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Lasing action at around 19 μm from an ultrafast laser inscribed Tm-doped glass waveguide

Optics letters, 2011-05, Vol.36 (9), p.1566

2011

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Chemical bonding modifications of tetrahedral amorphous carbon and nitrogenated tetrahedral amorphous carbon films induced by rapid thermal annealing

Thin solid films, 2005-06, Vol.482 (1), p.34-40

2005

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Ultrafast laser inscribed Yb:KGd(WO4)2 and Yb:KY(WO4)2 channel waveguide lasers

Optics express, 2009-12, Vol.17 (25), p.22417-22422

2009

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Study of magnetic properties of thin cobalt films deposited by chemical vapour deposition

Journal of materials science. Materials in electronics, 2005-07, Vol.16 (7), p.387-392

2005

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Investigation into the selectivity of CVD iron from Fe(CO) 5 precursor on various metal and dielectric patterned substrates

Surface & coatings technology, 2007-09, Vol.201 (22), p.8998-9002

2007

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Selective deposition of CVD iron on silicon dioxide and tungsten

Microelectronic engineering, 2006-11, Vol.83 (11), p.2229-2233

2006

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Effect of deposition temperature on the formation of CoSi2 through the rapid thermal annealing of CVD cobalt

Microelectronic engineering, 2004-10, Vol.76 (1-4), p.336-342

2004

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Low-temperature plasma-enhanced chemical vapor deposition of tungsten and tungsten nitride

Journal of materials science. Materials in electronics, 2003-05, Vol.14 (5-7), p.329-332

2003

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The deposition and characterisation of CVD tungsten silicide for applications in microelectronics

Vacuum, 2002, Vol.64 (3), p.227-232

2002

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A novel silicon Schottky diode for NLTL applications

IEEE transactions on electron devices, 2005-07, Vol.52 (7), p.1384-1391

2005

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Fabrication and characterisation of high resistivity SOI substrates for monolithic high energy physics detectors

Solid-state electronics, 2008-12, Vol.52 (12), p.1849-1853

2008

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Characterization of CVD tungsten deposited by silane reduction

Journal of materials science. Materials in electronics, 2001-06, Vol.12 (4-6), p.327-331

2001

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Tungsten silicide contacts to polycrystalline silicon and silicon–germanium alloys

Materials science & engineering. B, Solid-state materials for advanced technology, 2004-12, Vol.114, p.223-227

2004

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Effect of rapid thermal annealing on the structure and magnetic properties of chemical vapor deposition cobalt layers

Journal of applied physics, 2005-05, Vol.97 (10), p.10N307-10N307-3

2005

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Low-loss quantum-dot-based saturable absorber for efficient femtosecond pulse generation

Applied physics letters, 2007-12, Vol.91 (23), p.231111-231111-3

2007

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Microspectroscopy of ultrafast laser inscribed channel waveguides in Yb:tungstate crystals

Applied physics letters, 2011-04, Vol.98 (14), p.141108-141108-3

2011

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Characterization of Rapid Melt Growth (RMG) Process for High Quality Thin Film Germanium on Insulator

ECS transactions, 2012-04, Vol.45 (4), p.169-180

2012

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Continuous-wave and Q-switched operation of a compact, diode-pumped Yb^3+:KY(WO_4)_2 planar waveguide laser

Optics express, 2009-02, Vol.17 (3), p.1666

2009

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CMOS Compatible RF MEMS Switches with Serpentine Springs

ECS transactions, 2009, Vol.18 (1), p.9-14

2009

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(Invited) Germanium on Sapphire Technology

ECS transactions, 2010, Vol.33 (11), p.37-50

2010

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Low-temperature plasma-enhanced chemical vapor deposition of tungsten and tungsten nitride

Journal of materials science. Materials in electronics, 2003-05, Vol.10 (5/6/7), p.329-332.

2003

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Continuous-wave and Q-switched operation of a compact, diode-pumped Yb3+:KY(WO4)2 planar waveguide laser

Optics express, 2009-02, Vol.17 (3), p.1666-1670

2009

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Effect of deposition temperature on the formation of CoSi2through the rapid thermal annealing of CVD cobalt

Microelectronic engineering, 2004, Vol.76 (1-4), p.336-342

2004

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Deposition of tungsten by plasma enhanced chemical vapour deposition

Le Journal de Physique IV, 1999-09, Vol.9 (PR8), p.Pr8-827-Pr8-833

1999

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Deposition and characterisation of CVD tungsten

Bain, M F

2000

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Lasing action at around 19 μm from an ultrafast laser inscribed Tm-doped glass waveguide

Chemical bonding modifications of tetrahedral amorphous carbon and nitrogenated tetrahedral amorphous carbon films induced by rapid thermal annealing

Ultrafast laser inscribed Yb:KGd(WO4)2 and Yb:KY(WO4)2 channel waveguide lasers

Study of magnetic properties of thin cobalt films deposited by chemical vapour deposition

Investigation into the selectivity of CVD iron from Fe(CO) 5 precursor on various metal and dielectric patterned substrates

Selective deposition of CVD iron on silicon dioxide and tungsten

Effect of deposition temperature on the formation of CoSi2 through the rapid thermal annealing of CVD cobalt

Low-temperature plasma-enhanced chemical vapor deposition of tungsten and tungsten nitride

The deposition and characterisation of CVD tungsten silicide for applications in microelectronics

A novel silicon Schottky diode for NLTL applications

Fabrication and characterisation of high resistivity SOI substrates for monolithic high energy physics detectors

Characterization of CVD tungsten deposited by silane reduction

Tungsten silicide contacts to polycrystalline silicon and silicon–germanium alloys

Effect of rapid thermal annealing on the structure and magnetic properties of chemical vapor deposition cobalt layers

Low-loss quantum-dot-based saturable absorber for efficient femtosecond pulse generation

Microspectroscopy of ultrafast laser inscribed channel waveguides in Yb:tungstate crystals

Characterization of Rapid Melt Growth (RMG) Process for High Quality Thin Film Germanium on Insulator

Continuous-wave and Q-switched operation of a compact, diode-pumped Yb^3+:KY(WO_4)_2 planar waveguide laser

CMOS Compatible RF MEMS Switches with Serpentine Springs

(Invited) Germanium on Sapphire Technology

Low-temperature plasma-enhanced chemical vapor deposition of tungsten and tungsten nitride

Continuous-wave and Q-switched operation of a compact, diode-pumped Yb3+:KY(WO4)2 planar waveguide laser

Effect of deposition temperature on the formation of CoSi2through the rapid thermal annealing of CVD cobalt

Deposition of tungsten by plasma enhanced chemical vapour deposition

Deposition and characterisation of CVD tungsten

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