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Role of ionic strength in chemical mechanical polishing of silicon carbide using silica slurries

Colloids and surfaces. A, Physicochemical and engineering aspects, 2014-03, Vol.445, p.119-127

2014

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Withdrawn: A computerized doughty predictor framework for corona virus disease: Combined deep learning based approach

IET image processing, 2023-07, Vol.17 (9), p.2806-2806

2023

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Filtration of aqueous colloidal ceria slurries using fibrous filters – An experimental and simulation study

Separation and purification technology, 2017-04, Vol.176, p.231-242

2017

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Role of hydrogen bonding on the adsorption of several amino acids on SiO2 and Si3N4 and selective polishing of these materials using ceria dispersions

Colloids and surfaces. A, Physicochemical and engineering aspects, 2013-07, Vol.429, p.67-73

2013

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Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries

Applied surface science, 2013-10, Vol.283, p.986-992

2013

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Achievement of high planarization efficiency in CMP of copper at a reduced down pressure

Microelectronic engineering, 2009-03, Vol.86 (3), p.367-373

2009

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Role of polycation adsorption in poly-Si, SiO₂ and Si₃N₄ removal during chemical mechanical polishing: Effect of polishing pad surface chemistry

Colloids and surfaces. A, Physicochemical and engineering aspects, 2011-09, Vol.388 (1-3), p.21-28

2011

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Comparison of path visualizations and cognitive measures relative to travel technique in a virtual environment

IEEE transactions on visualization and computer graphics, 2005-11, Vol.11 (6), p.694-705

2005

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Novel α-amine-functionalized silica-based dispersions for selectively polishing polysilicon and Si(1 0 0) over silicon dioxide, silicon nitride or copper during chemical mechanical polishing

Colloids and surfaces. A, Physicochemical and engineering aspects, 2010-11, Vol.371 (1), p.131-136

2010

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Modification of the Preston equation for the chemical–mechanical polishing of copper

Thin solid films, 1998-12, Vol.335 (1), p.160-167

1998

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Comparison of dicarboxylic acids as complexing agents for abrasive-free chemical mechanical planarization of copper

Microelectronic engineering, 2007, Vol.84 (1), p.80-86

2007

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Personalized care for every single patient with congenital heart disease: The time is now

International journal of cardiology congenital heart disease, 2021-05, Vol.3, p.100088, Article 100088

2021

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USEFULNESS OF THERMO LABILE ALKALINE PHOSPHATASE AS A BIOMARKER IN DIAGNOSIS OF POST-MENOPAUSAL OSTEOPOROSIS

International journal of advanced research (Indore), 2022-06, Vol.10 (6), p.233-238

2022

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3D trajectories and diffusion of single ceria particles near a glass surface and their removal

Journal of materials research, 2020-09, p.1-10

2020

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Perspective—Recent Advances and Thoughts on Ceria Particle Applications in Chemical Mechanical Planarization

ECS journal of solid state science and technology, 2022-08, Vol.11 (8), p.84003

2022

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Effect of CMP Pad and Slurry to STI and ILD Polishing

ECS transactions, 2010, Vol.33 (10), p.23-29

2010

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3D trajectories and diffusion of single ceria particles near a glass surface and their removal

Journal of materials research, 2021-01, Vol.36 (1), p.258-267

2021

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Chemical-mechanical Polishing of Copper Using Molybdenum Dioxide Slurry

Journal of materials research, 2005-09, Vol.20 (9), p.2553-2561

2005

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Chemical effects in chemical mechanical planarization of TaN: investigation of surface reactions in a peroxide-based alkaline slurry using Fourier transform impedance spectroscopy

Materials letters, 2005-03, Vol.59 (6), p.690-693

2005

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Interaction, transformation and toxicity assessment of particles and additives used in the semiconducting industry

Chemosphere (Oxford), 2018-02, Vol.192, p.178-185

2018

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Colloid aspects of chemical–mechanical planarization

Journal of colloid and interface science, 2008-04, Vol.320 (1), p.219-237

2008

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Lauric acid and myristic acid prevent testosterone induced prostatic hyperplasia in rats

European journal of pharmacology, 2010-01, Vol.626 (2), p.262-265

2010

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STATUS OF SERUM VITAMIN D IN PRE MENOPAUSAL INDIAN WOMEN

International journal of advanced research (Indore), 2021-04, Vol.9 (4), p.255-260

2021

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Selective Polishing of Amorphous Silicon Carbonitride (a-SiCN) Films Over Silicon Dioxide and Silicon Nitride Films for Hardmask Applications

ECS journal of solid state science and technology, 2020-03, Vol.9 (3), p.34004

2020

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COMPARISON OF INFLAMMATORY MARKERS BETWEEN COVID VACCINATED POPULATION AND NATURALLY INFECTED POPULATION

International journal of advanced research (Indore), 2022-11, Vol.10 (11), p.356-364

2022

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Role of ionic strength in chemical mechanical polishing of silicon carbide using silica slurries

Withdrawn: A computerized doughty predictor framework for corona virus disease: Combined deep learning based approach

Filtration of aqueous colloidal ceria slurries using fibrous filters – An experimental and simulation study

Role of hydrogen bonding on the adsorption of several amino acids on SiO2 and Si3N4 and selective polishing of these materials using ceria dispersions

Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries

Achievement of high planarization efficiency in CMP of copper at a reduced down pressure

Role of polycation adsorption in poly-Si, SiO₂ and Si₃N₄ removal during chemical mechanical polishing: Effect of polishing pad surface chemistry

Comparison of path visualizations and cognitive measures relative to travel technique in a virtual environment

Novel α-amine-functionalized silica-based dispersions for selectively polishing polysilicon and Si(1 0 0) over silicon dioxide, silicon nitride or copper during chemical mechanical polishing

Modification of the Preston equation for the chemical–mechanical polishing of copper

Comparison of dicarboxylic acids as complexing agents for abrasive-free chemical mechanical planarization of copper

Personalized care for every single patient with congenital heart disease: The time is now

USEFULNESS OF THERMO LABILE ALKALINE PHOSPHATASE AS A BIOMARKER IN DIAGNOSIS OF POST-MENOPAUSAL OSTEOPOROSIS

3D trajectories and diffusion of single ceria particles near a glass surface and their removal

Perspective—Recent Advances and Thoughts on Ceria Particle Applications in Chemical Mechanical Planarization

Effect of CMP Pad and Slurry to STI and ILD Polishing

3D trajectories and diffusion of single ceria particles near a glass surface and their removal

Chemical-mechanical Polishing of Copper Using Molybdenum Dioxide Slurry

Chemical effects in chemical mechanical planarization of TaN: investigation of surface reactions in a peroxide-based alkaline slurry using Fourier transform impedance spectroscopy

Interaction, transformation and toxicity assessment of particles and additives used in the semiconducting industry

Colloid aspects of chemical–mechanical planarization

Lauric acid and myristic acid prevent testosterone induced prostatic hyperplasia in rats

STATUS OF SERUM VITAMIN D IN PRE MENOPAUSAL INDIAN WOMEN

Selective Polishing of Amorphous Silicon Carbonitride (a-SiCN) Films Over Silicon Dioxide and Silicon Nitride Films for Hardmask Applications

COMPARISON OF INFLAMMATORY MARKERS BETWEEN COVID VACCINATED POPULATION AND NATURALLY INFECTED POPULATION

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