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XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition

Applied surface science, 2014-10, Vol.315, p.104-109

2014

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Structural and optical characterization of low-temperature ALD crystalline AlN

Journal of crystal growth, 2015-07, Vol.421, p.45-52

2015

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Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition

RSC advances, 2015-01, Vol.5 (71), p.57865-57874

2015

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Enhanced rectifying response from metal-insulator-insulator-metal junctions

Applied physics letters, 2011-12, Vol.99 (25), p.253503-253503-3

2011

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Chemical mechanical polishing in the dry lubrication regime: Application to conductive polysilicon

Journal of materials processing technology, 2015-06, Vol.220, p.257-263

2015

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Ultrathin-layer chromatography nanostructures modified by atomic layer deposition

Journal of Chromatography A, 2013-07, Vol.1299, p.118-125

2013

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The pH-dependant attachment of ceria nanoparticles to silica using surface analytical techniques

Applied surface science, 2015-08, Vol.345, p.249-255

2015

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Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN

Journal of physics. D, Applied physics, 2014-08, Vol.47 (34), p.1-5

2014

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High Performance Oxygen Reduction/Evolution Electrodes for Zinc–Air Batteries Prepared by Atomic Layer Deposition of MnO x

ACS applied energy materials, 2020-01, Vol.3 (1), p.603-613

2020

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Plasmonic materials for metal–insulator–semiconductor–insulator–metal nanoplasmonic waveguides on silicon-on-insulator platform

Optical materials, 2013-12, Vol.36 (2), p.294-298

2013

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Saturation Behavior of Atomic Layer Deposition MnO x from Bis(Ethylcyclopentadienyl) Manganese and Water: Saturation Effect on Coverage of Porous Oxygen Reduction Electrodes for Metal–Air Batteries

ACS applied nano materials, 2019-01, Vol.2 (1), p.267-277

2019

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Surface plasmon polarization filtering in a single mode dielectric waveguide

Optics express, 2005-09, Vol.13 (18), p.7063-7069

2005

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A Novel Nanofabrication Damascene Lift-Off Technique

IEEE transactions on nanotechnology, 2011-07, Vol.10 (4), p.822-826

2011

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The Effect of Slurry Properties on the CMP Removal Rate of Boron Doped Polysilicon

ECS journal of solid state science and technology, 2016, Vol.5 (5), p.P233-P238

2016

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An overview of corrosion–wear interaction for planarizing metallic thin films

Wear, 2003-08, Vol.255 (7), p.869-874

2003

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Observation of resonant tunneling phenomenon in metal-insulator-insulator-insulator-metal electron tunnel devices

Applied physics letters, 2012-03, Vol.100 (11), p.113503-113503-5

2012

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Surface plasmon induced polarization rotation and optical vorticity in a single mode waveguide

Optics express, 2007-07, Vol.15 (15), p.9476-9485

2007

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High Rate Chemical Mechanical Polishing of Boron-Doped Polycrystalline Silicon

ECS journal of solid state science and technology, 2014-01, Vol.3 (6), p.P213-P218

2014

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An investigation of the deposition of ceria on silica by quartz crystal microbalance: Observations on the effect of many body interactions

Colloids and surfaces. A, Physicochemical and engineering aspects, 2017-06, Vol.522, p.207-217

2017

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Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire viaplasma-enhanced atomic layer deposition

RSC advances, 2015-07, Vol.5 (71), p.57865-57874

2015

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A Study of the Colloidal Stability of Mixed Abrasive Slurries and Their Role in CMP

Journal of the Electrochemical Society, 2012, Vol.159 (5), p.H482-H489

2012

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Copper CMP: The Relationship between Polish Rate Uniformity and Lubrication

ECS journal of solid state science and technology, 2012-01, Vol.1 (4), p.P157-P163

2012

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Effects of K 3[Fe(CN) 6] slurry's pH value and applied potential on tungsten removal rate for chemical–mechanical planarization application

Wear, 2005-07, Vol.259 (7), p.1299-1307

2005

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Effects of K3[Fe(CN)6] slurry's pH value and applied potential on tungsten removal rate for chemical-mechanical planarization application

Wear, 2005-07, Vol.259 (7-12), p.1299-1307

2005

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Ceria coated silica particles: One step preparation and settling behaviour under the influence of colloidal and hydrodynamic interactions

Materials chemistry and physics, 2016-04, Vol.173, p.467-474

2016

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XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition

Structural and optical characterization of low-temperature ALD crystalline AlN

Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition

Enhanced rectifying response from metal-insulator-insulator-metal junctions

Chemical mechanical polishing in the dry lubrication regime: Application to conductive polysilicon

Ultrathin-layer chromatography nanostructures modified by atomic layer deposition

The pH-dependant attachment of ceria nanoparticles to silica using surface analytical techniques

Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN

High Performance Oxygen Reduction/Evolution Electrodes for Zinc–Air Batteries Prepared by Atomic Layer Deposition of MnO x

Plasmonic materials for metal–insulator–semiconductor–insulator–metal nanoplasmonic waveguides on silicon-on-insulator platform

Saturation Behavior of Atomic Layer Deposition MnO x from Bis(Ethylcyclopentadienyl) Manganese and Water: Saturation Effect on Coverage of Porous Oxygen Reduction Electrodes for Metal–Air Batteries

Surface plasmon polarization filtering in a single mode dielectric waveguide

A Novel Nanofabrication Damascene Lift-Off Technique

The Effect of Slurry Properties on the CMP Removal Rate of Boron Doped Polysilicon

An overview of corrosion–wear interaction for planarizing metallic thin films

Observation of resonant tunneling phenomenon in metal-insulator-insulator-insulator-metal electron tunnel devices

Surface plasmon induced polarization rotation and optical vorticity in a single mode waveguide

High Rate Chemical Mechanical Polishing of Boron-Doped Polycrystalline Silicon

An investigation of the deposition of ceria on silica by quartz crystal microbalance: Observations on the effect of many body interactions

Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire viaplasma-enhanced atomic layer deposition

A Study of the Colloidal Stability of Mixed Abrasive Slurries and Their Role in CMP

Copper CMP: The Relationship between Polish Rate Uniformity and Lubrication

Effects of K 3[Fe(CN) 6] slurry's pH value and applied potential on tungsten removal rate for chemical–mechanical planarization application

Effects of K3[Fe(CN)6] slurry's pH value and applied potential on tungsten removal rate for chemical-mechanical planarization application

Ceria coated silica particles: One step preparation and settling behaviour under the influence of colloidal and hydrodynamic interactions

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