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TOF-SIMS for carbon hybridization state analysis

Carbon (New York), 2022-01, Vol.186, p.83-90

2022

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Sputtering of silicon by atomic and cluster bismuth ions: An influence of projectile nuclearity and specific kinetic energy on the sputter yield

Vacuum, 2021-06, Vol.188, p.110188, Article 110188

2021

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Quantitative depth profiling of Si1–xGex structures by time-of-flight secondary ion mass spectrometry and secondary neutral mass spectrometry

Thin solid films, 2016-05, Vol.607, p.25-31

2016

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Model for the emission of quasi-thermal atoms during sputtering of metals in the nonlinear collision cascade regime

Journal of experimental and theoretical physics, 2014-04, Vol.118 (4), p.560-568

2014

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Ion-Beam Sources Based on Solid Electrolytes for Aerospace Applications and Ion-Beam Technologies (Review)

Instruments and experimental techniques (New York), 2018-03, Vol.61 (2), p.159-172

2018

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Ionization probability of atoms sputtered under bombardment of metal surface with single and multiply charged ions

Technical Physics, 2022, Vol.92 (2), p.261

2022

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Sputtering with polyatomic ions: revisiting kinetic energy distributions of secondary ions

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2004-06, Vol.219, p.215-220

2004

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Caesium sputter ion source compatible with commercial SIMS instruments

Applied surface science, 2006-07, Vol.252 (19), p.7321-7325

2006

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Relative yields, mass distributions and energy spectra of cluster ions sputtered from niobium under keV atomic and polyatomic gold ion bombardment

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2000-04, Vol.164-165, p.809-819

2000

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Comparative study of kinetic energy spectra and mass distributions of Tan+ ions sputtered from tantalum by atomic and molecular ion bombardment

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 1998-03, Vol.136-138, p.773-778

1998

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Non-additivity of multiply charged ion emission from Si and Al produced by molecular projectiles

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2004-06, Vol.219, p.278-283

2004

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Temperature dependence of secondary ion emission from tantalum produced by atomic and polyatomic gold projectiles

International journal of mass spectrometry, 2004-09, Vol.237 (1), p.55-63

2004

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Non-additive sputtering of niobium and tantalum as neutral and charged clusters

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2003-04, Vol.203, p.164-171

2003

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Effect of the projectile parameters on the charge state formation process in solid sputtering

Applied surface science, 2003-01, Vol.203, p.126-129

2003

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Effect of the electronic subsystem excitation on the ionisation probability of atoms sputtered from metals by atomic and molecular projectiles

Surface science, 2001-08, Vol.488 (1), p.141-153

2001

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Nonadditive sputtering of silicon by keV energy molecular projectiles of heavy and light elements

International journal of mass spectrometry, 2001-09, Vol.209 (2), p.141-152

2001

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Effect of the relaxation of the electron subsystem excitation in metals on the ionization probability of sputtered atoms

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2003-04, Vol.203, p.172-177

2003

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Comparative study of kinetic energy spectra and mass distributions of Ta n+ ions sputtered from tantalum by atomic and molecular ion bombardment

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 1998-03, Vol.136, p.773-778

1998

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Features of non-additive sputtering for various “molecular projectile–solid” systems

Applied surface science, 2003-01, Vol.203, p.122-125

2003

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Nonlinear effects in cluster emission from solids induced by molecular ion impact

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 1997-09, Vol.129 (4), p.451-458

1997

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High non-additive sputtering of silicon as large positive cluster ions under polyatomic ion bombardment

Vacuum, 2000-03, Vol.56 (4), p.257-262

2000

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Ion-photon emission from metals implanted with ions of reactive elements

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 1995-03, Vol.95 (3), p.300-306

1995

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Application of the liquid-metal ion source in thin film deposition

Surface & coatings technology, 1992-11, Vol.53 (3), p.289-292

1992

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Excited atom emission under ion bombardment of metal surfaces covered by alkaline films

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 1993-05, Vol.78 (1), p.134-139

1993

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Excited-state formation model for metal-oxide sputtered molecules

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 1991-07, Vol.59, p.65-67

1991

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TOF-SIMS for carbon hybridization state analysis

Sputtering of silicon by atomic and cluster bismuth ions: An influence of projectile nuclearity and specific kinetic energy on the sputter yield

Quantitative depth profiling of Si1–xGex structures by time-of-flight secondary ion mass spectrometry and secondary neutral mass spectrometry

Model for the emission of quasi-thermal atoms during sputtering of metals in the nonlinear collision cascade regime

Ion-Beam Sources Based on Solid Electrolytes for Aerospace Applications and Ion-Beam Technologies (Review)

Ionization probability of atoms sputtered under bombardment of metal surface with single and multiply charged ions

Sputtering with polyatomic ions: revisiting kinetic energy distributions of secondary ions

Caesium sputter ion source compatible with commercial SIMS instruments

Relative yields, mass distributions and energy spectra of cluster ions sputtered from niobium under keV atomic and polyatomic gold ion bombardment

Comparative study of kinetic energy spectra and mass distributions of Tan+ ions sputtered from tantalum by atomic and molecular ion bombardment

Non-additivity of multiply charged ion emission from Si and Al produced by molecular projectiles

Temperature dependence of secondary ion emission from tantalum produced by atomic and polyatomic gold projectiles

Non-additive sputtering of niobium and tantalum as neutral and charged clusters

Effect of the projectile parameters on the charge state formation process in solid sputtering

Effect of the electronic subsystem excitation on the ionisation probability of atoms sputtered from metals by atomic and molecular projectiles

Nonadditive sputtering of silicon by keV energy molecular projectiles of heavy and light elements

Effect of the relaxation of the electron subsystem excitation in metals on the ionization probability of sputtered atoms

Comparative study of kinetic energy spectra and mass distributions of Ta n+ ions sputtered from tantalum by atomic and molecular ion bombardment

Features of non-additive sputtering for various “molecular projectile–solid” systems

Nonlinear effects in cluster emission from solids induced by molecular ion impact

High non-additive sputtering of silicon as large positive cluster ions under polyatomic ion bombardment

Ion-photon emission from metals implanted with ions of reactive elements

Application of the liquid-metal ion source in thin film deposition

Excited atom emission under ion bombardment of metal surfaces covered by alkaline films

Excited-state formation model for metal-oxide sputtered molecules

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