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An axisymmetric unstructured finite volume method applied to the numerical modeling of an atmospheric pressure gas discharge

Journal of computational physics, 2015-01, Vol.281, p.473-492

2015

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Influence of pulsed gas injections on the stability of Townsend dielectric barrier discharges in nitrogen at atmospheric pressure

Journal of physics. D, Applied physics, 2022-11, Vol.55 (44), p.445204

2022

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Investigation of memory effect in atmospheric pressure dielectric barrier discharge in nitrogen with small oxygen or nitric oxide addition

Journal of physics. D, Applied physics, 2018-09, Vol.51 (35), p.354001

2018

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Influence of the temporal variations of plasma composition on the cyclic formation of dust in hexamethyldisiloxane-argon radiofrequency discharges: Analysis by time-resolved mass spectrometry

AIP advances, 2016-10, Vol.6 (10), p.105111-105111-20

2016

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Cyclic powder formation during pulsed injection of hexamethyldisiloxane in an axially asymmetric radiofrequency argon discharge

Journal of applied physics, 2012-11, Vol.112 (9)

2012

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Influence of gas flow dynamics on discharge stability and on the uniformity of atmospheric pressure PECVD thin film

Journal of physics. D, Applied physics, 2009-06, Vol.42 (12), p.125201-125201p7

2009

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Influence of the relative humidity on film formation by vapor induced phase separation

Polymer engineering and science, 2003-04, Vol.43 (4), p.798-808

2003

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Low temperature silicon oxide deposition on polymer powders in a fluidized bed coupled to a cold remote plasma

Surface & coatings technology, 2012-07, Vol.206 (23), p.4814-4821

2012

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Conformity of Silica-like Thin Films Deposited by Atmospheric Pressure Townsend Discharge and Transport Mechanisms

IEEE transactions on plasma science, 2009-06, Vol.37 (6), p.970-978

2009

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Power dissipation analysis in N2O RF discharges using Monte Carlo modelling

Journal of physics. D, Applied physics, 2007-04, Vol.40 (7), p.2045-2054

2007

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Variations in the physico-chemical properties of near-stoichiometric silica deposited from SiH4-N2O and SiH4-N2O-He radiofrequency discharges

Thin solid films, 2005-01, Vol.471 (1-2), p.53-62

2005

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Power dissipation analysis in N2O/He RF discharges using particle modelling

Journal of physics. D, Applied physics, 2005-12, Vol.38 (24), p.4290-4295

2005

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Influence of the reactor design in the case of silicon nitride PECVD

Chemical engineering science, 1997, Vol.52 (17), p.2901-2914

1997

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RF discharge modelling in a N2O/SiH4 mixture for SiO2 deposition and comparison with experiment

Journal of physics. D, Applied physics, 2000-06, Vol.33 (11), p.1332-1341

2000

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Analysis of the N2O dissociation by r.f. discharges in a plasma reactor

Surface & coatings technology, 1999-09, Vol.116-119, p.1042-1048

1999

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Analysis of the N2O dissociation in a RF discharge reactor

Journal of physics. D, Applied physics, 1999-07, Vol.32 (13), p.1478-1488

1999

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Structural properties of N-rich a-Si - N:H films with a low electron-trapping rate

Journal of physics. D, Applied physics, 1997-04, Vol.30 (7), p.1064-1076

1997

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Power dissipation analysis in N 2 O RF discharges using Monte Carlo modelling

Journal of physics. D, Applied physics, 2007-04, Vol.40 (7), p.2045-2054

2007

Volltextzugriff (PDF)

Power dissipation analysis in N 2 O/He RF discharges using particle modelling

Journal of physics. D, Applied physics, 2005-12, Vol.38 (24), p.4290-4295

2005

Volltextzugriff (PDF)

Variations in the physico-chemical properties of near-stoichiometric silica deposited from SiH 4–N 2O and SiH 4–N 2O–He radiofrequency discharges

Thin solid films, 2005, Vol.471 (1), p.53-62

2005

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Poly(ether imide) membrane formation by water vapour induced phase inversion

Macromolecular symposia., 2002-11, Vol.188 (1), p.37-48

2002

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RF discharge modelling in a N 2 O/SiH 4 mixture for SiO 2 deposition and comparison with experiment

Journal of physics. D, Applied physics, 2000-06, Vol.33 (11), p.1332-1341

2000

Volltextzugriff (PDF)

Analysis of the N 2 O dissociation in a RF discharge reactor

Journal of physics. D, Applied physics, 1999-07, Vol.32 (13), p.1478-1488

1999

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Plasma enhanced nickel-carbon deposition from a metal organic vapor - analysis of the mass transfer mechanism

Materials for Advanced Metallization (MAM), European Workshop, 1999-06, Vol.54 (291), p.21-23

1999

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Analysis of the N2O dissociation by r.f. discharges in a plasma reactor

Surface & coatings technology, 1999, Vol.116-19, p.1042-1048

1999

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An axisymmetric unstructured finite volume method applied to the numerical modeling of an atmospheric pressure gas discharge

Influence of pulsed gas injections on the stability of Townsend dielectric barrier discharges in nitrogen at atmospheric pressure

Investigation of memory effect in atmospheric pressure dielectric barrier discharge in nitrogen with small oxygen or nitric oxide addition

Influence of the temporal variations of plasma composition on the cyclic formation of dust in hexamethyldisiloxane-argon radiofrequency discharges: Analysis by time-resolved mass spectrometry

Cyclic powder formation during pulsed injection of hexamethyldisiloxane in an axially asymmetric radiofrequency argon discharge

Influence of gas flow dynamics on discharge stability and on the uniformity of atmospheric pressure PECVD thin film

Influence of the relative humidity on film formation by vapor induced phase separation

Low temperature silicon oxide deposition on polymer powders in a fluidized bed coupled to a cold remote plasma

Conformity of Silica-like Thin Films Deposited by Atmospheric Pressure Townsend Discharge and Transport Mechanisms

Power dissipation analysis in N2O RF discharges using Monte Carlo modelling

Variations in the physico-chemical properties of near-stoichiometric silica deposited from SiH4-N2O and SiH4-N2O-He radiofrequency discharges

Power dissipation analysis in N2O/He RF discharges using particle modelling

Influence of the reactor design in the case of silicon nitride PECVD

RF discharge modelling in a N2O/SiH4 mixture for SiO2 deposition and comparison with experiment

Analysis of the N2O dissociation by r.f. discharges in a plasma reactor

Analysis of the N2O dissociation in a RF discharge reactor

Structural properties of N-rich a-Si - N:H films with a low electron-trapping rate

Power dissipation analysis in N 2 O RF discharges using Monte Carlo modelling

Power dissipation analysis in N 2 O/He RF discharges using particle modelling

Variations in the physico-chemical properties of near-stoichiometric silica deposited from SiH 4–N 2O and SiH 4–N 2O–He radiofrequency discharges

Poly(ether imide) membrane formation by water vapour induced phase inversion

RF discharge modelling in a N 2 O/SiH 4 mixture for SiO 2 deposition and comparison with experiment

Analysis of the N 2 O dissociation in a RF discharge reactor

Plasma enhanced nickel-carbon deposition from a metal organic vapor - analysis of the mass transfer mechanism

Analysis of the N2O dissociation by r.f. discharges in a plasma reactor

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