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Mirau-based line-field confocal optical coherence tomography

Optics express, 2020-03, Vol.28 (6), p.7918-7927

2020

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Structural properties of hydrogenated microcrystalline silicon–carbon alloys deposited by Radio Frequency Plasma Enhanced Chemical Vapor Deposition: Effect of microcrystalline silicon seed layer and methane flow rate

Thin solid films, 2014-01, Vol.550, p.312-318

2014

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Numerical modeling of capacitively coupled hydrogen plasmas: Effects of frequency and pressure

Journal of applied physics, 2003-03, Vol.93 (6), p.3198-3206

2003

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Raman spectra of amorphous isotope-enriched 74Ge with low-strained Ge nanocrystals

Thin solid films, 2014-02, Vol.552, p.46-49

2014

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Stable microcrystalline silicon thin-film transistors produced by the layer-by-layer technique

Journal of applied physics, 1999-12, Vol.86 (12), p.7079-7082

1999

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Advances in the deposition of microcrystalline silicon at high rate by distributed electron cyclotron resonance

Thin solid films, 2008-08, Vol.516 (20), p.6834-6838

2008

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Plasma treatment of polycarbonate for improved adhesion

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2002-01, Vol.20 (1), p.245-250

2002

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Deposition of dielectrics using a matrix distributed electron cyclotron resonance plasma enhanced chemical vapor deposition system

Thin solid films, 2007-07, Vol.515 (19), p.7594-7597

2007

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Simulation and Test Measurements on the Neutron Reflectometer and Small-Angle Instrument “Gorizont” on the IN-06 Pulsed Source

Surface investigation, x-ray, synchrotron and neutron techniques, 2021-07, Vol.15 (4), p.645-651

2021

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Effect of an artificial cavity on the microlayer and contact line dynamics during bubble growth in nucleate boiling

Journal of physics. Conference series, 2024-05, Vol.2766 (1), p.12121

2024

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Distributed electron cyclotron resonance plasma: A technology for large area deposition of device-quality a-Si:H at very high rate

Thin solid films, 2008-08, Vol.516 (20), p.6853-6857

2008

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Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by electron cyclotron resonance

Thin solid films, 2007-07, Vol.515 (19), p.7650-7653

2007

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The study of the oxidation of thin Ti films by neutron reflectometry

Journal of physics. Conference series, 2012-01, Vol.340 (1), p.12086-4

2012

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Observation of photovoltaic effect within locally doped silicon nanojunctions using conductive probe AFM

Nano energy, 2020-10, Vol.76, p.105072, Article 105072

2020

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Multilayer optical filters control by multi-channel kinetic ellipsometry

Physica status solidi. C, 2008-05, Vol.5 (5), p.1290-1294

2008

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A new type of wide-angle supermirror analyzer of neutron polarization

Journal of physics. Conference series, 2014-01, Vol.528 (1), p.12021-7

2014

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Simple method of gas flow ratio optimization in high rate deposition of SiO2 by electron cyclotron resonance plasma enhanced chemical vapor deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2004-01, Vol.22 (1), p.36-38

2004

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An interfacial study of a hydrogenated carbon interlayer for adhesion enhancement of plasma deposited silica thin films on polycarbonate

Journal of adhesion science and technology, 2002-01, Vol.16 (4), p.395-407

2002

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Plasma enhanced chemical vapour deposition of SiOxNy in an integrated distributed electron cyclotron resonance reactor

Applied surface science, 1999-04, Vol.142 (1-4), p.447-450

1999

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Fenghuang: High-intensity multi-section neutron powder diffractometer at CMRR

Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 2019-01, Vol.915, p.31-35

2019

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Ellipsometric method for real time control of thin film deposition on imperfect substrates

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2002-05, Vol.20 (3), p.702-706

2002

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Deposition of microcrystalline silicon in an integrated distributed electron cyclotron resonance PECVD reactor

Thin solid films, 1999-01, Vol.337 (1), p.37-40

1999

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Real time control of plasma deposited optical filters by multiwavelength ellipsometry

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2000-07, Vol.18 (4), p.1303-1307

2000

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Real-time control by multiwavelength ellipsometry of plasma-deposited multilayers on glass by use of an incoherent-reflection model

Applied Optics, 1997-09, Vol.36 (25), p.6352-6359

1997

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Raman spectra of amorphous isotope-enriched 74Ge with low-strained Ge nanocrystals

Thin solid films, 2014, Vol.552, p.46-49

2014

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Mirau-based line-field confocal optical coherence tomography

Structural properties of hydrogenated microcrystalline silicon–carbon alloys deposited by Radio Frequency Plasma Enhanced Chemical Vapor Deposition: Effect of microcrystalline silicon seed layer and methane flow rate

Numerical modeling of capacitively coupled hydrogen plasmas: Effects of frequency and pressure

Raman spectra of amorphous isotope-enriched 74Ge with low-strained Ge nanocrystals

Stable microcrystalline silicon thin-film transistors produced by the layer-by-layer technique

Advances in the deposition of microcrystalline silicon at high rate by distributed electron cyclotron resonance

Plasma treatment of polycarbonate for improved adhesion

Deposition of dielectrics using a matrix distributed electron cyclotron resonance plasma enhanced chemical vapor deposition system

Simulation and Test Measurements on the Neutron Reflectometer and Small-Angle Instrument “Gorizont” on the IN-06 Pulsed Source

Effect of an artificial cavity on the microlayer and contact line dynamics during bubble growth in nucleate boiling

Distributed electron cyclotron resonance plasma: A technology for large area deposition of device-quality a-Si:H at very high rate

Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by electron cyclotron resonance

The study of the oxidation of thin Ti films by neutron reflectometry

Observation of photovoltaic effect within locally doped silicon nanojunctions using conductive probe AFM

Multilayer optical filters control by multi-channel kinetic ellipsometry

A new type of wide-angle supermirror analyzer of neutron polarization

Simple method of gas flow ratio optimization in high rate deposition of SiO2 by electron cyclotron resonance plasma enhanced chemical vapor deposition

An interfacial study of a hydrogenated carbon interlayer for adhesion enhancement of plasma deposited silica thin films on polycarbonate

Plasma enhanced chemical vapour deposition of SiOxNy in an integrated distributed electron cyclotron resonance reactor

Fenghuang: High-intensity multi-section neutron powder diffractometer at CMRR

Ellipsometric method for real time control of thin film deposition on imperfect substrates

Deposition of microcrystalline silicon in an integrated distributed electron cyclotron resonance PECVD reactor

Real time control of plasma deposited optical filters by multiwavelength ellipsometry

Real-time control by multiwavelength ellipsometry of plasma-deposited multilayers on glass by use of an incoherent-reflection model

Raman spectra of amorphous isotope-enriched 74Ge with low-strained Ge nanocrystals

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