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Influence of the SiO2 interlayer thickness on the density and polarity of charges in Si/SiO2/Al2O3 stacks as studied by optical second-harmonic generation

Journal of applied physics, 2014-01, Vol.115 (3)

2014

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Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition

Journal of applied physics, 2011-11, Vol.110 (9)

2011

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Interspecies discrimination of A. fumigatus and siblings A. lentulus and A. felis of the Aspergillus section Fumigati using the AsperGenius® assay

Diagnostic microbiology and infectious disease, 2017-03, Vol.87 (3), p.247-252

2017

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Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition

Physica status solidi. PSS-RRL. Rapid research letters, 2010-02, Vol.4 (1-2), p.10-12

2010

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Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

Journal of the Electrochemical Society, 2010, Vol.157 (7), p.P66

2010

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Stability of Al2O3 and Al2O3/a-SiNx:H stacks for surface passivation of crystalline silicon

Journal of applied physics, 2009-12, Vol.106 (11)

2009

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Role of field-effect on c-Si surface passivation by ultrathin (2–20 nm) atomic layer deposited Al2O3

Applied physics letters, 2010-03, Vol.96 (11)

2010

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Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film

Physica status solidi. PSS-RRL. Rapid research letters, 2011-01, Vol.5 (1), p.22-24

2011

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(Invited) Aluminum Oxide and Other ALD Materials for Si Surface Passivation

ECS transactions, 2011, Vol.41 (2), p.293-301

2011

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Composition and bonding structure of plasma-assisted ALD Al2O3 films

Physica status solidi. C, 2010-04, Vol.7 (3-4), p.976-979

2010

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Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses

Plasma processes and polymers, 2012-08, Vol.9 (8), p.761-771

2012

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The atomic hydrogen flux to silicon growth flux ratio during microcrystalline silicon solar cell deposition

Applied physics letters, 2008-09, Vol.93 (11), p.111914-111914-3

2008

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In-situ transmission measurements as process control for thin-film silicon solar cells

Solar energy materials and solar cells, 2011-12, Vol.95 (12), p.3328-3332

2011

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Passivation of n ^-Type Si Surfaces by Low Temperature Processed SiO /Al O Stacks

IEEE journal of photovoltaics, 2013-07, Vol.3 (3), p.925-929

2013

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Plasma-Assisted ALD for the Conformal Deposition of SiO 2 : Process, Material and Electronic Properties

Journal of the Electrochemical Society, 2012, Vol.159 (3), p.H277-H285

2012

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Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks

Applied physics letters, 2011-05, Vol.98 (22)

2011

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A new concept for spatially divided Deep Reactive Ion Etching with ALD-based passivation

IOP conference series. Materials Science and Engineering, 2012-01, Vol.41 (1), p.12001-7

2012

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Do the new molecular assays-microarray and realtime polymerase chain reaction-for dermatophyte detection keep what they promise?

Hautarzt, 2019-08, Vol.70 (8), p.618-626

2019

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“Zero-charge” SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition

Solar energy materials and solar cells, 2015-12, Vol.143, p.450-456

2015

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Comparison between aluminum oxide surface passivation films deposited with thermal ALD, plasma ALD and PECVD

2010 35th IEEE Photovoltaic Specialists Conference, 2010, p.003118-003121

2010

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Firing stability of atomic layer deposited Al2O3 for c-Si surface passivation

2009 34th IEEE Photovoltaic Specialists Conference (PVSC), 2009, p.000705-000708

2009

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Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

PCR-based detection of Aspergillus fumigatus Cyp51A mutations on bronchoalveolar lavage: a multicentre validation of the AsperGenius assay® in 201 patients with haematological disease suspected for invasive aspergillosis

Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface

Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

Influence of the SiO2 interlayer thickness on the density and polarity of charges in Si/SiO2/Al2O3 stacks as studied by optical second-harmonic generation

Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition

Interspecies discrimination of A. fumigatus and siblings A. lentulus and A. felis of the Aspergillus section Fumigati using the AsperGenius® assay

Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition

Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

Stability of Al2O3 and Al2O3/a-SiNx:H stacks for surface passivation of crystalline silicon

Role of field-effect on c-Si surface passivation by ultrathin (2–20 nm) atomic layer deposited Al2O3

Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film

(Invited) Aluminum Oxide and Other ALD Materials for Si Surface Passivation

Composition and bonding structure of plasma-assisted ALD Al2O3 films

Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses

The atomic hydrogen flux to silicon growth flux ratio during microcrystalline silicon solar cell deposition

In-situ transmission measurements as process control for thin-film silicon solar cells

Passivation of n ^-Type Si Surfaces by Low Temperature Processed SiO /Al O Stacks

Plasma-Assisted ALD for the Conformal Deposition of SiO 2 : Process, Material and Electronic Properties

Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks

A new concept for spatially divided Deep Reactive Ion Etching with ALD-based passivation

Do the new molecular assays-microarray and realtime polymerase chain reaction-for dermatophyte detection keep what they promise?

“Zero-charge” SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition

Comparison between aluminum oxide surface passivation films deposited with thermal ALD, plasma ALD and PECVD

Firing stability of atomic layer deposited Al2O3 for c-Si surface passivation

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