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High-temperature oxidation resistance of chromium-based coatings deposited by DLI-MOCVD for enhanced protection of the inner surface of long tubes

Surface & coatings technology, 2018-09, Vol.349, p.1048-1057

2018

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A genetic algorithm for topology optimization of area-to-point heat conduction problem

International journal of thermal sciences, 2016-10, Vol.108, p.209-217

2016

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Chromium carbide growth at low temperature by a highly efficient DLI-MOCVD process in effluent recycling mode

Surface & coatings technology, 2017-12, Vol.332, p.96-104

2017

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High temperature properties of AlN coatings deposited by chemical vapor deposition for solar central receivers

Surface & coatings technology, 2019-11, Vol.377, p.124872, Article 124872

2019

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Prediction of dislocation density in AlN or GaN films deposited on (0001) sapphire

Journal of materials science, 2020-08, Vol.55 (22), p.9152-9162

2020

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Evolution of Crystal Structure During the Initial Stages of ZnO Atomic Layer Deposition

Chemistry of materials, 2016-01, Vol.28 (2), p.592-600

2016

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Scale up of a DLI-MOCVD process for the internal treatment of a batch of 16 nuclear fuel cladding segments with a CrCx protective coating

Surface & coatings technology, 2019-10, Vol.375, p.894-902

2019

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Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy

Thin solid films, 2014-12, Vol.573 (12), p.140-147

2014

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Effects of AlN nucleation layers on the growth of AlN films using high temperature hydride vapor phase epitaxy

Journal of alloys and compounds, 2012-06, Vol.526, p.103-109

2012

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Epitaxial growth of AlN on c-plane sapphire by High Temperature Hydride Vapor Phase Epitaxy: Influence of the gas phase N/Al ratio and low temperature protective layer

Surface & coatings technology, 2013-12, Vol.237, p.118-125

2013

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HVPE of aluminum nitride, film evaluation and multiscale modeling of the growth process

Journal of crystal growth, 2017-06, Vol.468, p.235-240

2017

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High temperature chemical vapor deposition of aluminum nitride, growth and evaluation

Surface & coatings technology, 2013-09, Vol.230, p.111-118

2013

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Epitaxial and polycrystalline growth of AlN by high temperature CVD: Experimental results and simulation

Surface & coatings technology, 2010-11, Vol.205 (5), p.1294-1301

2010

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Night cooling with a Ventilated Internal Double Wall

Energy and buildings, 2010-03, Vol.42 (3), p.393-400

2010

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Experimental study of uranium carbide pyrophoricity

Powder technology, 2011-03, Vol.208 (2), p.312-317

2011

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Experimental kinetic study of oxidation of uranium monocarbide powders under controlled oxygen partial pressures below 230°C

Journal of nuclear materials, 2013-01, Vol.432 (1-3), p.505-519

2013

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Investigation on AlN epitaxial growth and related etching phenomenon at high temperature using high temperature chemical vapor deposition process

Journal of crystal growth, 2011-11, Vol.335 (1), p.17-24

2011

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Treatment of Diesel Particles Using an Electrostatic Agglomerator Under Negative DC Corona: A Modeling and Experimental Study

IEEE transactions on plasma science, 2007-06, Vol.35 (3), p.675-692

2007

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Agglomeration of diesel particles by an electrostatic agglomerator under positive DC voltage: Experimental study

Journal of electrostatics, 2008-05, Vol.66 (5), p.235-245

2008

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Effects of the V/III ratio on the quality of aluminum nitride grown on (0001) sapphire by high temperature hydride vapor phase epitaxy

Physica status solidi. C, 2013-03, Vol.10 (3), p.362-365

2013

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Conformal Atomic Layer Deposition of TA-Based Diffusion Barrier Film Using a Novel Mono-Guanidinate Precursor

Journal of nanoscience and nanotechnology, 2011-09, Vol.11 (9), p.8383-8386

2011

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Treatment of submicron particles using an electrostatic agglomerator in DC-negative voltage: Re-entrainment experimental study and modeling

Journal of electrostatics, 2009-07, Vol.67 (4), p.574-582

2009

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Prediction of dislocation density in AlN or GaN films deposited on

Journal of materials science, 2020-08, Vol.55 (22), p.9152

2020

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High temperature chemical vapor deposition of AlN/W1―XReX coatings on bulk SiC

Surface & coatings technology, 2010-11, Vol.205 (5), p.1302-1306

2010

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Chemical conversion of MoS2 thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2023-09, Vol.41 (5)

2023

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High-temperature oxidation resistance of chromium-based coatings deposited by DLI-MOCVD for enhanced protection of the inner surface of long tubes

A genetic algorithm for topology optimization of area-to-point heat conduction problem

Chromium carbide growth at low temperature by a highly efficient DLI-MOCVD process in effluent recycling mode

High temperature properties of AlN coatings deposited by chemical vapor deposition for solar central receivers

Prediction of dislocation density in AlN or GaN films deposited on (0001) sapphire

Evolution of Crystal Structure During the Initial Stages of ZnO Atomic Layer Deposition

Scale up of a DLI-MOCVD process for the internal treatment of a batch of 16 nuclear fuel cladding segments with a CrCx protective coating

Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy

Effects of AlN nucleation layers on the growth of AlN films using high temperature hydride vapor phase epitaxy

Epitaxial growth of AlN on c-plane sapphire by High Temperature Hydride Vapor Phase Epitaxy: Influence of the gas phase N/Al ratio and low temperature protective layer

HVPE of aluminum nitride, film evaluation and multiscale modeling of the growth process

High temperature chemical vapor deposition of aluminum nitride, growth and evaluation

Epitaxial and polycrystalline growth of AlN by high temperature CVD: Experimental results and simulation

Night cooling with a Ventilated Internal Double Wall

Experimental study of uranium carbide pyrophoricity

Experimental kinetic study of oxidation of uranium monocarbide powders under controlled oxygen partial pressures below 230°C

Investigation on AlN epitaxial growth and related etching phenomenon at high temperature using high temperature chemical vapor deposition process

Treatment of Diesel Particles Using an Electrostatic Agglomerator Under Negative DC Corona: A Modeling and Experimental Study

Agglomeration of diesel particles by an electrostatic agglomerator under positive DC voltage: Experimental study

Effects of the V/III ratio on the quality of aluminum nitride grown on (0001) sapphire by high temperature hydride vapor phase epitaxy

Conformal Atomic Layer Deposition of TA-Based Diffusion Barrier Film Using a Novel Mono-Guanidinate Precursor

Treatment of submicron particles using an electrostatic agglomerator in DC-negative voltage: Re-entrainment experimental study and modeling

Prediction of dislocation density in AlN or GaN films deposited on

High temperature chemical vapor deposition of AlN/W1―XReX coatings on bulk SiC

Chemical conversion of MoS2 thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements

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