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Dry Deposition and Dry Development of Metal Oxide Based Photoresist

Journal of Photopolymer Science and Technology, 2024/06/25, Vol.37(3), pp.257-262

2024

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Patterning Material Challenges for Improving EUV Stochastics

Journal of Photopolymer Science and Technology, 2019/06/24, Vol.32(1), pp.169-177

2019

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Hydroxyphenylbenzene derivatives as glass forming molecules for high resolution photoresists

Journal of materials chemistry, 2008, Vol.18 (16), p.1903-1910

2008

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Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer DepositionDefectivity Reduction by Monolayer Design

ACS applied materials & interfaces, 2018-11, Vol.10 (44), p.38630-38637

2018

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Molecular Glass Resists as High-Resolution Patterning Materials

Advanced materials (Weinheim), 2008-09, Vol.20 (17), p.3355-3361

2008

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Study of the Structure−Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography

Chemistry of materials, 2008-02, Vol.20 (4), p.1606-1613

2008

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A Fundamental Study on Dissolution Behavior of High-Resolution Molecular Glass Photoresists

Chemistry of materials, 2008-12, Vol.20 (23), p.7292-7300

2008

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Special Section Guest Editorial: Non-chemically Amplified Resists for EUV Lithography

Journal of Micro/Nanopatterning, Materials, and Metrology, 2022-10, Vol.21 (4)

2022

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Calix[4]resorcinarene Derivatives as High-Resolution Resist Materials for Supercritical CO2 Processing

Advanced materials (Weinheim), 2008-04, Vol.20 (7), p.1303-1309

2008

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Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes

Science (American Association for the Advancement of Science), 2010-05, Vol.328 (5979), p.732-735

2010

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E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography

Journal of Micro/Nanopatterning, Materials, and Metrology, 2023-10, Vol.22 (4)

2023

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Study of alternate hardmasks for extreme ultraviolet patterning

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2016-11, Vol.34 (6)

2016

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Dissolution phenomena of phenolic molecular glass photoresist films in supercritical CO2

Journal of materials chemistry, 2007-01, Vol.17 (43), p.4598-4604

2007

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Defect detection strategies and process partitioning for single-expose EUV patterning

Journal of micro/nanolithography, MEMS, and MOEMS, 2019-01, Vol.18 (1), p.1

2019

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Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer

Journal of micro/nanolithography, MEMS, and MOEMS, 2017-07, Vol.16 (3), p.1

2017

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Characterization of the Photoacid Diffusion Length and Reaction Kinetics in EUV Photoresists with IR Spectroscopy

Macromolecules, 2010-05, Vol.43 (9), p.4275-4286

2010

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Calix[4]resorcinarene Derivatives as High‐Resolution Resist Materials for Supercritical CO 2 Processing

Advanced materials (Weinheim), 2008-04, Vol.20 (7), p.1303-1309

2008

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Comparing PVD Titanium Nitride Film Properties and their Effect on Beyond 7 nm EUV Patterning

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2020, p.1-5

2020

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Hydroxyphenylbenzene derivatives as glass forming molecules for high resolution photoresists

Journal of materials chemistry, 2008-04, Vol.18 (16), p.1903-1910

2008

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Inorganic hardmask development for extreme ultraviolet patterning

Journal of micro/nanolithography, MEMS, and MOEMS, 2019-01, Vol.18 (1), p.1

2019

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Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch

Journal of micro/nanolithography, MEMS, and MOEMS, 2020-07, Vol.19 (3), p.1

2020

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Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator

Journal of materials chemistry, 2009-01, Vol.19 (18), p.2683-2694

2009

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Material and process improvements towards sub 36nm pitch EUV single exposure

2019 IEEE Albany Nanotechnology Symposium (ANS), 2019, p.1-5

2019

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Development of TiO 2 containing hardmasks through plasma-enhanced atomic layer deposition

Journal of micro/nanolithography, MEMS, and MOEMS, 2017-05, Vol.16 (2), p.23504

2017

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Molecular glass photoresists for high resolution patterning

De Silva, Ekmini Anuja

2009

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Dry Deposition and Dry Development of Metal Oxide Based Photoresist

Patterning Material Challenges for Improving EUV Stochastics

Hydroxyphenylbenzene derivatives as glass forming molecules for high resolution photoresists

Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer DepositionDefectivity Reduction by Monolayer Design

Molecular Glass Resists as High-Resolution Patterning Materials

Study of the Structure−Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography

A Fundamental Study on Dissolution Behavior of High-Resolution Molecular Glass Photoresists

Special Section Guest Editorial: Non-chemically Amplified Resists for EUV Lithography

Calix[4]resorcinarene Derivatives as High-Resolution Resist Materials for Supercritical CO2 Processing

Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes

E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography

Study of alternate hardmasks for extreme ultraviolet patterning

Dissolution phenomena of phenolic molecular glass photoresist films in supercritical CO2

Defect detection strategies and process partitioning for single-expose EUV patterning

Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer

Characterization of the Photoacid Diffusion Length and Reaction Kinetics in EUV Photoresists with IR Spectroscopy

Calix[4]resorcinarene Derivatives as High‐Resolution Resist Materials for Supercritical CO 2 Processing

Comparing PVD Titanium Nitride Film Properties and their Effect on Beyond 7 nm EUV Patterning

Hydroxyphenylbenzene derivatives as glass forming molecules for high resolution photoresists

Inorganic hardmask development for extreme ultraviolet patterning

Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch

Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator

Material and process improvements towards sub 36nm pitch EUV single exposure

Development of TiO 2 containing hardmasks through plasma-enhanced atomic layer deposition

Molecular glass photoresists for high resolution patterning

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