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Impact of the temperature on the conductive filament morphology in HfO2-based RRAM

Materials letters, 2024-02, Vol.357, p.135699, Article 135699

2024

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Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition

Materials, 2022-01, Vol.15 (3), p.877

2022

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Properties of atomic layer deposited iron oxide and bismuth oxide chloride structures

Journal of alloys and compounds, 2020-12, Vol.846, p.156099, Article 156099

2020

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Atomic layer deposited nanolaminates of zirconium oxide and manganese oxide from manganese(III)acetylacetonate and ozone

Nanotechnology, 2021-08, Vol.32 (33), p.335703

2021

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Atomic layer deposition and properties of ZrO2/Fe2O3 thin films

Beilstein journal of nanotechnology, 2018-01, Vol.9 (1), p.119-128

2018

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Control of the set and reset voltage polarity in anti-series and anti-parallel resistive switching structures

Microelectronic engineering, 2019-08, Vol.216, p.111083, Article 111083

2019

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Current Pulses to Control the Conductance in RRAM Devices

IEEE journal of the Electron Devices Society, 2020-01, Vol.8, p.1-1

2020

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Study of the set and reset transitions in HfO2-based ReRAM devices using a capacitor discharge

Solid-state electronics, 2021-09, Vol.183, p.108113, Article 108113

2021

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Silicon oxide-niobium oxide mixture films and nanolaminates grown by atomic layer deposition from niobium pentaethoxide and hexakis(ethylamino) disilane

Nanotechnology, 2020-05, Vol.31 (19), p.195713-195713

2020

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Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-07, Vol.38 (4)

2020

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Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates

Thin solid films, 2019-01, Vol.669, p.294-300

2019

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Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition

Nanomaterials (Basel, Switzerland), 2022-07, Vol.12 (15), p.2593

2022

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Hafnium Oxide/Graphene/Hafnium Oxide-Stacked Nanostructures as Resistive Switching Media

ACS applied nano materials, 2021-05, Vol.4 (5), p.5152-5163

2021

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Structure and behavior of ZrO2-graphene-ZrO2 stacks

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-12, Vol.38 (6)

2020

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Programming Pulse Width Assessment for Reliable and Low-Energy Endurance Performance in Al:HfO2-Based RRAM Arrays

Electronics (Basel), 2020-05, Vol.9 (5), p.864

2020

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On the Asymmetry of Resistive Switching Transitions

Electronics (Basel), 2024-07, Vol.13 (13), p.2639

2024

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Effect of Dielectric Thickness on Resistive Switching Polarity in TiN/Ti/HfO2/Pt Stacks

Electronics (Basel), 2022-02, Vol.11 (3), p.479

2022

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Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films

ACS omega, 2017-12, Vol.2 (12), p.8836-8842

2017

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Influences of the Temperature on the Electrical Properties of HfO2-Based Resistive Switching Devices

Electronics (Basel), 2021-11, Vol.10 (22), p.2816

2021

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Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2013-01, Vol.31 (1)

2013

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Atomic Layer Deposition and Characterization of Dysprosium-Doped Zirconium Oxide Thin Films

Chemical vapor deposition, 2015-09, Vol.21 (7-8-9), p.181-187

2015

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Electrical Characterization of Amorphous Silicon MIS-Based Structures for HIT Solar Cell Applications

Nanoscale research letters, 2016-12, Vol.11 (1), p.335-7, Article 335

2016

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Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides

ECS journal of solid state science and technology, 2018, Vol.7 (8), p.P402-P409

2018

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Properties of Zirconium Oxide and Cobalt Ferrite Layered Nanocomposite

ECS journal of solid state science and technology, 2017, Vol.6 (12), p.P886-P892

2017

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Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozone

ECS journal of solid state science and technology, 2018-01, Vol.7 (2), p.P1-P8

2018

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Impact of the temperature on the conductive filament morphology in HfO2-based RRAM

Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition

Properties of atomic layer deposited iron oxide and bismuth oxide chloride structures

Atomic layer deposited nanolaminates of zirconium oxide and manganese oxide from manganese(III)acetylacetonate and ozone

Atomic layer deposition and properties of ZrO2/Fe2O3 thin films

Control of the set and reset voltage polarity in anti-series and anti-parallel resistive switching structures

Current Pulses to Control the Conductance in RRAM Devices

Study of the set and reset transitions in HfO2-based ReRAM devices using a capacitor discharge

Silicon oxide-niobium oxide mixture films and nanolaminates grown by atomic layer deposition from niobium pentaethoxide and hexakis(ethylamino) disilane

Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer deposition

Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates

Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition

Hafnium Oxide/Graphene/Hafnium Oxide-Stacked Nanostructures as Resistive Switching Media

Structure and behavior of ZrO2-graphene-ZrO2 stacks

Programming Pulse Width Assessment for Reliable and Low-Energy Endurance Performance in Al:HfO2-Based RRAM Arrays

On the Asymmetry of Resistive Switching Transitions

Effect of Dielectric Thickness on Resistive Switching Polarity in TiN/Ti/HfO2/Pt Stacks

Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films

Influences of the Temperature on the Electrical Properties of HfO2-Based Resistive Switching Devices

Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing

Atomic Layer Deposition and Characterization of Dysprosium-Doped Zirconium Oxide Thin Films

Electrical Characterization of Amorphous Silicon MIS-Based Structures for HIT Solar Cell Applications

Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides

Properties of Zirconium Oxide and Cobalt Ferrite Layered Nanocomposite

Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozone

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