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The measurement and impact of negative oxygen ions during reactive sputter deposition

Critical reviews in solid state and materials sciences, 2024-07, Vol.49 (4), p.718-753

Depla, D.

2024

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Tutorial: Hysteresis during the reactive magnetron sputtering process

Journal of applied physics, 2018-12, Vol.124 (24)

2018

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A time-dependent model for reactive sputter deposition

Journal of physics. D, Applied physics, 2014-06, Vol.47 (23), p.235302

2014

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Reactive Sputter Deposition

1. Aufl., 2008

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High entropy alloy thin films deposited by magnetron sputtering of powder targets

Thin solid films, 2015-04, Vol.580, p.71-76

2015

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Sputter yield measurements to evaluate the target state during reactive magnetron sputtering

Surface & coatings technology, 2020-10, Vol.399, p.126097, Article 126097

2020

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Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate

Journal of physics. D, Applied physics, 2009-03, Vol.42 (5), p.053002

2009

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A computational study of the double hysteresis phenomenon during reactive sputtering

Journal of physics. D, Applied physics, 2022-09, Vol.55 (35), p.355302

2022

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The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulation

Journal of physics. D, Applied physics, 2008-10, Vol.41 (20), p.205307-205307 (6)

2008

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Anomalous effects in the aluminum oxide sputtering yield

Journal of physics. D, Applied physics, 2018-03, Vol.51 (15), p.155202

2018

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On the amorphous nature of sputtered thin film alloys

Acta materialia, 2016-05, Vol.109, p.323-329

2016

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Magnetron sputter deposition: Linking discharge voltage with target properties

Thin solid films, 2009-03, Vol.517 (9), p.2825-2839

2009

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Magnetron sputter deposition as visualized by Monte Carlo modeling

Thin solid films, 2012-08, Vol.520 (20), p.6337-6354

2012

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Biaxial alignment in sputter deposited thin films

Thin solid films, 2006-12, Vol.515 (4), p.1229-1249

2006

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Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?

Journal of applied physics, 2017-02, Vol.121 (8)

2017

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Influence of deposition conditions on the composition, texture and microstructure of RF-magnetron sputter-deposited hydroxyapatite thin films

Thin solid films, 2015-09, Vol.591, p.368-374

2015

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Note on the low deposition rate during reactive magnetron sputtering

Vacuum, 2024-10, Vol.228, p.113546, Article 113546

Depla, D.

2024

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Sputter deposition of porous thin films from metal/NaCl powder targets

Applied physics letters, 2019-07, Vol.115 (4)

2019

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Modeling target erosion during reactive sputtering

Applied surface science, 2015-03, Vol.331, p.185-192

2015

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The influence of Ge and In addition on the phase formation of CoCrCuFeNi high-entropy alloy thin films

Thin solid films, 2016-10, Vol.616, p.703-710

2016

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Reactive sputter deposition of CoCrCuFeNi in oxygen/argon mixtures

Surface & coatings technology, 2019-11, Vol.378, p.124362, Article 124362

2019

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On the role of chemisorption in the formation of the target surface compound layer during reactive magnetron sputtering

Vacuum, 2023-11, Vol.217, p.112391, Article 112391

Depla, D.

2023

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Quantitative correlation between intrinsic stress and microstructure of thin films

Thin solid films, 2016-04, Vol.604, p.90-93

2016

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Impurity dominated thin film growth

Applied physics letters, 2018-05, Vol.112 (22)

2018

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An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering

Surface & coatings technology, 2018-11, Vol.353, p.231-236

2018

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The measurement and impact of negative oxygen ions during reactive sputter deposition

Tutorial: Hysteresis during the reactive magnetron sputtering process

A time-dependent model for reactive sputter deposition

Reactive Sputter Deposition

High entropy alloy thin films deposited by magnetron sputtering of powder targets

Sputter yield measurements to evaluate the target state during reactive magnetron sputtering

Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate

A computational study of the double hysteresis phenomenon during reactive sputtering

The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulation

Anomalous effects in the aluminum oxide sputtering yield

On the amorphous nature of sputtered thin film alloys

Magnetron sputter deposition: Linking discharge voltage with target properties

Magnetron sputter deposition as visualized by Monte Carlo modeling

Biaxial alignment in sputter deposited thin films

Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?

Influence of deposition conditions on the composition, texture and microstructure of RF-magnetron sputter-deposited hydroxyapatite thin films

Note on the low deposition rate during reactive magnetron sputtering

Sputter deposition of porous thin films from metal/NaCl powder targets

Modeling target erosion during reactive sputtering

The influence of Ge and In addition on the phase formation of CoCrCuFeNi high-entropy alloy thin films

Reactive sputter deposition of CoCrCuFeNi in oxygen/argon mixtures

On the role of chemisorption in the formation of the target surface compound layer during reactive magnetron sputtering

Quantitative correlation between intrinsic stress and microstructure of thin films

Impurity dominated thin film growth

An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering

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