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Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

Advanced materials (Weinheim), 2016-07, Vol.28 (27), p.5586-5618

2016

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Using block copolymers as infiltration sites for development of future nanoelectronic devices: Achievements, barriers, and opportunities

Microelectronic engineering, 2018-08, Vol.195, p.74-85

2018

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Precise Synthesis and Thin Film Self-Assembly of PLLA- b -PS Bottlebrush Block Copolymers

Molecules (Basel, Switzerland), 2021-03, Vol.26 (5), p.1412

2021

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Optimization and Control of Large Block Copolymer Self-Assembly via Precision Solvent Vapor Annealing

Macromolecules, 2021-02, Vol.54 (3), p.1203-1215

2021

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Engineering block copolymer materials for patterning ultra-low dimensions

Molecular systems design & engineering, 2020-12, Vol.5 (1), p.1642-1657

2020

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Defining Swelling Kinetics in Block Copolymer Thin Films: The Critical Role of Temperature and Vapour Pressure Ramp

Polymers, 2021-12, Vol.13 (23), p.4238

2021

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Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography

Nanomaterials (Basel, Switzerland), 2017-09, Vol.7 (10), p.304

2017

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Enabling future nanomanufacturing through block copolymer self-assembly: A review

Nano today, 2020-12, Vol.35, p.100936, Article 100936

2020

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Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography

Nanomaterials (Basel, Switzerland), 2018-01, Vol.8 (1), p.32

2018

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Strategy for Enhancing Ultrahigh-Molecular-Weight Block Copolymer Chain Mobility to Access Large Period Sizes (>100 nm)

Langmuir, 2020-11, Vol.36 (46), p.13872-13880

2020

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Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods

ACS omega, 2017-08, Vol.2 (8), p.4417-4423

2017

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Large Block Copolymer Self-Assembly for Fabrication of Subwavelength Nanostructures for Applications in Optics

Nano letters, 2017-05, Vol.17 (5), p.2973-2978

2017

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Electrochemical Sensing of Hydrogen Peroxide Using Block Copolymer Templated Iron Oxide Nanopatterns

Analytical chemistry (Washington), 2018-01, Vol.90 (2), p.1122-1128

2018

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Enabling Large-Area Selective Deposition on Metal-Dielectric Patterns using Polymer Brush Deactivation

Journal of physical chemistry. C, 2018-07, Vol.122 (26), p.14698-14705

2018

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Block Copolymer Directed Metamaterials and Metasurfaces for Novel Optical Devices

Advanced optical materials, 2021-08, Vol.9 (16), p.n/a

2021

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Optimizing Polymer Brush Coverage To Develop Highly Coherent Sub‑5 nm Oxide Films by Ion Inclusion

Chemistry of materials, 2019-11, Vol.31 (22), p.9338-9345

2019

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Rapid Self-Assembly and Sequential Infiltration Synthesis of High χ Fluorine-Containing Block Copolymers

Macromolecules, 2020-08, Vol.53 (15), p.6246-6254

2020

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Non‐Native Block Copolymer Thin Film Nanostructures Derived from Iterative Self‐Assembly Processes

Advanced materials interfaces, 2020-03, Vol.7 (5), p.n/a

2020

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Design and Morphological Investigation of High‑χ Catechol-Containing Styrenic Block Copolymers

Macromolecules, 2022-08, Vol.55 (15), p.6341-6350

2022

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An Ultra-Thin Near-Perfect Absorber via Block Copolymer Engineered Metasurfaces

Journal of colloid and interface science, 2022-03, Vol.609, p.375-383

2022

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Area Selective Polymer Brush Deposition

Macromolecular rapid communications., 2017-08, Vol.38 (16), p.n/a

2017

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Controlled solvent vapor annealing of a high χ block copolymer thin film

Physical chemistry chemical physics : PCCP, 2017, Vol.19 (4), p.2805-2815

2017

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Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l‑lactide) Block Copolymer Thin Films for Directed Self-Assembly Application

ACS applied materials & interfaces, 2016-03, Vol.8 (12), p.8295-8304

2016

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Large area Al 2 O 3 -Au raspberry-like nanoclusters from iterative block-copolymer self-assembly

RSC advances, 2020-11, Vol.10 (67), p.41088-41097

2020

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Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

Using block copolymers as infiltration sites for development of future nanoelectronic devices: Achievements, barriers, and opportunities

Precise Synthesis and Thin Film Self-Assembly of PLLA- b -PS Bottlebrush Block Copolymers

Optimization and Control of Large Block Copolymer Self-Assembly via Precision Solvent Vapor Annealing

Engineering block copolymer materials for patterning ultra-low dimensions

Defining Swelling Kinetics in Block Copolymer Thin Films: The Critical Role of Temperature and Vapour Pressure Ramp

Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography

Enabling future nanomanufacturing through block copolymer self-assembly: A review

Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography

Strategy for Enhancing Ultrahigh-Molecular-Weight Block Copolymer Chain Mobility to Access Large Period Sizes (>100 nm)

Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods

Large Block Copolymer Self-Assembly for Fabrication of Subwavelength Nanostructures for Applications in Optics

Electrochemical Sensing of Hydrogen Peroxide Using Block Copolymer Templated Iron Oxide Nanopatterns

Enabling Large-Area Selective Deposition on Metal-Dielectric Patterns using Polymer Brush Deactivation

Block Copolymer Directed Metamaterials and Metasurfaces for Novel Optical Devices

Optimizing Polymer Brush Coverage To Develop Highly Coherent Sub‑5 nm Oxide Films by Ion Inclusion

Rapid Self-Assembly and Sequential Infiltration Synthesis of High χ Fluorine-Containing Block Copolymers

Non‐Native Block Copolymer Thin Film Nanostructures Derived from Iterative Self‐Assembly Processes

Design and Morphological Investigation of High‑χ Catechol-Containing Styrenic Block Copolymers

An Ultra-Thin Near-Perfect Absorber via Block Copolymer Engineered Metasurfaces

Area Selective Polymer Brush Deposition

Controlled solvent vapor annealing of a high χ block copolymer thin film

Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l‑lactide) Block Copolymer Thin Films for Directed Self-Assembly Application

Narrow linewidth III-V-on-SiN laser with extended frequency chirp capability based on micro-transfer printing for high resolution distributed acoustic sensing

Large area Al 2 O 3 -Au raspberry-like nanoclusters from iterative block-copolymer self-assembly

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