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Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source

Scientific reports, 2020-12, Vol.10 (1), p.21952-21952, Article 21952

2020

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TEM analysis of photocatalytic TiO2 thin films deposited on polymer substrates by low-temperature ICP-PECVD

Applied surface science, 2019-10, Vol.491, p.116-122

2019

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Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD

Applied surface science, 2019-02, Vol.466, p.63-69

2019

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Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry

Journal of physics. D, Applied physics, 2021-11, Vol.54 (44)

2021

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Interaction of (3-Aminopropyl)triethoxysilane with Pulsed Ar–O2 Afterglow: Application to Nanoparticles Synthesis

Plasma chemistry and plasma processing, 2016-07, Vol.36 (4), p.1031-1050

2016

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Structural and optical properties of a-SiCN thin film synthesised in a microwave plasma at constant temperature and different flow of CH4 added to HMDSN/N2/Ar mixture

Surface & coatings technology, 2011-07, Vol.205, p.S214-S217

2011

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Magnetism and Accelerator-Based Light Sources: Proceedings of the 7th International School ‘‘Synchrotron Radiation and Magnetism’’, Mittelwihr (France), 2018

1st ed. 2021., 2021

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Unveiling a critical thickness in photocatalytic TiO 2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry

Journal of physics. D, Applied physics, 2021-11, Vol.54 (44), p.445303

2021

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Study of VO2 thin film synthesis by atomic layer deposition

Materials today chemistry, 2019-06, Vol.12, p.332-342

2019

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a-SiC x N y thin films deposited by a microwave plasma assisted CVD process using a CH 4 /N 2 /Ar/HMDSN mixture: Methane rate effect

IOP conference series. Materials Science and Engineering, 2010-06, Vol.12, p.12002

2010

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Structural and optical properties of a-SiCN thin film synthesised in a microwave plasma at constant temperature and different flow of CH4 added to HMDSN/N-2/Ar mixture

Surface & coatings technology, 2011-07, Vol.205, p.S214-S217

2011

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Magnetism and Accelerator-Based Light Sources: Proceedings of the 7th International School âÂâÂSynchrotron Radiation and Magnetism'', Mittelwihr (France), 2018

2021

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Anatase TiO 2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source

Scientific reports, 2020-12, Vol.10 (1), p.21952

2020

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Interaction of (3-Aminopropyl)triethoxysilane with Pulsed Ar-O 2 Afterglow: Application to Nanoparticles Synthesis

Plasma chemistry and plasma processing, 2016-07, Vol.36, p.1031-1050

2016

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Continuous Deposition of Organo-Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire-Cylinder Configuration

Plasma processes and polymers, 2014-11, Vol.11 (11), p.1089-1101

2014

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Atomic-Scale Modeling of Nanosystems and Nanostructured Materials

1, 2010

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Advances in the Atomic-Scale Modeling of Nanosystems and Nanostructured Materials

2009

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Magnetism: A Synchrotron Radiation Approach

2006

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Magnetism and Synchrotron Radiation: New Trends

1, 2010

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X-ray Magnetic Circular Dichroism: Historical Perspective and Recent Highlights

Magnetism: A Synchrotron Radiation Approach, 2006, p.71-93

2006

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Collective Electron Dynamics in Metallic and Semiconductor Nanostructures

Advances in the Atomic-Scale Modeling of Nanosystems and Nanostructured Materials, 2010, Vol.795, p.1-44

2010

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Reactive Simulations for Biochemical Processes

Advances in the Atomic-Scale Modeling of Nanosystems and Nanostructured Materials, 2010, Vol.795, p.81-98

2010

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Hitchhiker’s Guide to Multiplet Calculations

Magnetism: A Synchrotron Radiation Approach, 2006, p.143-199

2006

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a-SiCxNy thin films deposited by a microwave plasma assisted CVD process using a CH4/N2/Ar/HMDSN mixture: Methane rate effect

IOP conference series. Materials Science and Engineering, 2010-07, Vol.12 (1), p.012002-012002

2010

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Weak Chemical Interaction and van der Waals Forces:A Combined Density Functional and Intermolecular Perturbation Theory -- Application to Graphite and Graphitic Systems

Advances in the Atomic-Scale Modeling of Nanosystems and Nanostructured Materials, 2010, Vol.795, p.45-79

2010

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Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source

TEM analysis of photocatalytic TiO2 thin films deposited on polymer substrates by low-temperature ICP-PECVD

Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD

Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry

Interaction of (3-Aminopropyl)triethoxysilane with Pulsed Ar–O2 Afterglow: Application to Nanoparticles Synthesis

Structural and optical properties of a-SiCN thin film synthesised in a microwave plasma at constant temperature and different flow of CH4 added to HMDSN/N2/Ar mixture

Magnetism and Accelerator-Based Light Sources: Proceedings of the 7th International School ‘‘Synchrotron Radiation and Magnetism’’, Mittelwihr (France), 2018

Unveiling a critical thickness in photocatalytic TiO 2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry

Study of VO2 thin film synthesis by atomic layer deposition

a-SiC x N y thin films deposited by a microwave plasma assisted CVD process using a CH 4 /N 2 /Ar/HMDSN mixture: Methane rate effect

Structural and optical properties of a-SiCN thin film synthesised in a microwave plasma at constant temperature and different flow of CH4 added to HMDSN/N-2/Ar mixture

Magnetism and Accelerator-Based Light Sources: Proceedings of the 7th International School âÂâÂSynchrotron Radiation and Magnetism'', Mittelwihr (France), 2018

Anatase TiO 2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source

Interaction of (3-Aminopropyl)triethoxysilane with Pulsed Ar-O 2 Afterglow: Application to Nanoparticles Synthesis

Continuous Deposition of Organo-Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire-Cylinder Configuration

Atomic-Scale Modeling of Nanosystems and Nanostructured Materials

Advances in the Atomic-Scale Modeling of Nanosystems and Nanostructured Materials

Magnetism: A Synchrotron Radiation Approach

Magnetism and Synchrotron Radiation: New Trends

X-ray Magnetic Circular Dichroism: Historical Perspective and Recent Highlights

Collective Electron Dynamics in Metallic and Semiconductor Nanostructures

Reactive Simulations for Biochemical Processes

Hitchhiker’s Guide to Multiplet Calculations

a-SiCxNy thin films deposited by a microwave plasma assisted CVD process using a CH4/N2/Ar/HMDSN mixture: Methane rate effect

Weak Chemical Interaction and van der Waals Forces:A Combined Density Functional and Intermolecular Perturbation Theory -- Application to Graphite and Graphitic Systems

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