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Superficial modification in recycled PET by plasma etching for food packaging

Journal of applied polymer science, 2010-03, Vol.115 (5), p.2728-2733

2010

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Modification of Plasma-Polymerized Organosiloxane Films by Irradiation with He+, Ne+, Ar+, and Kr+ Ions

Chemistry of materials, 2005-11, Vol.17 (23), p.5789-5797

2005

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Magnetic and structural studies on nanostructured Gd/Cr multilayer films

Thin solid films, 2013-10, Vol.545, p.496-502

2013

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Gas and Pressure Sensors Based on Multi-Wall Carbon Nanotubes: Study of Sensing Mechanisms

Sensor letters, 2010-06, Vol.8 (3), p.488-492

2010

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Magnetic properties of metastable Gd–Cr alloys

Journal of magnetism and magnetic materials, 2011-08, Vol.323 (15), p.2005-2011

2011

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Infrared and Raman Studies on Films of Organosiloxane Networks Produced by PECVD

Macromolecules, 2004-01, Vol.37 (2), p.459-466

2004

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Infrared Studies on Films of Carbosilazane and Siloxazane Networks

Chemistry of materials, 2005-09, Vol.17 (18), p.4685-4692

2005

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Low-temperature gas and pressure sensor based on multi-wall carbon nanotubes decorated with Ti nanoparticles

Chemical physics letters, 2009, Vol.482 (4), p.302-306

2009

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Plasma polymerized hexamethyldisiloxane: discharge and film studies

Vacuum, 1996-02, Vol.47 (2), p.187-192

1996

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PECVD of amorphous hydrogenated oxygenated nitrogenated carbon films

Journal of polymer science. Part B, Polymer physics, 1998-08, Vol.36 (11), p.1881-1888

1998

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Thin film deposition from plasmas of tetramethylsilane-helium-argon mixtures with oxygen and with nitrogen

Journal of polymer science. Part B, Polymer physics, 1998-08, Vol.36 (11), p.1873-1879

1998

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Electron emission enhanced chemical vapor deposition (EEECVD) for the fabrication of diverse silicon-containing films

Thin solid films, 2001-11, Vol.398, p.591-596

2001

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Gas-phase and plasma-surface reactions in radiofrequency discharges of C sub(2 )H sub(2)-N sub(2)-noble gas mixtures

Thin solid films, 2001-11, Vol.398-399, p.156-162

2001

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Electronic structure at InP organic polymer layer interfaces

Applied physics letters, 1997-06, Vol.70 (22), p.3011-3013

1997

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HMDSO plasma polymerization and thin film optical properties

Thin solid films, 1995-12, Vol.270 (1), p.109-113

1995

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Mechanisms of polymer film deposition from r.f. discharges of acetylene, nitrogen and helium mixtures

Thin solid films, 1995-04, Vol.259 (2), p.139-145

1995

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Relationships between the plasma environment and the composition and optical properties of plasma-polymerized thin films produced in rf discharges of C2H2-SF6 mixtures

Journal of applied physics, 1992, Vol.71 (1), p.448-455

1992

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Electron emission enhanced chemical vapor deposition (EEECVD) for the fabrication of diverse silicon-containing films

Thin solid films, 1993-11, Vol.398-399, p.591-596

1993

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Amorphous hydrogenated fluorinated carbon films produced by PECVD

Surface & coatings technology, 1996-12, Vol.86 (1-3), p.443-448

1996

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Dynamic actinometric optical emission spectroscopy for the elucidation of plasma processes in the production of fluorinated amorphous hydrogenated carbon films from glow discharges

Thin solid films, 1996-05, Vol.277 (1), p.115-120

1996

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Electron emission enhanced chemical vapor deposition (EEECVD) for the fabrication of diverse silicon-containing films

Thin solid films, 2001, Vol.398-99 (1), p.591-596

2001

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Fluorine-containing amorphous hydrogenated carbon films

Thin solid films, 1996, Vol.281-82 (1-2), p.294-297

1996

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Developments in hot-filament metal oxide deposition (HFMOD)

Thin solid films, 2008-01, Vol.516 (5), p.789-793

2008

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Characterization of Si:O:C:H films fabricated using electron emission enhanced chemical vapour deposition

Thin solid films, 2008-01, Vol.516 (5), p.803-806

2008

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XPS Investigation of Plasma-Deposited Polysiloxane Films Irradiated with Helium Ions

Plasma processes and polymers, 2007-05, Vol.4 (4), p.482-488

2007

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Superficial modification in recycled PET by plasma etching for food packaging

Modification of Plasma-Polymerized Organosiloxane Films by Irradiation with He+, Ne+, Ar+, and Kr+ Ions

Magnetic and structural studies on nanostructured Gd/Cr multilayer films

Gas and Pressure Sensors Based on Multi-Wall Carbon Nanotubes: Study of Sensing Mechanisms

Magnetic properties of metastable Gd–Cr alloys

Infrared and Raman Studies on Films of Organosiloxane Networks Produced by PECVD

Infrared Studies on Films of Carbosilazane and Siloxazane Networks

Low-temperature gas and pressure sensor based on multi-wall carbon nanotubes decorated with Ti nanoparticles

Plasma polymerized hexamethyldisiloxane: discharge and film studies

PECVD of amorphous hydrogenated oxygenated nitrogenated carbon films

Thin film deposition from plasmas of tetramethylsilane-helium-argon mixtures with oxygen and with nitrogen

Electron emission enhanced chemical vapor deposition (EEECVD) for the fabrication of diverse silicon-containing films

Gas-phase and plasma-surface reactions in radiofrequency discharges of C sub(2 )H sub(2)-N sub(2)-noble gas mixtures

Electronic structure at InP organic polymer layer interfaces

HMDSO plasma polymerization and thin film optical properties

Mechanisms of polymer film deposition from r.f. discharges of acetylene, nitrogen and helium mixtures

Relationships between the plasma environment and the composition and optical properties of plasma-polymerized thin films produced in rf discharges of C2H2-SF6 mixtures

Electron emission enhanced chemical vapor deposition (EEECVD) for the fabrication of diverse silicon-containing films

Amorphous hydrogenated fluorinated carbon films produced by PECVD

Dynamic actinometric optical emission spectroscopy for the elucidation of plasma processes in the production of fluorinated amorphous hydrogenated carbon films from glow discharges

Electron emission enhanced chemical vapor deposition (EEECVD) for the fabrication of diverse silicon-containing films

Fluorine-containing amorphous hydrogenated carbon films

Developments in hot-filament metal oxide deposition (HFMOD)

Characterization of Si:O:C:H films fabricated using electron emission enhanced chemical vapour deposition

XPS Investigation of Plasma-Deposited Polysiloxane Films Irradiated with Helium Ions

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