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Reactive Sputter Deposition

1. Aufl., 2008

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On the grain size-thickness correlation for thin films

Acta materialia, 2021-06, Vol.212, p.116896, Article 116896

2021

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Understanding residual stress in thin films: Analyzing wafer curvature measurements for Ag, Cu, Ni, Fe, Ti, and Cr with a kinetic model

Journal of applied physics, 2021-10, Vol.130 (13)

2021

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Influence of Impurities on the Front Velocity of Sputter Deposited Al/CuO Thermite Multilayers

Materials, 2021-11, Vol.14 (23), p.7224

2021

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Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films

Journal of alloys and compounds, 2021-01, Vol.850, p.156740, Article 156740

2021

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Synthesis, Crystal Structures, and Luminescence Properties of Carboxylate Based Rare-Earth Coordination Polymers

Inorganic chemistry, 2012-11, Vol.51 (21), p.11623-11634

2012

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Effect of Growth Temperature and Atmosphere Exposure Time on Impurity Incorporation in Sputtered Mg, Al, and Ca Thin Films

Materials, 2023-01, Vol.16 (1), p.414

2023

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Extracting organic contaminants from water using the metal-organic framework CrIII(OH)·{O2C-C6H4-CO2}

Physical chemistry chemical physics : PCCP, 2011-01, Vol.13 (13), p.5587-5589

2011

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Sputter deposition with powder targets: An overview

Vacuum, 2021-02, Vol.184, p.109892, Article 109892

Depla, Diederik

2021

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An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment

Surface science, 2006-09, Vol.600 (17), p.3512-3517

2006

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Chemical Stability of Sputter Deposited Silver Thin Films

Coatings (Basel), 2022-12, Vol.12 (12), p.1915

Depla, Diederik

2022

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Bio-Based Nitriles from the Heterogeneously Catalyzed Oxidative Decarboxylation of Amino Acids

ChemSusChem, 2015-01, Vol.8 (2), p.345-352

2015

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The Target Material Influence on the Current Pulse during High Power Pulsed Magnetron Sputtering

Frontiers in physics, 2017-10, Vol.5

2017

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Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering

Applied surface science, 2023-03, Vol.613, p.155901, Article 155901

2023

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Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures

Thin solid films, 2021-08, Vol.732, p.138721, Article 138721

2021

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Analysis of stress in sputter-deposited films using a kinetic model for Cu, Ni, Co, Cr, Mo, W

Applied surface science, 2023-03, Vol.613, p.156000, Article 156000

2023

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Sputter deposition of copper oxide films

Applied surface science, 2019-10, Vol.492, p.711-717

2019

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On the electrical properties of sputter deposited thin films: The role of energy and impurity flux

Thin solid films, 2019-11, Vol.690, p.137540, Article 137540

2019

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PM2.5 and PM10 adsorption onto filters and surfaces functionalized with calcium carbonate particle assembly

Colloids and surfaces. A, Physicochemical and engineering aspects, 2024-01, Vol.680, p.132617, Article 132617

2024

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The effect of energy and momentum transfer during magnetron sputter deposition of yttrium oxide thin films

Applied surface science, 2018-05, Vol.439, p.545-551

2018

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Effect of processing conditions on residual stress in sputtered transition metal nitrides (TiN, ZrN and TaN): Experiments and modeling

Surface & coatings technology, 2022-10, Vol.447, p.128880, Article 128880

2022

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Linking simulated polycrystalline thin film microstructures to physical vapor deposition conditions

Acta materialia, 2023-02, Vol.245, p.118581, Article 118581

2023

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Plasmonic effects in the neutralization of slow ions at a metallic surface

Contributions to plasma physics (1988), 2024-01, Vol.64 (1), p.n/a

2024

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On the influence of local oxygen addition on the growth of sputter deposited yttrium oxide thin films

Surface & coatings technology, 2019-01, Vol.357, p.768-773

2019

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High entropy alloy thin films deposited by magnetron sputtering of powder targets

Thin solid films, 2015-04, Vol.580, p.71-76

2015

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Reactive Sputter Deposition

On the grain size-thickness correlation for thin films

Understanding residual stress in thin films: Analyzing wafer curvature measurements for Ag, Cu, Ni, Fe, Ti, and Cr with a kinetic model

Influence of Impurities on the Front Velocity of Sputter Deposited Al/CuO Thermite Multilayers

Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films

Synthesis, Crystal Structures, and Luminescence Properties of Carboxylate Based Rare-Earth Coordination Polymers

Effect of Growth Temperature and Atmosphere Exposure Time on Impurity Incorporation in Sputtered Mg, Al, and Ca Thin Films

Extracting organic contaminants from water using the metal-organic framework CrIII(OH)·{O2C-C6H4-CO2}

Sputter deposition with powder targets: An overview

An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment

Chemical Stability of Sputter Deposited Silver Thin Films

Bio-Based Nitriles from the Heterogeneously Catalyzed Oxidative Decarboxylation of Amino Acids

The Target Material Influence on the Current Pulse during High Power Pulsed Magnetron Sputtering

Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering

Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures

Analysis of stress in sputter-deposited films using a kinetic model for Cu, Ni, Co, Cr, Mo, W

Sputter deposition of copper oxide films

On the electrical properties of sputter deposited thin films: The role of energy and impurity flux

PM2.5 and PM10 adsorption onto filters and surfaces functionalized with calcium carbonate particle assembly

The effect of energy and momentum transfer during magnetron sputter deposition of yttrium oxide thin films

Effect of processing conditions on residual stress in sputtered transition metal nitrides (TiN, ZrN and TaN): Experiments and modeling

Linking simulated polycrystalline thin film microstructures to physical vapor deposition conditions

Plasmonic effects in the neutralization of slow ions at a metallic surface

On the influence of local oxygen addition on the growth of sputter deposited yttrium oxide thin films

High entropy alloy thin films deposited by magnetron sputtering of powder targets

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