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Composition control of Hf1−xSixO2 films deposited on Si by chemical-vapor deposition using amide precursors

Applied physics letters, 2002-04, Vol.80 (13), p.2362-2364

2002

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Liquid-delivery MOCVD: chemical and process perspectives on ferro-electric thin film growth

Advanced materials for optics and electronics, 2000-05, Vol.10 (3-5), p.145-154

2000

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Liquid Delivery MOCVD of Niobium-Doped Pb(Zr,Ti)O3 Using a Novel Niobium Precursor

Chemistry of materials, 1999-02, Vol.11 (2), p.209-212

1999

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Chemical vapor deposition of copper from 1,5-cyclooctadiene copper(I) hexafluoroacetylacetonate

Applied physics letters, 1991-10, Vol.59 (18), p.2332-2334

1991

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Ferroelectric strontium bismuth tantalate thin films deposited by metalorganic chemical vapour deposition (MOCVD)

Journal of the European Ceramic Society, 1999-01, Vol.19 (6), p.1463-1466

1999

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Laser-induced chemical vapor deposition of metals for microelectronics technology

Thin solid films, 1992-10, Vol.218 (1), p.80-94

1992

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Use of Single-Source, Mixed-Metal Precursors for Chemical Vapor Deposition of Cu-Sn Alloys

Chemistry of materials, 1995-12, Vol.7 (12), p.2217-2219

1995

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Laser-induced chemical vapor deposition of aluminum

Applied physics letters, 1989-09, Vol.55 (12), p.1264-1266

1989

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The chemical vapor deposition of copper and copper alloys

Thin solid films, 1995-12, Vol.270 (1), p.480-482

1995

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Laser Chemical Vapor Deposition of Gold: The Effect of Organometallic Structure

Journal of the Electrochemical Society, 1987-10, Vol.134 (10), p.2616-2619

Baum, Thomas H.

1987

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Photochemical generation and deposition of copper from a gas phase precursor

Applied physics letters, 1985, Vol.46 (1), p.97-99

1985

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Kinetics of laser-induced chemical vapor deposition of gold

Journal of applied physics, 1987-07, Vol.62 (1), p.281-286

1987

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Aerosol flow reactor production of fine Y1Ba2Cu3O7 powder: fabrication of superconducting ceramics

Applied physics letters, 1988-05, Vol.52 (19), p.1622-1624

1988

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LCVD of copper:Deposition rates and deposit shapes

Applied Physics A Solids and Surfaces, 1986-05, Vol.40 (1), p.1-5

1986

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Surface processes leading to carbon contamination of photochemically deposited copper films

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-11, Vol.4 (6), p.2452-2458

1986

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New Precursors for Chemical Vapor Deposition of Iridium

Chemistry of materials, 1998-09, Vol.10 (9), p.2329-2331

1998

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Chemical Vapor Deposition of Gold

Journal of the Electrochemical Society, 1987-01, Vol.134 (1), p.266-266

1987

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Low field, room temperature magnetoresistance in (Lay-xMx)yMnO3-δ (M =Ca, Sr) thin-films deposited by liquid delivery CVD

Materials science & engineering. B, Solid-state materials for advanced technology, 1998-11, Vol.56 (2-3), p.168-172

1998

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Projection printing of gold micropatterns by photochemical decomposition

Applied physics letters, 1986-11, Vol.49 (18), p.1213-1215

1986

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Second harmonic generation from beta barium borate (β-BaB2O4) thin films grown by metalorganic chemical vapor deposition

Applied physics letters, 1997-02, Vol.70 (5), p.565-567

1997

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Liquid Delivery MOCVD of Niobium-Doped Pb(Zr,Ti)O 3 Using a Novel Niobium Precursor

Chemistry of materials, 1999-02, Vol.11 (2), p.209-212

1999

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Synthesis and Stabilization of Stibine for Low-Temperature Chemical Vapor Deposition of Carbon-Free Antimony Films

Chemistry of materials, 1999-03, Vol.11 (3), p.547-551

1999

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Chemical Additive Formulations for Particle Removal in SCCO2-Based Cleaning

Solid state phenomena, 2005-04, Vol.103-104, p.193-198

2005

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Chemical Vapor Deposited Copper from Alkyne Stabilized Copper (I) Hexafluoroacetylacetonate Complexes

Journal of the Electrochemical Society, 1993-01, Vol.140 (1), p.154-159

1993

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Chemical Routes to Improved Mechanical Properties of PECVD Low K Thin Films

MRS proceedings, 2004, Vol.812, Article F6.18

2004

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Composition control of Hf1−xSixO2 films deposited on Si by chemical-vapor deposition using amide precursors

Liquid-delivery MOCVD: chemical and process perspectives on ferro-electric thin film growth

Liquid Delivery MOCVD of Niobium-Doped Pb(Zr,Ti)O3 Using a Novel Niobium Precursor

Chemical vapor deposition of copper from 1,5-cyclooctadiene copper(I) hexafluoroacetylacetonate

Ferroelectric strontium bismuth tantalate thin films deposited by metalorganic chemical vapour deposition (MOCVD)

Laser-induced chemical vapor deposition of metals for microelectronics technology

Use of Single-Source, Mixed-Metal Precursors for Chemical Vapor Deposition of Cu-Sn Alloys

Laser-induced chemical vapor deposition of aluminum

The chemical vapor deposition of copper and copper alloys

Laser Chemical Vapor Deposition of Gold: The Effect of Organometallic Structure

Photochemical generation and deposition of copper from a gas phase precursor

Kinetics of laser-induced chemical vapor deposition of gold

Aerosol flow reactor production of fine Y1Ba2Cu3O7 powder: fabrication of superconducting ceramics

LCVD of copper:Deposition rates and deposit shapes

Surface processes leading to carbon contamination of photochemically deposited copper films

New Precursors for Chemical Vapor Deposition of Iridium

Chemical Vapor Deposition of Gold

Low field, room temperature magnetoresistance in (Lay-xMx)yMnO3-δ (M =Ca, Sr) thin-films deposited by liquid delivery CVD

Projection printing of gold micropatterns by photochemical decomposition

Second harmonic generation from beta barium borate (β-BaB2O4) thin films grown by metalorganic chemical vapor deposition

Liquid Delivery MOCVD of Niobium-Doped Pb(Zr,Ti)O 3 Using a Novel Niobium Precursor

Synthesis and Stabilization of Stibine for Low-Temperature Chemical Vapor Deposition of Carbon-Free Antimony Films

Chemical Additive Formulations for Particle Removal in SCCO2-Based Cleaning

Chemical Vapor Deposited Copper from Alkyne Stabilized Copper (I) Hexafluoroacetylacetonate Complexes

Chemical Routes to Improved Mechanical Properties of PECVD Low K Thin Films

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