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Superconducting properties of very high quality NbN thin films grown by high temperature chemical vapor deposition

Superconductor science & technology, 2016-10, Vol.29 (10), p.105011

2016

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Superconducting properties of NbTiN thin films deposited by high-temperature chemical vapor deposition

Physical review. B, 2018-04, Vol.97 (14), Article 144518

2018

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Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition

Surface & coatings technology, 2018-08, Vol.347, p.181-190

2018

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Coupling powder bed additive manufacturing and vapor phase deposition methods for elaboration of coated 3D Ti-6Al-4V architectures with enhanced surface properties

Surface & coatings technology, 2021-06, Vol.415, p.127130, Article 127130

2021

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Preferential orientation of fluorine-doped SnO2 thin films: The effects of growth temperature

Acta materialia, 2013-01, Vol.61 (1), p.22-31

2013

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Prediction of dislocation density in AlN or GaN films deposited on (0001) sapphire

Journal of materials science, 2020-08, Vol.55 (22), p.9152-9162

2020

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Evolution of Crystal Structure During the Initial Stages of ZnO Atomic Layer Deposition

Chemistry of materials, 2016-01, Vol.28 (2), p.592-600

2016

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Reactive chemical vapor deposition of heteroepitaxial Ti1−xAlxN films

CrystEngComm, 2018, Vol.20 (12), p.1711-1715

2018

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Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy

Thin solid films, 2014-12, Vol.573 (12), p.140-147

2014

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HVPE of aluminum nitride, film evaluation and multiscale modeling of the growth process

Journal of crystal growth, 2017-06, Vol.468, p.235-240

2017

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Epitaxial growth of AlN on c-plane sapphire by High Temperature Hydride Vapor Phase Epitaxy: Influence of the gas phase N/Al ratio and low temperature protective layer

Surface & coatings technology, 2013-12, Vol.237, p.118-125

2013

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Analysis of the iodine gas phase produced by interaction of CsI and MoO3 vapours in flowing steam

Nuclear engineering and design, 2013-10, Vol.263, p.462-472

2013

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High temperature chemical vapor deposition of aluminum nitride, growth and evaluation

Surface & coatings technology, 2013-09, Vol.230, p.111-118

2013

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Epitaxial and polycrystalline growth of AlN by high temperature CVD: Experimental results and simulation

Surface & coatings technology, 2010-11, Vol.205 (5), p.1294-1301

2010

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Thermodynamic and experimental investigations on the growth of thick aluminum nitride layers by high temperature CVD

Journal of crystal growth, 2009-06, Vol.311 (13), p.3371-3379

2009

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Atomic layer deposition of tantalum oxide thin films for their use as diffusion barriers in microelectronic devices

Microelectronic engineering, 2010-03, Vol.87 (3), p.373-378

2010

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Elaboration of Ta2O5 Thin Films Using Electrostatic Spray Deposition for Microelectronic Applications

Journal of physical chemistry. C, 2007-04, Vol.111 (15), p.5708-5714

2007

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Experimental study of uranium carbide pyrophoricity

Powder technology, 2011-03, Vol.208 (2), p.312-317

2011

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Experimental kinetic study of oxidation of uranium monocarbide powders under controlled oxygen partial pressures below 230°C

Journal of nuclear materials, 2013-01, Vol.432 (1-3), p.505-519

2013

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XPS studies of the ALD-growth of TaN diffusion barriers: Impact of the dielectric surface chemistry on the growth mechanism

Microelectronic engineering, 2008-10, Vol.85 (10), p.2068-2070

2008

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Thermodynamic and experimental study of UC powders ignition

Journal of nuclear materials, 2009-09, Vol.393 (2), p.333-342

2009

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Experimental thermodynamics for the evaluation of ALD growth processes

Surface & coatings technology, 2009-12, Vol.204 (6), p.882-886

2009

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Gaseous Phase Study of the Zr-Organometallic ALD Precursor TEMAZ by Mass Spectrometry

Journal of the Electrochemical Society, 2009, Vol.156 (1), p.H71

2009

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Investigation on AlN epitaxial growth and related etching phenomenon at high temperature using high temperature chemical vapor deposition process

Journal of crystal growth, 2011-11, Vol.335 (1), p.17-24

2011

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Chemical vapor deposition of thin films and coatings: Evaluation and process modeling

Surface & coatings technology, 2007-12, Vol.202 (4), p.790-797

2007

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Superconducting properties of very high quality NbN thin films grown by high temperature chemical vapor deposition

Superconducting properties of NbTiN thin films deposited by high-temperature chemical vapor deposition

Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition

Coupling powder bed additive manufacturing and vapor phase deposition methods for elaboration of coated 3D Ti-6Al-4V architectures with enhanced surface properties

Preferential orientation of fluorine-doped SnO2 thin films: The effects of growth temperature

Prediction of dislocation density in AlN or GaN films deposited on (0001) sapphire

Evolution of Crystal Structure During the Initial Stages of ZnO Atomic Layer Deposition

Reactive chemical vapor deposition of heteroepitaxial Ti1−xAlxN films

Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy

HVPE of aluminum nitride, film evaluation and multiscale modeling of the growth process

Epitaxial growth of AlN on c-plane sapphire by High Temperature Hydride Vapor Phase Epitaxy: Influence of the gas phase N/Al ratio and low temperature protective layer

Analysis of the iodine gas phase produced by interaction of CsI and MoO3 vapours in flowing steam

High temperature chemical vapor deposition of aluminum nitride, growth and evaluation

Epitaxial and polycrystalline growth of AlN by high temperature CVD: Experimental results and simulation

Thermodynamic and experimental investigations on the growth of thick aluminum nitride layers by high temperature CVD

Atomic layer deposition of tantalum oxide thin films for their use as diffusion barriers in microelectronic devices

Elaboration of Ta2O5 Thin Films Using Electrostatic Spray Deposition for Microelectronic Applications

Experimental study of uranium carbide pyrophoricity

Experimental kinetic study of oxidation of uranium monocarbide powders under controlled oxygen partial pressures below 230°C

XPS studies of the ALD-growth of TaN diffusion barriers: Impact of the dielectric surface chemistry on the growth mechanism

Thermodynamic and experimental study of UC powders ignition

Experimental thermodynamics for the evaluation of ALD growth processes

Gaseous Phase Study of the Zr-Organometallic ALD Precursor TEMAZ by Mass Spectrometry

Investigation on AlN epitaxial growth and related etching phenomenon at high temperature using high temperature chemical vapor deposition process

Chemical vapor deposition of thin films and coatings: Evaluation and process modeling

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