UB Paderborn / Katalog / Suche / in CDI

Sortiert nach

Einfacher Volltextzugriff von (fast) überall

Installieren Sie die LibKey Nomad-Browsererweiterung und erhalten Sie von vielen Webseiten einfachen Zugriff auf lizenzierte Volltexte oder Open Access Publikationen. Mehr erfahren...

The measurement and impact of negative oxygen ions during reactive sputter deposition

Critical reviews in solid state and materials sciences, 2024-07, Vol.49 (4), p.718-753

Depla, D.

2024

Volltextzugriff (PDF)

Tutorial: Hysteresis during the reactive magnetron sputtering process

Journal of applied physics, 2018-12, Vol.124 (24)

2018

Volltextzugriff (PDF)

Reactive Sputter Deposition

1. Aufl., 2008

Volltextzugriff (PDF)

A time-dependent model for reactive sputter deposition

Journal of physics. D, Applied physics, 2014-06, Vol.47 (23), p.235302

2014

Volltextzugriff (PDF)

High entropy alloy thin films deposited by magnetron sputtering of powder targets

Thin solid films, 2015-04, Vol.580, p.71-76

2015

Volltextzugriff (PDF)

Sputter yield measurements to evaluate the target state during reactive magnetron sputtering

Surface & coatings technology, 2020-10, Vol.399, p.126097, Article 126097

2020

Volltextzugriff (PDF)

Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate

Journal of physics. D, Applied physics, 2009-03, Vol.42 (5), p.053002

2009

Volltextzugriff (PDF)

A computational study of the double hysteresis phenomenon during reactive sputtering

Journal of physics. D, Applied physics, 2022-09, Vol.55 (35), p.355302

2022

Volltextzugriff (PDF)

The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulation

Journal of physics. D, Applied physics, 2008-10, Vol.41 (20), p.205307-205307 (6)

2008

Volltextzugriff (PDF)

Anomalous effects in the aluminum oxide sputtering yield

Journal of physics. D, Applied physics, 2018-03, Vol.51 (15), p.155202

2018

Volltextzugriff (PDF)

On the amorphous nature of sputtered thin film alloys

Acta materialia, 2016-05, Vol.109, p.323-329

2016

Volltextzugriff (PDF)

Magnetron sputter deposition as visualized by Monte Carlo modeling

Thin solid films, 2012-08, Vol.520 (20), p.6337-6354

2012

Volltextzugriff (PDF)

Magnetron sputter deposition: Linking discharge voltage with target properties

Thin solid films, 2009-03, Vol.517 (9), p.2825-2839

2009

Volltextzugriff (PDF)

Biaxial alignment in sputter deposited thin films

Thin solid films, 2006-12, Vol.515 (4), p.1229-1249

2006

Volltextzugriff (PDF)

Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?

Journal of applied physics, 2017-02, Vol.121 (8)

2017

Volltextzugriff (PDF)

Influence of deposition conditions on the composition, texture and microstructure of RF-magnetron sputter-deposited hydroxyapatite thin films

Thin solid films, 2015-09, Vol.591, p.368-374

2015

Volltextzugriff (PDF)

Note on the low deposition rate during reactive magnetron sputtering

Vacuum, 2024-10, Vol.228, p.113546, Article 113546

Depla, D.

2024

Volltextzugriff (PDF)

Sputter deposition of porous thin films from metal/NaCl powder targets

Applied physics letters, 2019-07, Vol.115 (4)

2019

Volltextzugriff (PDF)

Modeling target erosion during reactive sputtering

Applied surface science, 2015-03, Vol.331, p.185-192

2015

Volltextzugriff (PDF)

Reactive sputter deposition of CoCrCuFeNi in oxygen/argon mixtures

Surface & coatings technology, 2019-11, Vol.378, p.124362, Article 124362

2019

Volltextzugriff (PDF)

On the role of chemisorption in the formation of the target surface compound layer during reactive magnetron sputtering

Vacuum, 2023-11, Vol.217, p.112391, Article 112391

Depla, D.

2023

Volltextzugriff (PDF)

Quantitative correlation between intrinsic stress and microstructure of thin films

Thin solid films, 2016-04, Vol.604, p.90-93

2016

Volltextzugriff (PDF)

Impurity dominated thin film growth

Applied physics letters, 2018-05, Vol.112 (22)

2018

Volltextzugriff (PDF)

An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering

Surface & coatings technology, 2018-11, Vol.353, p.231-236

2018

Volltextzugriff (PDF)

Reactive sputter deposition of CoCrCuFeNi in nitrogen/argon mixtures

Journal of alloys and compounds, 2018-11, Vol.769, p.881-888

2018

Volltextzugriff (PDF)

1 – 25 von 225

Menü

Weitere Dienste

Einstellungen

The measurement and impact of negative oxygen ions during reactive sputter deposition

Tutorial: Hysteresis during the reactive magnetron sputtering process

Reactive Sputter Deposition

A time-dependent model for reactive sputter deposition

High entropy alloy thin films deposited by magnetron sputtering of powder targets

Sputter yield measurements to evaluate the target state during reactive magnetron sputtering

Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate

A computational study of the double hysteresis phenomenon during reactive sputtering

The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulation

Anomalous effects in the aluminum oxide sputtering yield

On the amorphous nature of sputtered thin film alloys

Magnetron sputter deposition as visualized by Monte Carlo modeling

Magnetron sputter deposition: Linking discharge voltage with target properties

Biaxial alignment in sputter deposited thin films

Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?

Influence of deposition conditions on the composition, texture and microstructure of RF-magnetron sputter-deposited hydroxyapatite thin films

Note on the low deposition rate during reactive magnetron sputtering

Sputter deposition of porous thin films from metal/NaCl powder targets

Modeling target erosion during reactive sputtering

Reactive sputter deposition of CoCrCuFeNi in oxygen/argon mixtures

On the role of chemisorption in the formation of the target surface compound layer during reactive magnetron sputtering

Quantitative correlation between intrinsic stress and microstructure of thin films

Impurity dominated thin film growth

An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering

Reactive sputter deposition of CoCrCuFeNi in nitrogen/argon mixtures

Suchergebnisse filtern