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Photochemical atomic layer deposition and etching

Surface & coatings technology, 2016-04, Vol.291, p.258-263

Chalker, P.R.

2016

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Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition

Journal of crystal growth, 2019-12, Vol.528, p.125254, Article 125254

2019

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Embedded fibre Bragg grating sensors in advanced composite materials

Composites science and technology, 2001-08, Vol.61 (10), p.1379-1387

2001

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Extraction of the sub-band gap density of states of Nb doped ZnO thin film transistors using C-V measurements

Microelectronic engineering, 2017-06, Vol.178, p.213-216

2017

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Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition

Thin solid films, 2011-04, Vol.519 (13), p.4192-4195

2011

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a-Ga^sub 2^O^sub 3^ grown by low temperature atomic layer deposition on sapphire

Journal of crystal growth, 2018-04, Vol.487, p.23

2018

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Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition

Microelectronic engineering, 2013-09, Vol.109, p.126-128

2013

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Some recent developments in the chemical vapour deposition of electroceramic oxides

Journal of physics. D, Applied physics, 2003-03, Vol.36 (6), p.R80-R95

2003

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Experimental band alignment of Ta^sub 2^O^sub 5^/GaN for MIS-HEMT applications

Microelectronic engineering, 2017-06, Vol.178, p.178

2017

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CuO/Ta₂O₅ core/shell nanoparticles produced by arc-discharge in water

Materials letters, 2011-08, Vol.65 (15-16), p.2337-2340

2011

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Interface engineering of Ge using thulium oxide: Band line-up study

Microelectronic engineering, 2013-09, Vol.109, p.204-207

2013

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Recent developments in the MOCVD and ALD of rare earth oxides and silicates

Materials science & engineering. B, Solid-state materials for advanced technology, 2005-04, Vol.118 (1), p.97-104

2005

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Direct observation by transmission electron microscopy of the influence of Ni catalyst-seeds on the growth of GaN–AlGaN axial heterostructure nanowires

Journal of crystal growth, 2011-07, Vol.327 (1), p.27-34

2011

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Low EOT GeO sub(2)/Al sub(2)O sub(3)/HfO sub(2) on Ge substrate using ultrathin Al deposition

Microelectronic engineering, 2013-09, Vol.109, p.126-128

2013

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Selective laser sintering of barium titanate–polymer composite films

Journal of materials science, 2008-05, Vol.43 (9), p.3197-3202

2008

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Wide bandgap semiconductor materials for high temperature electronics

Thin solid films, 1999, Vol.343, p.616-622

Chalker, Paul R.

1999

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Dimethylzinc adduct chemistry revisited: MOCVD of vertically aligned ZnO nanowires using the dimethylzinc 1,4-dioxane adduct

Journal of crystal growth, 2011-01, Vol.315 (1), p.292-296

2011

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Fabrication of GaN cantilevers on silicon substrates for microelectromechanical devices

Applied physics letters, 2004-04, Vol.84 (14), p.2566-2568

2004

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Deposition of HfO2, Gd2O3 and PrOx by Liquid Injection ALD Techniques

Chemical vapor deposition, 2005-03, Vol.11 (3), p.159-169

2005

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Residual strain measurement and impact response of optical fibre Bragg grating sensors in fibre metal laminates

Smart materials and structures, 2001-04, Vol.10 (2), p.338-346

2001

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Growth of Hafnium Dioxide Thin Films by Liquid-Injection MOCVD Using Alkylamide and Hydroxylamide Precursors

Advanced materials (Weinheim), 2003-12, Vol.9 (6), p.309-314

2003

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Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films

Chemical vapor deposition, 2002-07, Vol.8 (4), p.163-170

2002

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Measurement of the effective electron mass in GaInNAs by energy-loss spectroscopy

Applied physics letters, 2004-03, Vol.84 (9), p.1453-1455

2004

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Characterization of hafnium aluminate gate dielectrics deposited by liquid injection metalorganic chemical vapor deposition

Applied physics letters, 2004-05, Vol.84 (20), p.4119-4121

2004

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Making shape memory polymers reprocessable and reusable by a simple chemical method

Journal of materials chemistry, 2012-01, Vol.22 (17), p.8192-8194

2012

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Photochemical atomic layer deposition and etching

Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition

Embedded fibre Bragg grating sensors in advanced composite materials

Extraction of the sub-band gap density of states of Nb doped ZnO thin film transistors using C-V measurements

Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition

a-Ga^sub 2^O^sub 3^ grown by low temperature atomic layer deposition on sapphire

Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition

Some recent developments in the chemical vapour deposition of electroceramic oxides

Experimental band alignment of Ta^sub 2^O^sub 5^/GaN for MIS-HEMT applications

CuO/Ta₂O₅ core/shell nanoparticles produced by arc-discharge in water

Interface engineering of Ge using thulium oxide: Band line-up study

Recent developments in the MOCVD and ALD of rare earth oxides and silicates

Direct observation by transmission electron microscopy of the influence of Ni catalyst-seeds on the growth of GaN–AlGaN axial heterostructure nanowires

Low EOT GeO sub(2)/Al sub(2)O sub(3)/HfO sub(2) on Ge substrate using ultrathin Al deposition

Selective laser sintering of barium titanate–polymer composite films

Wide bandgap semiconductor materials for high temperature electronics

Dimethylzinc adduct chemistry revisited: MOCVD of vertically aligned ZnO nanowires using the dimethylzinc 1,4-dioxane adduct

Fabrication of GaN cantilevers on silicon substrates for microelectromechanical devices

Deposition of HfO2, Gd2O3 and PrOx by Liquid Injection ALD Techniques

Residual strain measurement and impact response of optical fibre Bragg grating sensors in fibre metal laminates

Growth of Hafnium Dioxide Thin Films by Liquid-Injection MOCVD Using Alkylamide and Hydroxylamide Precursors

Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films

Measurement of the effective electron mass in GaInNAs by energy-loss spectroscopy

Characterization of hafnium aluminate gate dielectrics deposited by liquid injection metalorganic chemical vapor deposition

Making shape memory polymers reprocessable and reusable by a simple chemical method

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