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Numerical study of a novel micro-diaphragm flow channel with piezoelectric device for proton exchange membrane fuel cells

Journal of power sources, 2008-05, Vol.180 (1), p.402-409

2008

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Metal-induced crystallization of amorphous Si1−Ge by rapid thermal annealing

Thin solid films, 2004-12, Vol.469-470, p.356-360

2004

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Electrical characterization and carrier transportation in Hf-silicate dielectrics using ALD gate stacks for 90nm node MOSFETs

Applied surface science, 2008-07, Vol.254 (19), p.6127-6130

2008

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Effects of nitrogen ion implantation on the formation of nickel silicide contacts on shallow junctions

Thin solid films, 1999-11, Vol.355-356, p.412-416

1999

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Soil aggregate breakdown and carbon release along a chronosequence of recovering landslide scars in a subtropical watershed

Catena (Giessen), 2018-06, Vol.165, p.530-536

2018

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Antibody protection of mice from botulinum neurotoxin serotype B intoxication

Toxicon (Oxford), 2013-06, Vol.68, p.83-84

2013

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Effects of stress on the interfacial reactions of metal thin films on (0 0 1)Si

Thin solid films, 2003-01, Vol.424 (1), p.33-39

2003

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Use of RNA interference in Drosophila S2 cells to identify host pathways controlling compartmentalization of an intracellular pathogen

Proceedings of the National Academy of Sciences - PNAS, 2005-09, Vol.102 (38), p.13646-13651

2005

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Further work function and interface quality improvement on Al2O3 capped high-k/metal gate p-type metal-oxide-semiconductor field-effect-transistors by incorporation of fluorine

Thin solid films, 2012-04, Vol.520 (13), p.4482-4485

2012

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Application of a Real Time Polymerase Chain Reaction Method to Detect Castor Toxin Contamination in Fluid Milk and Eggs

Journal of agricultural and food chemistry, 2007-08, Vol.55 (17), p.6897-6902

2007

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Demonstrating Valence Band-Edge Effective Work Function by Aluminum Implantation in High-k/Metal Gate p-MOSFET with Incorporated Fluorine

Journal of electronic materials, 2012-07, Vol.41 (7), p.1936-1940

2012

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Electrical characterization and carrier transportation in Hf-silicate dielectrics using ALD gate stacks for 90 nm node MOSFETs

Applied surface science, 2008-07, Vol.254 (19), p.6127-6130

2008

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Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si

Materials science & engineering. A, Structural materials : properties, microstructure and processing, 2005-11, Vol.409 (1), p.217-222

2005

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Metal-induced crystallization of amorphous Si 1− x Ge x by rapid thermal annealing

Thin solid films, 2004, Vol.469, p.356-360

2004

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Solid phase reactions between Fe thin films and Si-Ge layers on Si

Thin solid films, 2004-08, Vol.461 (1), p.81-85

2004

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The observation of trapping and detrapping effects in high-k gate dielectric MOSFETs by a new gate current Random Telegraph Noise (IG-RTN) approach

2008 IEEE International Electron Devices Meeting, 2008, p.1-4

2008

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A Low-cost Automated Measurement System for Quality Control of AMLCD Manufacturing

2006 1ST IEEE Conference on Industrial Electronics and Applications, 2006, p.1-4

2006

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45nm gate length Bulk/PD-SOI CMOS transistors with low gate leakage current for high speed and low power applications

ESSDERC '03. 33rd Conference on European Solid-State Device Research, 2003, 2003, p.415-418

2003

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A Novel "hybrid" high-k/metal gate process for 28nm high performance CMOSFETs

2009 IEEE International Electron Devices Meeting (IEDM), 2009, p.1-4

2009

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Bacillus Calmette-Guérin Interacts with the Carboxyl-Terminal Heparin Binding Domain of Fibronectin: Implications for BCG-Mediated Antitumor Activity

The Journal of urology, 1994-10, Vol.152 (4), p.1275-1280

1994

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SiGe Channel CMOSFETs Fabricated on (110) Surfaces with TaC/HfO2 Gate Stacks

2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA), 2007, p.1-2

2007

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Reliability of ALD Hf-based High K Gate Stacks with Optimized Interfacial Layer and Pocket Implant Engineering

2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA), 2007, p.1-2

2007

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Twin-GD: A New Twin Gated-Diode Measurement for the Interface Characterization of Ultra-Thin Gate Oxide MOSFET's with EOT Down to 1nm

2006 13th International Symposium on the Physical and Failure Analysis of Integrated Circuits, 2006, p.37-40

2006

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Formation of nickel silicide on nitrogen ion implanted silicon

1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144), 1998, Vol.2, p.1002-1005 vol.2

1998

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Single stress liner for both NMOS and PMOS current enhancement by a novel ultimate spacer process

IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest, 2005, p.836-839

2005

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Numerical study of a novel micro-diaphragm flow channel with piezoelectric device for proton exchange membrane fuel cells

Metal-induced crystallization of amorphous Si1−Ge by rapid thermal annealing

Electrical characterization and carrier transportation in Hf-silicate dielectrics using ALD gate stacks for 90nm node MOSFETs

Effects of nitrogen ion implantation on the formation of nickel silicide contacts on shallow junctions

Soil aggregate breakdown and carbon release along a chronosequence of recovering landslide scars in a subtropical watershed

Antibody protection of mice from botulinum neurotoxin serotype B intoxication

Effects of stress on the interfacial reactions of metal thin films on (0 0 1)Si

Use of RNA interference in Drosophila S2 cells to identify host pathways controlling compartmentalization of an intracellular pathogen

Further work function and interface quality improvement on Al2O3 capped high-k/metal gate p-type metal-oxide-semiconductor field-effect-transistors by incorporation of fluorine

Application of a Real Time Polymerase Chain Reaction Method to Detect Castor Toxin Contamination in Fluid Milk and Eggs

Demonstrating Valence Band-Edge Effective Work Function by Aluminum Implantation in High-k/Metal Gate p-MOSFET with Incorporated Fluorine

Electrical characterization and carrier transportation in Hf-silicate dielectrics using ALD gate stacks for 90 nm node MOSFETs

Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si

Metal-induced crystallization of amorphous Si 1− x Ge x by rapid thermal annealing

Solid phase reactions between Fe thin films and Si-Ge layers on Si

The observation of trapping and detrapping effects in high-k gate dielectric MOSFETs by a new gate current Random Telegraph Noise (IG-RTN) approach

A Low-cost Automated Measurement System for Quality Control of AMLCD Manufacturing

45nm gate length Bulk/PD-SOI CMOS transistors with low gate leakage current for high speed and low power applications

A Novel "hybrid" high-k/metal gate process for 28nm high performance CMOSFETs

Bacillus Calmette-Guérin Interacts with the Carboxyl-Terminal Heparin Binding Domain of Fibronectin: Implications for BCG-Mediated Antitumor Activity

SiGe Channel CMOSFETs Fabricated on (110) Surfaces with TaC/HfO2 Gate Stacks

Reliability of ALD Hf-based High K Gate Stacks with Optimized Interfacial Layer and Pocket Implant Engineering

Twin-GD: A New Twin Gated-Diode Measurement for the Interface Characterization of Ultra-Thin Gate Oxide MOSFET's with EOT Down to 1nm

Formation of nickel silicide on nitrogen ion implanted silicon

Single stress liner for both NMOS and PMOS current enhancement by a novel ultimate spacer process

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