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The evolution and analysis of electrical percolation threshold in nanometer scale thin films deposited by electroless plating

Materials chemistry and physics, 2011-05, Vol.127 (1), p.214-219

2011

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Highly corrosion resistant bright silver metallization deposited from a neutral cyanide-free solution

Microelectronic engineering, 2012-04, Vol.92, p.126-129

2012

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Study of HfO2 films prepared by ion-assisted deposition using a gridless end-hall ion source

Thin solid films, 1999-08, Vol.350 (1-2), p.203-208

1999

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Electroless processes for micro- and nanoelectronics

Electrochimica acta, 2003-09, Vol.48 (20), p.2987-2996

2003

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Broad band and low loss mid-IR flexible hollow waveguides

Optics express, 2004-04, Vol.12 (7), p.1341-1352

2004

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Characterization of a Mid-Infrared Hollow Waveguide Gas Cell for the Analysis of Carbon Monoxide and Nitric Oxide

Applied spectroscopy, 2006-03, Vol.60 (3), p.266-271

2006

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Reactive-sputter-deposited TiN films on glass substrates

Thin solid films, 1991-03, Vol.197 (1), p.117-128

1991

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High sensitivity IR spectroscopic methods of self-assembling monolayers (SAM) measurements

Applied surface science, 2007-06, Vol.253 (16), p.6784-6786

2007

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Novel Highly Conductive Silver-Tungsten Thin Films Electroless Deposited from Benzoate Solution for Microelectronic Applications

Journal of the Electrochemical Society, 2003-05, Vol.150 (5), p.C285

2003

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Properties of TiO2 films prepared by ion-assisted deposition using a gridless end-Hall ion source

Thin solid films, 1996-09, Vol.283 (1-2), p.84-89

1996

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Annealing influence on electrical transport mechanism of electroless deposited very thin Ag(W) films

Thin solid films, 2006-02, Vol.496 (2), p.515-519

2006

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Electroless-deposited Ag–W films for microelectronics applications

Thin solid films, 2001-06, Vol.389 (1), p.213-218

2001

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Properties of 50 nm electroless films Ag–W–oxygen before and after low temperature, low activation energy resistivity decay

Microelectronic engineering, 2006-11, Vol.83 (11), p.2359-2363

2006

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Electrical resistivity of thin electroless Ag–W films for metallization

Microelectronic engineering, 2003-11, Vol.70 (2), p.495-500

2003

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Characterization of hollow fibers for the transmission of infrared radiation

Applied Optics, 1990-04, Vol.29 (12), p.1805

1990

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On the mechanism of annealing effect in electrical resistivity of sub-100 nm Ag (1% W) films

Microelectronic engineering, 2004-10, Vol.76 (1-4), p.182-189

2004

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Material properties of very thin electroless silver–tungsten films

Thin solid films, 2003-02, Vol.426 (1), p.288-295

2003

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Study of the influence of Ar on the formation of diamond-like bonds in films obtained from CH4 + Ar, RF plasma deposition

Journal of non-crystalline solids, 2001-08, Vol.289 (1-3), p.221-227

2001

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Electroless deposition of novel Ag–W thin films

Microelectronic engineering, 2003-11, Vol.70 (2), p.489-494

2003

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Role of local microchemistry and surface structure in electrical resistivity of 50 nm electroless films Ag–W–oxygen

Microelectronic engineering, 2005-12, Vol.82 (3), p.307-313

2005

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Electroless and sputtered silver–tungsten thin films for microelectronics applications

Microelectronic engineering, 2003-01, Vol.65 (1), p.197-207

2003

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Characterization of the Initial Growth Stages of Electroless Ag(W) Films Deposited on Si(100)

Journal of the Electrochemical Society, 2001, Vol.148 (12), p.C784

2001

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Plastic hollow fibers as a selective infrared radiation transmitting medium

Journal of applied physics, 1992-11, Vol.72 (9), p.3878-3883

1992

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Investigation of irradiated monolithic transistors for space applications

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2004-03, Vol.217 (1), p.65-76

2004

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The influence of diamond-like carbon films on the properties of silicon solar cells

Thin solid films, 1997-07, Vol.303 (1), p.273-276

1997

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The evolution and analysis of electrical percolation threshold in nanometer scale thin films deposited by electroless plating

Highly corrosion resistant bright silver metallization deposited from a neutral cyanide-free solution

Study of HfO2 films prepared by ion-assisted deposition using a gridless end-hall ion source

Electroless processes for micro- and nanoelectronics

Broad band and low loss mid-IR flexible hollow waveguides

Characterization of a Mid-Infrared Hollow Waveguide Gas Cell for the Analysis of Carbon Monoxide and Nitric Oxide

Reactive-sputter-deposited TiN films on glass substrates

High sensitivity IR spectroscopic methods of self-assembling monolayers (SAM) measurements

Novel Highly Conductive Silver-Tungsten Thin Films Electroless Deposited from Benzoate Solution for Microelectronic Applications

Properties of TiO2 films prepared by ion-assisted deposition using a gridless end-Hall ion source

Annealing influence on electrical transport mechanism of electroless deposited very thin Ag(W) films

Electroless-deposited Ag–W films for microelectronics applications

Properties of 50 nm electroless films Ag–W–oxygen before and after low temperature, low activation energy resistivity decay

Electrical resistivity of thin electroless Ag–W films for metallization

Characterization of hollow fibers for the transmission of infrared radiation

On the mechanism of annealing effect in electrical resistivity of sub-100 nm Ag (1% W) films

Material properties of very thin electroless silver–tungsten films

Study of the influence of Ar on the formation of diamond-like bonds in films obtained from CH4 + Ar, RF plasma deposition

Electroless deposition of novel Ag–W thin films

Role of local microchemistry and surface structure in electrical resistivity of 50 nm electroless films Ag–W–oxygen

Electroless and sputtered silver–tungsten thin films for microelectronics applications

Characterization of the Initial Growth Stages of Electroless Ag(W) Films Deposited on Si(100)

Plastic hollow fibers as a selective infrared radiation transmitting medium

Investigation of irradiated monolithic transistors for space applications

The influence of diamond-like carbon films on the properties of silicon solar cells

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