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Titanium oxide thin films deposited by high-power impulse magnetron sputtering

Thin solid films, 2006-11, Vol.515 (3), p.1182-1186

2006

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Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges

Journal of applied physics, 2006-01, Vol.99 (1), p.013307-013307-5

2006

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Size and segregation effects on the phase diagrams of nanoparticles of binary systems

Nanotechnology, 2001-03, Vol.12 (1), p.68-74

2001

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Growth of ultrathin Ti films deposited on SnO2 by magnetron sputtering

Thin solid films, 2003-08, Vol.437 (1-2), p.57-62

2003

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Preparation and characterization of gasochromic thin films

Thin solid films, 2006-04, Vol.502 (1), p.265-269

2006

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Transport of ionized metal atoms in high-power pulsed magnetron discharges assisted by inductively coupled plasma

Applied physics letters, 2006-01, Vol.88 (2), p.021501-021501-3

2006

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Measurement of ionic and neutral densities in amplified magnetron discharges by pulsed absorption spectroscopy

Journal of applied physics, 2004-03, Vol.95 (5), p.2900-2905

2004

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On the phase diagram of non-spherical nanoparticles

Journal of physics. Condensed matter, 2003-06, Vol.15 (21), p.3651-3655

2003

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Study of ZrN layers deposited by reactive magnetron sputtering

Surface & coatings technology, 2003-09, Vol.174, p.240-245

2003

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Study of the moisture and thermal resistance of AlN/ZrN/AlN multilayers coating

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.94-99

2005

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Phase diagrams of small particles of binary systems: a theoretical approach

Nanotechnology, 2000-03, Vol.11 (1), p.6-9

2000

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Density and temperature in an inductively amplified magnetron discharge for titanium deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2002-07, Vol.20 (4), p.1488-1491

2002

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Deposition of titanium oxide films by reactive High Power Impulse Magnetron Sputtering (HiPIMS): Influence of the peak current value on the transition from metallic to poisoned regimes

Surface & coatings technology, 2012-04, Vol.206 (16), p.3542-3549

2012

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Increasing the deposition rate of oxide films by increasing the plasma reactivity

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.448-452

2005

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Characterization of an Ar/N2 reactive amplified magnetron discharges by Atomic Absorption Spectroscopy and Glow Discharge Mass Spectrometry

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.841-845

2005

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RF amplified magnetron source for efficient titanium nitride deposition

Surface & coatings technology, 2003-09, Vol.174, p.100-106

2003

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Experimental and theoretical studies of the DC reactive magnetron sputtering deposition of silver oxide thin films

Surface & coatings technology, 2003-09, Vol.174, p.1282-1286

2003

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Effect of plasma temperature and plasma pulsation frequency on atomic nitrogen production

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.649-654

2005

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Chromium reactive sputtering in argon–oxygen and argon–water vapor mixtures

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.425-430

2005

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Experimental and theoretical study of the role of the gas composition and plasma-surface interactions on the SnOx films stoichiometry prepared by DC magnetron reactive sputtering

Thin solid films, 2003-01, Vol.423 (2), p.125-130

2003

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Emission spectrometry diagnostic of sputtered titanium in magnetron amplified discharges

Journal of applied physics, 2002-07, Vol.92 (1), p.32-36

2002

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Mass spectrometry diagnostic of dc magnetron reactive sputtering

Journal of analytical atomic spectrometry, 2003-01, Vol.18 (6), p.618

2003

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On the migration of defects and impurities in microelectromechanical systems subject to a large number of light pulses

Applied physics. A, Materials science & processing, 2001-10, Vol.73 (4), p.425-427

2001

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Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1999-11, Vol.17 (6), p.3317-3321

1999

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Spatially-resolved spectroscopic optical emission of dc-magnetron sputtering discharges in argon-nitrogen gas mixtures

Plasma sources science & technology, 2000-05, Vol.9 (2), p.152-160

2000

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Titanium oxide thin films deposited by high-power impulse magnetron sputtering

Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges

Size and segregation effects on the phase diagrams of nanoparticles of binary systems

Growth of ultrathin Ti films deposited on SnO2 by magnetron sputtering

Preparation and characterization of gasochromic thin films

Transport of ionized metal atoms in high-power pulsed magnetron discharges assisted by inductively coupled plasma

Measurement of ionic and neutral densities in amplified magnetron discharges by pulsed absorption spectroscopy

On the phase diagram of non-spherical nanoparticles

Study of ZrN layers deposited by reactive magnetron sputtering

Study of the moisture and thermal resistance of AlN/ZrN/AlN multilayers coating

Phase diagrams of small particles of binary systems: a theoretical approach

Density and temperature in an inductively amplified magnetron discharge for titanium deposition

Deposition of titanium oxide films by reactive High Power Impulse Magnetron Sputtering (HiPIMS): Influence of the peak current value on the transition from metallic to poisoned regimes

Increasing the deposition rate of oxide films by increasing the plasma reactivity

Characterization of an Ar/N2 reactive amplified magnetron discharges by Atomic Absorption Spectroscopy and Glow Discharge Mass Spectrometry

RF amplified magnetron source for efficient titanium nitride deposition

Experimental and theoretical studies of the DC reactive magnetron sputtering deposition of silver oxide thin films

Effect of plasma temperature and plasma pulsation frequency on atomic nitrogen production

Chromium reactive sputtering in argon–oxygen and argon–water vapor mixtures

Experimental and theoretical study of the role of the gas composition and plasma-surface interactions on the SnOx films stoichiometry prepared by DC magnetron reactive sputtering

Emission spectrometry diagnostic of sputtered titanium in magnetron amplified discharges

Mass spectrometry diagnostic of dc magnetron reactive sputtering

On the migration of defects and impurities in microelectromechanical systems subject to a large number of light pulses

Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target

Spatially-resolved spectroscopic optical emission of dc-magnetron sputtering discharges in argon-nitrogen gas mixtures

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