UB Paderborn / Katalog / Suche / in CDI

Transparent flexible thermoelectric material based on non-toxic earth-abundant p-type copper iodide thin film

Nature communications, 2017-07, Vol.8 (1), p.16076-7, Article 16076

2017

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Developing a micro-thermography system for thermal characterization of LED packages

Microelectronic engineering, 2022-02, Vol.254, p.111694, Article 111694

2022

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Combined AFM–SEM study of the diamond nucleation layer on Ir(001)

Diamond and related materials, 2007-04, Vol.16 (4), p.665-670

2007

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Crystallization and silicon diffusion nanoscale effects on the electrical properties of Al2O3 based devices

Microelectronic engineering, 2009-07, Vol.86 (7-9), p.1921-1924

2009

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Influence of the manufacturing process on the electrical properties of thin (<4 nm) Hafnium based high- k stacks observed with CAFM

Microelectronics and reliability, 2007-09, Vol.47 (9), p.1424-1428

2007

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Kelvin probe force microscopy – An appropriate tool for the electrical characterisation of LED heterostructures

Microelectronics and reliability, 2006-09, Vol.46 (9), p.1736-1740

2006

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Properties and deposition processes of a-C:H films from CH4/Ar dielectric barrier discharge plasmas

Surface & coatings technology, 2006-05, Vol.200 (20-21), p.5819-5822

2006

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Thickness determination of thin and ultra-thin SiO2 films by C-AFM IV-spectroscopy

Applied surface science, 2006-01, Vol.252 (6), p.2375-2388

2006

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Deposition of a-C:H films with an ECWR-reactor at 27 MHz: plasma diagnostics and film properties

Surface & coatings technology, 2001-07, Vol.142, p.342-347

2001

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A triangular section magnetic solenoid filter for removal of macro- and nano-particles from pulsed graphite cathodic vacuum arc plasmas

Surface & coatings technology, 2005-12, Vol.200 (7), p.2243-2248

2005

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W fuzz layers: very high resistance to sputtering under fusion-relevant He + irradiations

Plasma science & technology, 2022-01, Vol.24 (1), p.15601

2022

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New trends in the application of Scanning Probe Techniques in Failure Analysis

Microelectronics and reliability, 2004-09, Vol.44 (9), p.1541-1546

2004

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Surface roughness, scratch resistance and tribological properties of hydrogenated amorphous carbon coatings prepared by low-pressure dielectric barrier discharge

Surface & coatings technology, 2003-09, Vol.174, p.310-315

2003

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Experimental observations of steady anodic vacuum arcs with thermionic cathodes

IEEE transactions on plasma science, 1996-12, Vol.24 (6), p.1389-1393

Benstetter, G.

1996

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Use of Coated-Metal Particles in Rear Busbar Pastes to Reduce Silver Consumption

IEEE journal of photovoltaics, 2015-03, Vol.5 (2), p.534-537

2015

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The effect of the surface layer of tetrahedral amorphous carbon films on their tribological and electron emission properties investigated by atomic force microscopy

Applied physics letters, 2003-06, Vol.82 (22), p.3898-3900

2003

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Publisher's Note: "Degradation of polycrystalline HfO 2 -based gate dielectrics under nanoscale electrical stress" [Appl. Phys. Lett. 99, 103510 (2011)]

Applied physics letters, 2011-12, Vol.99 (23), p.239901-239901-1

2011

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Publisher’s Note: “Degradation of polycrystalline HfO2-based gate dielectrics under nanoscale electrical stress” [Appl. Phys. Lett. 99, 103510 (2011)]

Applied physics letters, 2011-12, Vol.99 (23)

2011

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Degradation of polycrystalline HfO 2 -based gate dielectrics under nanoscale electrical stress

Applied physics letters, 2011-09, Vol.99 (10), p.103510-103510-3

2011

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Reliability and gate conduction variability of HfO sub(2-based MOS devices: A combined nanoscale and device level study)

Microelectronic engineering, 2011-07, Vol.88 (7), p.1334-1337

2011

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Conducting atomic force microscopy for nanoscale electron emissions from various diamond-like carbon films

Applied surface science, 2005-08, Vol.249 (1), p.315-321

2005

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Surface properties of silicon oxide films deposited using low-pressure dielectric barrier discharge

Applied surface science, 2009-06, Vol.255 (17), p.7708-7712

2009

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Reliability and gate conduction variability of HfO 2-based MOS devices: A combined nanoscale and device level study

Microelectronic engineering, 2011, Vol.88 (7), p.1334-1337

2011

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Surface roughness, mechanical and tribological properties of ultrathin tetrahedral amorphous carbon coatings from atomic force measurements

Thin solid films, 2003-07, Vol.436 (2), p.244-249

2003

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Nanoscale electron field emissions from the bare, hydrogenated, and graphitelike-layer-covered tetrahedral amorphous carbon films

Journal of applied physics, 2006-02, Vol.99 (4)

2006

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Transparent flexible thermoelectric material based on non-toxic earth-abundant p-type copper iodide thin film

Developing a micro-thermography system for thermal characterization of LED packages

Combined AFM–SEM study of the diamond nucleation layer on Ir(001)

Crystallization and silicon diffusion nanoscale effects on the electrical properties of Al2O3 based devices

Influence of the manufacturing process on the electrical properties of thin (<4 nm) Hafnium based high- k stacks observed with CAFM

Kelvin probe force microscopy – An appropriate tool for the electrical characterisation of LED heterostructures

Properties and deposition processes of a-C:H films from CH4/Ar dielectric barrier discharge plasmas

Thickness determination of thin and ultra-thin SiO2 films by C-AFM IV-spectroscopy

Deposition of a-C:H films with an ECWR-reactor at 27 MHz: plasma diagnostics and film properties

A triangular section magnetic solenoid filter for removal of macro- and nano-particles from pulsed graphite cathodic vacuum arc plasmas

W fuzz layers: very high resistance to sputtering under fusion-relevant He + irradiations

New trends in the application of Scanning Probe Techniques in Failure Analysis

Surface roughness, scratch resistance and tribological properties of hydrogenated amorphous carbon coatings prepared by low-pressure dielectric barrier discharge

Experimental observations of steady anodic vacuum arcs with thermionic cathodes

Use of Coated-Metal Particles in Rear Busbar Pastes to Reduce Silver Consumption

The effect of the surface layer of tetrahedral amorphous carbon films on their tribological and electron emission properties investigated by atomic force microscopy

Publisher's Note: "Degradation of polycrystalline HfO 2 -based gate dielectrics under nanoscale electrical stress" [Appl. Phys. Lett. 99, 103510 (2011)]

Publisher’s Note: “Degradation of polycrystalline HfO2-based gate dielectrics under nanoscale electrical stress” [Appl. Phys. Lett. 99, 103510 (2011)]

Degradation of polycrystalline HfO 2 -based gate dielectrics under nanoscale electrical stress

Reliability and gate conduction variability of HfO sub(2-based MOS devices: A combined nanoscale and device level study)

Conducting atomic force microscopy for nanoscale electron emissions from various diamond-like carbon films

Surface properties of silicon oxide films deposited using low-pressure dielectric barrier discharge

Reliability and gate conduction variability of HfO 2-based MOS devices: A combined nanoscale and device level study

Surface roughness, mechanical and tribological properties of ultrathin tetrahedral amorphous carbon coatings from atomic force measurements

Nanoscale electron field emissions from the bare, hydrogenated, and graphitelike-layer-covered tetrahedral amorphous carbon films

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