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Business Analysis for Business Intelligence

Brijs, Bert

1, 2016

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Business analysis for business intelligence

Brijs, Bert

2012

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Atomic layer deposition of hafnium oxide on germanium substrates

Journal of applied physics, 2005-03, Vol.97 (6), p.064104-064104-10

2005

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Grazing Incidence-X-ray Fluorescence Spectrometry for the Compositional Analysis of Nanometer-Thin High- κDielectric HfO2 Layers

Analytical Sciences, 2005, Vol.21(7), pp.845-850

2005

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Enhanced initial growth of atomic-layer-deposited metal oxides on hydrogen-terminated silicon

Applied physics letters, 2003-07, Vol.83 (4), p.740-742

2003

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Scaling to Sub-1 nm Equivalent Oxide Thickness with Hafnium Oxide Deposited by Atomic Layer Deposition

Journal of the Electrochemical Society, 2006-01, Vol.153 (8), p.F180

2006

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NiO Thin Films Synthesized by Atomic Layer Deposition using Ni(dmamb)2 and Ozone as Precursors

Chemical vapor deposition, 2012-03, Vol.18 (1-3), p.61-69

2012

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A comparative study of the microstructure-dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach

Physica status solidi. A, Applications and materials science, 2011-08, Vol.208 (8), p.1920-1924

2011

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A comparative study of the microstructure–dielectric properties of crystalline SrTiO 3 ALD films obtained via seed layer approach

Physica status solidi. A, Applications and materials science, 2011-08, Vol.208 (8), p.1920-1924

2011

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Data Analytics and Scrum

Data Analytics in Project Management, 2019, p.193-211

1, 2019

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Compositional depth profiling of TaCN thin films

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-07, Vol.30 (4)

2012

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Hafnium oxide films by atomic layer deposition for high- κ gate dielectric applications: Analysis of the density of nanometer-thin films

Applied physics letters, 2005-02, Vol.86 (7), p.073116-073116-3

2005

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Atomic Layer Deposition of Gadolinium Aluminate using Gd(iPrCp)3, TMA, and O3 or H2O

Chemical vapor deposition, 2010-06, Vol.16 (4-6), p.170-178

2010

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Growth of Dysprosium-, Scandium-, and Hafnium-based Third Generation High-κ Dielectrics by Atomic Vapor Deposition

Chemical vapor deposition, 2007-10, Vol.13 (10), p.567-573

2007

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New low-stress PECVD poly-SiGe Layers for MEMS

Journal of microelectromechanical systems, 2003-12, Vol.12 (6), p.816-825

2003

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Ni fully silicided gates for 45 nm CMOS applications

Microelectronic engineering, 2005-12, Vol.82 (3), p.441-448

2005

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Metal-Organic Chemical Vapor Deposition of Ti-Doped NiO Layers for Application in Resistive Switching Memories

ECS transactions, 2010, Vol.33 (3), p.313-322

2010

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SiGe SEG Growth for Buried Channels p-MOS Devices

ECS transactions, 2009-09, Vol.25 (7), p.201-210

2009

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Atomic-Layer Deposition of Lutetium Aluminate Thin Films for Non-Volatile Memory Applications

ECS transactions, 2011, Vol.34 (1), p.473-478

2011

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Atomic Layer Deposition of Gadolinium Aluminate using Gd( i PrCp) 3 , TMA, and O 3 or H 2 O

Chemical vapor deposition, 2010-06, Vol.16 (4-6), p.170-178

2010

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(Invited) Introducing Lanthanide Aluminates as Dielectrics for Nonvolatile Memory Applications: A Material Scientist's View

ECS transactions, 2010-10, Vol.33 (3), p.31-42

2010

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As-deposited superconducting thin films by electron cyclotron resonance-assisted laser ablation for application in micro-electronics

Japanese Journal of Applied Physics, 1991-09, Vol.30 (9A), p.1959-1963

1991

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(Invited) Rare Earth Materials for Semiconductor Applications

ECS transactions, 2010, Vol.28 (1), p.155-164

2010

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Growth and Layer Characterization of SrTiO3 by Atomic Layer Deposition using Sr(tBu3Cp)2 and Ti(OMe)4

MRS proceedings, 2009, Vol.1155 (1)

2009

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BI and Marketing Management

Business Analysis for Business Intelligence, 2013, p.153-174

Brijs, Bert

1, 2013

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Business Analysis for Business Intelligence

Business analysis for business intelligence

Atomic layer deposition of hafnium oxide on germanium substrates

Grazing Incidence-X-ray Fluorescence Spectrometry for the Compositional Analysis of Nanometer-Thin High- κDielectric HfO2 Layers

Enhanced initial growth of atomic-layer-deposited metal oxides on hydrogen-terminated silicon

Scaling to Sub-1 nm Equivalent Oxide Thickness with Hafnium Oxide Deposited by Atomic Layer Deposition

NiO Thin Films Synthesized by Atomic Layer Deposition using Ni(dmamb)2 and Ozone as Precursors

A comparative study of the microstructure-dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach

A comparative study of the microstructure–dielectric properties of crystalline SrTiO 3 ALD films obtained via seed layer approach

Data Analytics and Scrum

Compositional depth profiling of TaCN thin films

Hafnium oxide films by atomic layer deposition for high- κ gate dielectric applications: Analysis of the density of nanometer-thin films

Atomic Layer Deposition of Gadolinium Aluminate using Gd(iPrCp)3, TMA, and O3 or H2O

Growth of Dysprosium-, Scandium-, and Hafnium-based Third Generation High-κ Dielectrics by Atomic Vapor Deposition

New low-stress PECVD poly-SiGe Layers for MEMS

Ni fully silicided gates for 45 nm CMOS applications

Metal-Organic Chemical Vapor Deposition of Ti-Doped NiO Layers for Application in Resistive Switching Memories

SiGe SEG Growth for Buried Channels p-MOS Devices

Atomic-Layer Deposition of Lutetium Aluminate Thin Films for Non-Volatile Memory Applications

Atomic Layer Deposition of Gadolinium Aluminate using Gd( i PrCp) 3 , TMA, and O 3 or H 2 O

(Invited) Introducing Lanthanide Aluminates as Dielectrics for Nonvolatile Memory Applications: A Material Scientist's View

As-deposited superconducting thin films by electron cyclotron resonance-assisted laser ablation for application in micro-electronics

(Invited) Rare Earth Materials for Semiconductor Applications

Growth and Layer Characterization of SrTiO3 by Atomic Layer Deposition using Sr(tBu3Cp)2 and Ti(OMe)4

BI and Marketing Management

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