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Mechanical stresses in silicon carbonitride films obtained by PECVD from hexamethyldisilazane

Applied surface science, 2013-01, Vol.265, p.385-388

2013

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Optical study of wedge-shaped films Part I Modeling

Journal of optical technology, 2016-07, Vol.83 (7), p.441

2016

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Deposition of titanium dioxide from TTIP by plasma enhanced and remote plasma enhanced chemical vapor deposition

Surface & coatings technology, 2008-05, Vol.202 (17), p.4076-4085

2008

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DECREASED REFRACTIVE INDEX OF NANOCRYSTALLINE ZIRCONIUM OXIDE THIN FILMS

International journal of modern physics. B, Condensed matter physics, statistical physics, applied physics, 2012-01, Vol.26 (2), p.1250012

2012

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Synthesis of silicon carbonitride dielectric films with improved optical and mechanical properties from tetramethyldisilazane

Glass physics and chemistry, 2013, Vol.39 (1), p.77-88

2013

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Accurate Ellipsometric Measurement of Refractive Index and Thickness of Ultrathin Oxide Film

Journal of the Electrochemical Society, 2006, Vol.153 (12), p.F277

2006

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Tris(diethylamino)silane—A new precursor compound for obtaining layers of silicon carbonitride

Glass physics and chemistry, 2012-02, Vol.38 (1), p.15-26

2012

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Searching for the starting approximation when solving inverse problems in ellipsometry and spectrophotometry

Journal of optical technology, 2011-06, Vol.78 (6), p.350

2011

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Plasma enhanced chemical deposition of nanocrystalline silicon carbonitride films from trimethyl(phenylamino)silane

Glass physics and chemistry, 2011-06, Vol.37 (3), p.316-321

2011

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Mechanical properties and density of BCxNy films grown by low-pressure chemical vapor deposition from triethylamine borane

Inorganic materials, 2011-03, Vol.47 (3), p.262-266

2011

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Phase formation in the Li2MoO4-A2MoO4-NiMoO4 (A = K, Rb, Cs) systems, the crystal structure of Cs2Ni2(MoO4)3, and color characteristics of alkali-metal nickel molybdates

Russian journal of inorganic chemistry, 2011-08, Vol.56 (8), p.1216-1221

2011

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Determination of optical properties variation of silicon and glass surfaces after mechanical and plasma treatments by monochromatic ellipsometry

Optik (Stuttgart), 1998, Vol.109 (4), p.145-149

AYUPOV, B. M

1998

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Chemical composition of boron carbonitride films grown by plasma-enhanced chemical vapor deposition from trimethylamineborane

Inorganic materials, 2003-04, Vol.39 (4), p.366-373

2003

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Optical anisotropy of phthalocyanine films

Optics and spectroscopy, 2001-03, Vol.90 (3), p.446-451

2001

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Na2MoO4-CaMoO4-Ce2/3MoO4 scheelite-like solid solutions

Inorganic materials, 2009-04, Vol.45 (4), p.432-435

2009

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Properties of BCxNy films grown by plasma-enhanced chemical vapor deposition from N-trimethylborazine-nitrogen mixtures

Inorganic materials, 2010-05, Vol.46 (5), p.487-494

2010

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Mechanical stresses in silicon carbonitride films obtained by PECVD from hexamethyldisilazane

Applied surface science, 2013, Vol.265, p.385-388

2013

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Detecting a disturbed layer on a silicon surface by means of monochromatic null ellipsometry

Journal of optical technology, 2006-03, Vol.73 (3), p.212

2006

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Optical properties of textured V2O5/Si thin films deposited by reactive magnetron sputtering

Optical materials, 2008-03, Vol.30 (7), p.1145-1148

2008

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Color and chemical heterogeneities of γ-[Na]-Ce2S3 solid solutions

Journal of alloys and compounds, 1998-03, Vol.268 (1-2), p.72-77

1998

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Optical and mechanical properties of films obtained by plasma decomposition of hexamethyldisilazane

Russian Journal of Physical Chemistry A, 2012-11, Vol.86 (11), p.1716-1720

2012

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Physical Properties of the SiCxNyHz Films

Key engineering materials, 2012, Vol.508, p.283-286

2012

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Optical characteristics of nickel and boron carbonitride films in Si(100)/Ni/BCxNy structures

Optics and spectroscopy, 2012-02, Vol.112 (2), p.201-205

2012

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Optical characteristics of nickel and boron carbonitride films in Si(100)/Ni/BC x N y structures

Optics and spectroscopy, 2012-02, Vol.112 (2), p.201-205

2012

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Optical properties of multilayer structures

Optics and spectroscopy, 2009, Vol.106 (1), p.139-141

2009

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Mechanical stresses in silicon carbonitride films obtained by PECVD from hexamethyldisilazane

Optical study of wedge-shaped films Part I Modeling

Deposition of titanium dioxide from TTIP by plasma enhanced and remote plasma enhanced chemical vapor deposition

DECREASED REFRACTIVE INDEX OF NANOCRYSTALLINE ZIRCONIUM OXIDE THIN FILMS

Synthesis of silicon carbonitride dielectric films with improved optical and mechanical properties from tetramethyldisilazane

Accurate Ellipsometric Measurement of Refractive Index and Thickness of Ultrathin Oxide Film

Tris(diethylamino)silane—A new precursor compound for obtaining layers of silicon carbonitride

Searching for the starting approximation when solving inverse problems in ellipsometry and spectrophotometry

Plasma enhanced chemical deposition of nanocrystalline silicon carbonitride films from trimethyl(phenylamino)silane

Mechanical properties and density of BCxNy films grown by low-pressure chemical vapor deposition from triethylamine borane

Phase formation in the Li2MoO4-A2MoO4-NiMoO4 (A = K, Rb, Cs) systems, the crystal structure of Cs2Ni2(MoO4)3, and color characteristics of alkali-metal nickel molybdates

Determination of optical properties variation of silicon and glass surfaces after mechanical and plasma treatments by monochromatic ellipsometry

Chemical composition of boron carbonitride films grown by plasma-enhanced chemical vapor deposition from trimethylamineborane

Optical anisotropy of phthalocyanine films

Na2MoO4-CaMoO4-Ce2/3MoO4 scheelite-like solid solutions

Properties of BCxNy films grown by plasma-enhanced chemical vapor deposition from N-trimethylborazine-nitrogen mixtures

Mechanical stresses in silicon carbonitride films obtained by PECVD from hexamethyldisilazane

Detecting a disturbed layer on a silicon surface by means of monochromatic null ellipsometry

Optical properties of textured V2O5/Si thin films deposited by reactive magnetron sputtering

Color and chemical heterogeneities of γ-[Na]-Ce2S3 solid solutions

Optical and mechanical properties of films obtained by plasma decomposition of hexamethyldisilazane

Physical Properties of the SiCxNyHz Films

Optical characteristics of nickel and boron carbonitride films in Si(100)/Ni/BCxNy structures

Optical characteristics of nickel and boron carbonitride films in Si(100)/Ni/BC x N y structures

Optical properties of multilayer structures

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