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Physics of picosecond pulse laser ablation

Journal of applied physics, 2019-02, Vol.125 (8)

2019

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Model laser damage precursors for high quality optical materials

Optics express, 2014-02, Vol.22 (3), p.3393-3404

2014

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Optical damage performance of conductive widegap semiconductors: spatial, temporal, and lifetime modeling

Optical materials express, 2017-01, Vol.7 (1), p.202-212

2017

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Enhancement of laser material drilling using high-impulse multi-laser melt ejection

Optics express, 2019-07, Vol.27 (14), p.19864-19886

2019

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Extracting the distribution of laser damage precursors on fused silica surfaces for 351 nm, 3 ns laser pulses at high fluences (20-150 J/cm2)

Optics express, 2012-05, Vol.20 (10), p.11561-11573

2012

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Revisiting beam filamentation formation conditions in high power lasers

Optics express, 2019-04, Vol.27 (8), p.10611-10630

2019

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Revisiting an airgap split-optics mitigation for beam filamentation in high power lasers

Optics express, 2019-10, Vol.27 (22), p.32764-32778

2019

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Metallic-like photoluminescence and absorption in fused silica surface flaws

Applied physics letters, 2009-04, Vol.94 (15)

2009

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Laser-induced modifications of HfO2 coatings using picosecond pulses at 1053 nm: Using polarization to isolate surface defects

Journal of applied physics, 2018-08, Vol.124 (8)

2018

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Gigashot optical degradation in silica optics at 351 nm

Optics express, 2015-02, Vol.23 (4), p.4074-4091

2015

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Quasi-continuum photoluminescence: Unusual broad spectral and temporal characteristics found in defective surfaces of silica and other materials

Journal of applied physics, 2014-02, Vol.115 (8)

2014

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Monte Carlo simulation of the CHISEL flash memory cell

IEEE transactions on electron devices, 2000-10, Vol.47 (10), p.1873-1881

2000

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IEEE_Xplore

On interface and oxide degradation in VLSI MOSFETs - Part II: Fowler-Nordheim stress regime

IEEE transactions on electron devices, 2002-02, Vol.49 (2), p.254-263

2002

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On interface and oxide degradation in VLSI MOSFETs - Part I: Deuterium effect in CHE stress regime

IEEE transactions on electron devices, 2002-02, Vol.49 (2), p.247-253

2002

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Explanation of P/E cycling impact on drain disturb in flash EEPROMs under CHE and CHISEL programming operation

IEEE transactions on electron devices, 2005-04, Vol.52 (4), p.534-540

2005

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IEEE_Xplore

Evidence of substrate enhanced high-energy tails in the distribution function of deep submicron MOSFETs by light emission measurements

IEEE electron device letters, 1999-11, Vol.20 (11), p.595-597

1999

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IEEE_Xplore

Experimental study of low voltage anode hole injection in thin oxides

Microelectronic engineering, 2001-11, Vol.59 (1), p.55-60

2001

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Energy transfer networks: Quasicontinuum photoluminescence linked to high densities of defects

Physical review materials, 2017-11, Vol.1 (6), Article 065201

2017

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Optical damage performance of conductive widegap semiconductors: spatial, temporal, and lifetime modeling

Optical materials express, 2016-12, Vol.7 (1)

2016

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Drain disturb during CHISEL programming of NOR flash EEPROMs-physical mechanisms and impact of technological parameters

IEEE transactions on electron devices, 2004-05, Vol.51 (5), p.701-707

2004

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IEEE_Xplore

Ultra-fast photoluminescence in fused silica surface flaws susceptible to laser damage

MRS proceedings, 2011, Vol.1365 (1), Article mrss11-1365-tt08-04

2011

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Metallic-like photoluminescence and absorption in fused silicasurface flaws

Applied physics letters, 2009-04, Vol.94 (15), p.151114-151114-3

2009

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CHISEL programming operation of scaled NOR flash EEPROMs-effect of voltage scaling, device scaling and technological parameters

IEEE transactions on electron devices, 2003-10, Vol.50 (10), p.2104-2111

2003

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IEEE_Xplore

Hot Carrier Degradation of Gain in Bipolar Transistors

MRS proceedings, 1995, Vol.391, p.11-20, Article 11

1995

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Impact ionization and distribution functions in sub-micron nMOSFET technologies

IEEE electron device letters, 1995-10, Vol.16 (10), p.439-441

1995

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IEEE_Xplore

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Physics of picosecond pulse laser ablation

Model laser damage precursors for high quality optical materials

Optical damage performance of conductive widegap semiconductors: spatial, temporal, and lifetime modeling

Enhancement of laser material drilling using high-impulse multi-laser melt ejection

Extracting the distribution of laser damage precursors on fused silica surfaces for 351 nm, 3 ns laser pulses at high fluences (20-150 J/cm2)

Revisiting beam filamentation formation conditions in high power lasers

Revisiting an airgap split-optics mitigation for beam filamentation in high power lasers

Metallic-like photoluminescence and absorption in fused silica surface flaws

Laser-induced modifications of HfO2 coatings using picosecond pulses at 1053 nm: Using polarization to isolate surface defects

Gigashot optical degradation in silica optics at 351 nm

Quasi-continuum photoluminescence: Unusual broad spectral and temporal characteristics found in defective surfaces of silica and other materials

Monte Carlo simulation of the CHISEL flash memory cell

On interface and oxide degradation in VLSI MOSFETs - Part II: Fowler-Nordheim stress regime

On interface and oxide degradation in VLSI MOSFETs - Part I: Deuterium effect in CHE stress regime

Explanation of P/E cycling impact on drain disturb in flash EEPROMs under CHE and CHISEL programming operation

Evidence of substrate enhanced high-energy tails in the distribution function of deep submicron MOSFETs by light emission measurements

Experimental study of low voltage anode hole injection in thin oxides

Energy transfer networks: Quasicontinuum photoluminescence linked to high densities of defects

Optical damage performance of conductive widegap semiconductors: spatial, temporal, and lifetime modeling

Drain disturb during CHISEL programming of NOR flash EEPROMs-physical mechanisms and impact of technological parameters

Ultra-fast photoluminescence in fused silica surface flaws susceptible to laser damage

Metallic-like photoluminescence and absorption in fused silicasurface flaws

CHISEL programming operation of scaled NOR flash EEPROMs-effect of voltage scaling, device scaling and technological parameters

Hot Carrier Degradation of Gain in Bipolar Transistors

Impact ionization and distribution functions in sub-micron nMOSFET technologies

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