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A low-loss single-pole six-throw switch based on compact RF MEMS switches

IEEE transactions on microwave theory and techniques, 2005-11, Vol.53 (11), p.3335-3344

2005

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A self-aligned vertical comb-drive actuator on an SOI wafer for a 2D scanning micromirror

Journal of micromechanics and microengineering, 2004-08, Vol.14 (8), p.1148-1156

2004

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1.5 V Sub‐mW CMOS Interface Circuit for Capacitive Sensor Applications in Ubiquitous Sensor Networks

ETRI Journal, 2008, 30(5), , pp.644-652

2008

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Surface properties of ZrO2 thin film under Cl2/Ar plasma using angle-resolved X-ray photoelectron spectroscopy

Japanese Journal of Applied Physics, 2014-07, Vol.53 (8S3)

2014

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The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process

Transactions on Electrical and Electronic Materials, 2014, 15(1), , pp.49-54

2014

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Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma

Transactions on Electrical and Electronic Materials, 2013, 14(4), , pp.216-220

2013

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Glucose sensor using a microfabricated electrode and electropolymerized bilayer films

Biosensors & bioelectronics, 2002-03, Vol.17 (3), p.251-259

2002

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Micromachined air-gap structure MEMS acoustic sensor using reproducible high-speed lateral etching and CMP process

Journal of micromechanics and microengineering, 2006-10, Vol.16 (10), p.2071-2076

2006

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Development and application of a laterally driven electromagnetic microactuator

Applied physics letters, 2002-07, Vol.81 (3), p.547-549

2002

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An Independent, Temperature-Controllable Microelectrode Array

Analytical chemistry (Washington), 2004-03, Vol.76 (5), p.1537-1543

2004

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Fabrication of MEMS devices by using anhydrous HF gas-phase etching with alcoholic vapor

Journal of micromechanics and microengineering, 2002-05, Vol.12 (3), p.297-306, Article 316

2002

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The Dry Etching of TiN Thin Films Using Inductively Coupled CF4/Ar Plasma

Transactions on Electrical and Electronic Materials, 2013, 14(2), , pp.67-70

2013

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Evaluation of 1/f Noise Characteristics for Si-Based Infrared Detection Materials

ETRI journal, 2009-02, Vol.31 (6), p.703-708

2009

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Evaluation of 1/f Noise Characteristics for Si‐Based Infrared Detection Materials

ETRI Journal, 2009, 31(6), , pp.703-708

2009

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Surface micromachined thermally driven micropump

Sensors and actuators. A. Physical., 2004-09, Vol.115 (1), p.151-158

2004

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Surface Micromachined Pressure Sensor with Internal Substrate Vacuum Cavity

ETRI journal, 2016-08, Vol.38 (4), p.1-10

2016

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1.5 V Sub-mW CMOS Interface Circuit for Capacitive Sensor Applications in Ubiquitous Sensor Networks

ETRI journal, 2008-02, Vol.30 (5), p.644-652

2008

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Z-axis capacitive MEMS accelerometer with moving ground masses

2010 IEEE Sensors, 2010, p.635-638

2010

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Characterization of Residues on Anhydrous HF Gas-Phase Etching of Sacrificial Oxides for Surface Micromachining

Japanese Journal of Applied Physics, 2000-01, Vol.39 (1R), p.337-342

2000

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Regular Paper : The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process

Transactions on electrical and electronic materials, 2014-02, Vol.15 (1), p.49

2014

Volltextzugriff (PDF)

The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process

Transactions on electrical and electronic materials, 2014, Vol.15 (1), p.49-54

2014

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Regular Paper : Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma

Transactions on electrical and electronic materials, 2013-08, Vol.14 (4), p.216

2013

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Sensitivity tunable capacitive type micro accelerometer

2008 IEEE Sensors, 2008, p.1020-1023

2008

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Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma

Transactions on electrical and electronic materials, 2013, Vol.14 (4), p.216-220

2013

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A Low Power Analog CMOS Vision Chip for Edge Detection Using Electronic Switches

ETRI Journal, 2005, 27(5), , pp.539-544

2005

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A low-loss single-pole six-throw switch based on compact RF MEMS switches

A self-aligned vertical comb-drive actuator on an SOI wafer for a 2D scanning micromirror

1.5 V Sub‐mW CMOS Interface Circuit for Capacitive Sensor Applications in Ubiquitous Sensor Networks

Surface properties of ZrO2 thin film under Cl2/Ar plasma using angle-resolved X-ray photoelectron spectroscopy

The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process

Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma

Glucose sensor using a microfabricated electrode and electropolymerized bilayer films

Micromachined air-gap structure MEMS acoustic sensor using reproducible high-speed lateral etching and CMP process

Development and application of a laterally driven electromagnetic microactuator

An Independent, Temperature-Controllable Microelectrode Array

Fabrication of MEMS devices by using anhydrous HF gas-phase etching with alcoholic vapor

The Dry Etching of TiN Thin Films Using Inductively Coupled CF4/Ar Plasma

Evaluation of 1/f Noise Characteristics for Si-Based Infrared Detection Materials

Evaluation of 1/f Noise Characteristics for Si‐Based Infrared Detection Materials

Surface micromachined thermally driven micropump

Surface Micromachined Pressure Sensor with Internal Substrate Vacuum Cavity

1.5 V Sub-mW CMOS Interface Circuit for Capacitive Sensor Applications in Ubiquitous Sensor Networks

Z-axis capacitive MEMS accelerometer with moving ground masses

Characterization of Residues on Anhydrous HF Gas-Phase Etching of Sacrificial Oxides for Surface Micromachining

Regular Paper : The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process

The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process

Regular Paper : Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma

Sensitivity tunable capacitive type micro accelerometer

Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma

A Low Power Analog CMOS Vision Chip for Edge Detection Using Electronic Switches

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