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A Leaky‐Integrate‐and‐Fire Neuron Analog Realized with a Mott Insulator

Advanced functional materials, 2017-03, Vol.27 (11), p.np-n/a

2017

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Resistive Switching in Mott Insulators and Correlated Systems

Advanced functional materials, 2015-10, Vol.25 (40), p.6287-6305

2015

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Comprehensive characterization of Al-doped ZnO thin films deposited in confocal radio frequency magnetron co-sputtering

Thin solid films, 2023-09, Vol.780, p.139947, Article 139947

2023

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Different threshold and bipolar resistive switching mechanisms in reactively sputtered amorphous undoped and Cr-doped vanadium oxide thin films

Journal of applied physics, 2018-01, Vol.123 (4)

2018

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Mott insulators: A large class of materials for Leaky Integrate and Fire (LIF) artificial neuron

Journal of applied physics, 2018-10, Vol.124 (15)

2018

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Control of stoichiometry and morphology in polycrystalline V2O3 thin films using oxygen buffers

Journal of materials science, 2020-10, Vol.55 (30), p.14717-14727

2020

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Control of resistive switching in AM4Q8 narrow gap Mott insulators: A first step towards neuromorphic applications

Physica status solidi. A, Applications and materials science, 2015-02, Vol.212 (2), p.239-244

2015

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First demonstration of “Leaky Integrate and Fire” artificial neuron behavior on (V0.95Cr0.05)2O3 thin film

MRS communications, 2018-09, Vol.8 (3), p.835-841

2018

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Effect of RF sputtering power and vacuum annealing on the properties of AZO thin films prepared from ceramic target in confocal configuration

Materials science in semiconductor processing, 2020-11, Vol.118, p.105217, Article 105217

2020

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Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1-xVx)2O3

ACS applied materials & interfaces, 2023-11, Vol.15 (47), p.54611-54621

2023

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Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2024-03, Vol.42 (2)

2024

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First evidence of resistive switching in polycrystalline GaV4S8 thin layers

Physica status solidi. PSS-RRL. Rapid research letters, 2011-02, Vol.5 (2), p.53-55

2011

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Metal–insulator transitions in (V1-xCrx)2O3 thin films deposited by reactive direct current magnetron co-sputtering

Thin solid films, 2016-10, Vol.617, p.56-62

2016

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Synthesis of CdS with Large Band Gap Values by a Simple Route at Room Temperature

Wuli huaxue xuebao, 2015, Vol.31 (7), p.1338-1344

2015

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Influence of Ion Bombardment and Annealing on the Structural and Optical Properties of TiOx Thin Films Deposited in Inductively Coupled TTIP/O2 Plasma

Plasma processes and polymers, 2009-06, Vol.6 (S1), p.S741-S745

2009

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Magnetron Sputtering of Aluminium Nitride Thin Films for Thermal Management

Plasma processes and polymers, 2007-04, Vol.4 (S1), p.S1-S5

2007

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Thin films of binary amorphous Zn-Zr alloys developed by magnetron co-sputtering for the production of degradable coronary stents: A preliminary study

Bioactive materials, 2018-12, Vol.3 (4), p.385-388

2018

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一种在室温合成具有宽带隙CdS的简单方法

物理化学学报, 2015, Vol.31 (7), p.1338-1344

李辉刘向鑫张玉峰杜忠明杨彪韩俊峰 BESLAND Marie-Paule

2015

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Dip-coated La2Ti2O7 as a buffer layer for growth of Bi3.25La0.75Ti3O12 films with enhanced (011) orientation

Journal of the European Ceramic Society, 2009-07, Vol.29 (10), p.1977-1985

2009

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Comparison of Electrical Behavior of GaN-Based MOS Structures Obtained by Different PECVD Process

Materials science forum, 2012-01, Vol.711, p.228-232

2012

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Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr 1– x V x ) 2 O 3

ACS applied materials & interfaces, 2023-11, Vol.15 (47), p.54611-54621

2023

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Competition between V2O3 phases deposited by one-step reactive sputtering process on polycrystalline conducting electrode

Thin solid films, 2020-07, Vol.705, p.138063, Article 138063

2020

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Thermal conductivity of aluminium nitride thin films prepared by reactive magnetron sputtering

Journal of physics. D, Applied physics, 2012-01, Vol.45 (1), p.15301-1-8

2012

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Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect

Journal of physics. D, Applied physics, 2013-02, Vol.46 (6), p.65308-1-7

2013

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Control of stoichiometry and morphology in polycrystalline V.sub.2O.sub.3 thin films using oxygen buffers

Journal of materials science, 2020-10, Vol.55 (30), p.14717

2020

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A Leaky‐Integrate‐and‐Fire Neuron Analog Realized with a Mott Insulator

Resistive Switching in Mott Insulators and Correlated Systems

Comprehensive characterization of Al-doped ZnO thin films deposited in confocal radio frequency magnetron co-sputtering

Different threshold and bipolar resistive switching mechanisms in reactively sputtered amorphous undoped and Cr-doped vanadium oxide thin films

Mott insulators: A large class of materials for Leaky Integrate and Fire (LIF) artificial neuron

Control of stoichiometry and morphology in polycrystalline V2O3 thin films using oxygen buffers

Control of resistive switching in AM4Q8 narrow gap Mott insulators: A first step towards neuromorphic applications

First demonstration of “Leaky Integrate and Fire” artificial neuron behavior on (V0.95Cr0.05)2O3 thin film

Effect of RF sputtering power and vacuum annealing on the properties of AZO thin films prepared from ceramic target in confocal configuration

Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1-xVx)2O3

Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors

First evidence of resistive switching in polycrystalline GaV4S8 thin layers

Metal–insulator transitions in (V1-xCrx)2O3 thin films deposited by reactive direct current magnetron co-sputtering

Synthesis of CdS with Large Band Gap Values by a Simple Route at Room Temperature

Influence of Ion Bombardment and Annealing on the Structural and Optical Properties of TiOx Thin Films Deposited in Inductively Coupled TTIP/O2 Plasma

Magnetron Sputtering of Aluminium Nitride Thin Films for Thermal Management

Thin films of binary amorphous Zn-Zr alloys developed by magnetron co-sputtering for the production of degradable coronary stents: A preliminary study

一种在室温合成具有宽带隙CdS的简单方法

Dip-coated La2Ti2O7 as a buffer layer for growth of Bi3.25La0.75Ti3O12 films with enhanced (011) orientation

Comparison of Electrical Behavior of GaN-Based MOS Structures Obtained by Different PECVD Process

Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr 1– x V x ) 2 O 3

Competition between V2O3 phases deposited by one-step reactive sputtering process on polycrystalline conducting electrode

Thermal conductivity of aluminium nitride thin films prepared by reactive magnetron sputtering

Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect

Control of stoichiometry and morphology in polycrystalline V.sub.2O.sub.3 thin films using oxygen buffers

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