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Crystalline silicon carbon nitride: A wide band gap semiconductor

Applied physics letters, 1998-05, Vol.72 (19), p.2463-2465

1998

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Quantum Confinement Effect in Diamond Nanocrystals Studied by X-Ray-Absorption Spectroscopy

Physical review letters, 1999-06, Vol.82 (26), p.5377-5380

1999

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Composition of SiCN crystals consisting of a predominantly carbon-nitride network

Journal of materials research, 1997-02, Vol.12 (2), p.322-325

1997

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Formation of crystalline silicon carbon nitride films by microwave plasma-enhanced chemical vapor deposition

Diamond and related materials, 1996-04, Vol.5 (3-5), p.514-518

1996

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Highly transparent nano-crystalline diamond films via substrate pretreatment and methane fraction optimization

Thin solid films, 1998-11, Vol.332 (1-2), p.34-39

1998

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Kinetics of C6H5 Radical Reactions with Toluene and Xylenes by Cavity Ringdown Spectrometry

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 1999-05, Vol.103 (20), p.4002-4008

1999

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Effect of radio-frequency power and substrate temperature on properties of hot-plasma-box glow-discharge-deposited hydrogenated amorphous silicon carbon alloys

Journal of applied physics, 1993-02, Vol.73 (4), p.1743-1749

1993

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Sputtering process of carbon nitride films by using a novel bio-molecular C-N containing target

Thin solid films, 1998-11, Vol.332 (1-2), p.74-79

1998

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Novel two stage method for growth of highly transparent nano-crystalline diamond films

Materials letters, 1998, Vol.36 (5), p.279-283

1998

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Traveling wave method for measurement of thermal conductivity of thin films

Review of scientific instruments, 1997-11, Vol.68 (11), p.4180-4183

1997

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Effects of substrate pretreatment and methane fraction on the optical transparency of nanocrystalline diamond thin films

Journal of materials research, 1998-07, Vol.13 (7), p.1769-1773

1998

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Highly transparent nano-crystalline diamond films grown by microwave CVD

Solid state communications, 1998-01, Vol.107 (6), p.301-305

1998

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Temperature dependence of the direct band gap of Si-containing carbon nitride crystalline films

Physical review. B, Condensed matter, 1997-09, Vol.56 (11), p.6498-6501

1997

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Si-containing crystalline carbon nitride derived from microwave plasma-enhanced chemical vapor deposition

Thin solid films, 1997-07, Vol.303 (1), p.66-75

1997

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The use of a biomolecular target for crystalline carbon nitride film deposition by Ar ion-beam sputtering without any other source of nitrogen

Applied physics letters, 1998-06, Vol.72 (26), p.3449-3451

1998

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Growth of hydrogenated microcrystalline silicon (μc-Si:H) films by HWCVD using a Graphite catalyzer

MRS proceedings, 2004, Vol.808, Article A9.30

2004

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Growth, characterization, optical and X-ray absorption studies of nano-crystalline diamond films

Diamond and related materials, 2000-04, Vol.9 (3-6), p.877-882

2000

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Hot plasma box glow discharge reactor for production of uniform films of hydrogenated amorphous silicon alloys

Thin solid films, 1991-03, Vol.197 (1), p.215-224

1991

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Role of boron in the structural and electronic properties of hydrogenated silicon films deposited by r.f. magnetron sputtering

Philosophical magazine. B, Physics of condensed matter. Structural, electronic, optical, and magnetic properties., 1995-02, Vol.71 (2), p.115-125

1995

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Improved fluorinated hydrogenated amorphous silicon alloys prepared using the hot-plasma-box glow-discharge technique

Philosophical magazine. B, Physics of condensed matter. Structural, electronic, optical, and magnetic properties., 1994-08, Vol.70 (2), p.263-276

1994

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Recent progress of Spectrolab high-efficiency space solar cells

2012 38th IEEE Photovoltaic Specialists Conference, 2012, p.003146-003149

2012

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Electronic and atomic structures of the Si-C-N thin film by x-ray-absorption spectroscopy and theoretical calculations

Physical review. B, Condensed matter, 1998-10, Vol.58 (14), p.9018-9024

1998

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Growth of clean amorphous silicon–carbon alloy films by hot-filament assisted chemical vapor deposition technique

Applied physics letters, 1995-04, Vol.66 (14), p.1741-1743

1995

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Fluorine-induced suppression of disorder effects of carbon in the hydrogenated amorphous silicon-carbon alloy thin films

Journal of applied physics, 1995-01, Vol.77 (1), p.54-61

1995

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Short-range order, microstructure and their correlation with light-induced degradation in hydrogenated amorphous silicon deposited at high growth rates by cathode heating technique

Journal of applied physics, 1994-11, Vol.76 (9), p.5208-5213

1994

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Crystalline silicon carbon nitride: A wide band gap semiconductor

Quantum Confinement Effect in Diamond Nanocrystals Studied by X-Ray-Absorption Spectroscopy

Composition of SiCN crystals consisting of a predominantly carbon-nitride network

Formation of crystalline silicon carbon nitride films by microwave plasma-enhanced chemical vapor deposition

Highly transparent nano-crystalline diamond films via substrate pretreatment and methane fraction optimization

Kinetics of C6H5 Radical Reactions with Toluene and Xylenes by Cavity Ringdown Spectrometry

Effect of radio-frequency power and substrate temperature on properties of hot-plasma-box glow-discharge-deposited hydrogenated amorphous silicon carbon alloys

Sputtering process of carbon nitride films by using a novel bio-molecular C-N containing target

Novel two stage method for growth of highly transparent nano-crystalline diamond films

Traveling wave method for measurement of thermal conductivity of thin films

Effects of substrate pretreatment and methane fraction on the optical transparency of nanocrystalline diamond thin films

Highly transparent nano-crystalline diamond films grown by microwave CVD

Temperature dependence of the direct band gap of Si-containing carbon nitride crystalline films

Si-containing crystalline carbon nitride derived from microwave plasma-enhanced chemical vapor deposition

The use of a biomolecular target for crystalline carbon nitride film deposition by Ar ion-beam sputtering without any other source of nitrogen

Growth of hydrogenated microcrystalline silicon (μc-Si:H) films by HWCVD using a Graphite catalyzer

Growth, characterization, optical and X-ray absorption studies of nano-crystalline diamond films

Hot plasma box glow discharge reactor for production of uniform films of hydrogenated amorphous silicon alloys

Role of boron in the structural and electronic properties of hydrogenated silicon films deposited by r.f. magnetron sputtering

Improved fluorinated hydrogenated amorphous silicon alloys prepared using the hot-plasma-box glow-discharge technique

Recent progress of Spectrolab high-efficiency space solar cells

Electronic and atomic structures of the Si-C-N thin film by x-ray-absorption spectroscopy and theoretical calculations

Growth of clean amorphous silicon–carbon alloy films by hot-filament assisted chemical vapor deposition technique

Fluorine-induced suppression of disorder effects of carbon in the hydrogenated amorphous silicon-carbon alloy thin films

Short-range order, microstructure and their correlation with light-induced degradation in hydrogenated amorphous silicon deposited at high growth rates by cathode heating technique

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