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Shaping of Au nanoparticles embedded in various layered structures by swift heavy ion beam irradiation

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2016-10, Vol.384, p.86-92

2016

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The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD

Thin solid films, 2009-04, Vol.517 (12), p.3499-3502

2009

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Electrochemical Growth of Micrometer-Thick Oxide on SiC in Acidic Fluoride Solution

Chemistry of materials, 2009-07, Vol.21 (14), p.3297-3305

2009

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Deuterium retention and removal in liquid lithium determined by in situ NRA in Magnum-PSI

Nuclear fusion, 2022-07, Vol.62 (7), p.76010

2022

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Deuterium retention in co-deposition with lithium in Magnum-PSI: experimental analysis and comparison with SOLPS-ITER

Nuclear fusion, 2024-07, Vol.64 (7), p.76019

2024

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Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer on multicrystalline silicon solar cells

Thin solid films, 2006-04, Vol.501 (1), p.51-54

2006

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Influence of the high-temperature “firing” step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003-09, Vol.21 (5), p.2123-2132

2003

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Swift heavy ion induced modifications of silicon (sub) oxide nitride layer structures

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2007-03, Vol.256 (1), p.300-304

2007

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Electronic sputtering of thin SiO2 films by MeV heavy ions

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2003-04, Vol.203 (Complete), p.151-157

2003

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Nano-scale effects of swift heavy ion irradiation in SiOx layers and multilayers

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2007-05, Vol.258 (1), p.199-204

2007

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On the argon and oxygen incorporation into SiO x through ion implantation during reactive plasma magnetron sputter deposition

Applied surface science, 2008-12, Vol.255 (5), p.3079-3084

2008

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Electronic sputtering of silicon suboxide films by swift heavy ions

Physical review letters, 2005-06, Vol.94 (24), p.245504.1-245504.4, Article 245504

2005

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On the argon and oxygen incorporation into SiOx through ion implantation during reactive plasma magnetron sputter deposition

Applied surface science, 2008-12, Vol.255 (5), p.3079-3084

2008

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On the deposition process of silicon suboxides by a RF magnetron reactive sputtering in Ar–O2 mixtures: theoretical and experimental approach

Surface & coatings technology, 2004-01, Vol.177-178, p.215-221

2004

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On-line characterisation of radiofrequency magnetron sputter deposition of SiO x using elastic recoil detection

Thin solid films, 2006, Vol.494 (1), p.13-17

2006

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Experimental characterization of the deposition of silicon suboxide films in a radiofrequency magnetron reactive sputtering system

Surface & coatings technology, 2004-11, Vol.188, p.399-403

2004

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On the deposition process of silicon suboxides by a RF magnetron reactive sputtering in Ar–O 2 mixtures: theoretical and experimental approach

Surface & coatings technology, 2004-01, Vol.177, p.215-221

2004

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Argon plasma modelling in a RF magnetron sputtering system

Surface & coatings technology, 2004-11, Vol.188, p.392-398

2004

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On-line characterisation of radiofrequency magnetron sputter deposition of SiOx using elastic recoil detection

Thin solid films, 2006-01, Vol.494 (1-2), p.13-17

2006

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Improving the control of the electroless plating synthesis of Pd/Ag membranes for hydrogen separation using Rutherford backscattering

Journal of membrane science, 2005-06, Vol.254 (1), p.241-248

2005

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Desorption of O2 from SiO2 films during irradiation of SiO2 with MeV/a.m.u. heavy ions

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2004-06, Vol.219-220, p.312-316

2004

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Thickness determination of thin (∼20 nm) microcrystalline silicon layers

Solar energy materials and solar cells, 2005-05, Vol.87 (1), p.445-455

2005

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Desorption of O 2 from SiO 2 films during irradiation of SiO 2 with MeV/a.m.u. heavy ions

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2004, Vol.219, p.312-316

2004

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Structure of sputtered silicon suboxide single- and multi-layers

Thin solid films, 2002-12, Vol.420, p.382-385

2002

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Stress reduction in a-C:H coatings through the addition of nitrogen to the feed gas

Diamond and related materials, 2004-09, Vol.13 (9), p.1645-1657

2004

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Shaping of Au nanoparticles embedded in various layered structures by swift heavy ion beam irradiation

The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD

Electrochemical Growth of Micrometer-Thick Oxide on SiC in Acidic Fluoride Solution

Deuterium retention and removal in liquid lithium determined by in situ NRA in Magnum-PSI

Deuterium retention in co-deposition with lithium in Magnum-PSI: experimental analysis and comparison with SOLPS-ITER

Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer on multicrystalline silicon solar cells

Influence of the high-temperature “firing” step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells

Swift heavy ion induced modifications of silicon (sub) oxide nitride layer structures

Electronic sputtering of thin SiO2 films by MeV heavy ions

Nano-scale effects of swift heavy ion irradiation in SiOx layers and multilayers

On the argon and oxygen incorporation into SiO x through ion implantation during reactive plasma magnetron sputter deposition

Electronic sputtering of silicon suboxide films by swift heavy ions

On the argon and oxygen incorporation into SiOx through ion implantation during reactive plasma magnetron sputter deposition

On the deposition process of silicon suboxides by a RF magnetron reactive sputtering in Ar–O2 mixtures: theoretical and experimental approach

On-line characterisation of radiofrequency magnetron sputter deposition of SiO x using elastic recoil detection

Experimental characterization of the deposition of silicon suboxide films in a radiofrequency magnetron reactive sputtering system

On the deposition process of silicon suboxides by a RF magnetron reactive sputtering in Ar–O 2 mixtures: theoretical and experimental approach

Argon plasma modelling in a RF magnetron sputtering system

On-line characterisation of radiofrequency magnetron sputter deposition of SiOx using elastic recoil detection

Improving the control of the electroless plating synthesis of Pd/Ag membranes for hydrogen separation using Rutherford backscattering

Desorption of O2 from SiO2 films during irradiation of SiO2 with MeV/a.m.u. heavy ions

Thickness determination of thin (∼20 nm) microcrystalline silicon layers

Desorption of O 2 from SiO 2 films during irradiation of SiO 2 with MeV/a.m.u. heavy ions

Structure of sputtered silicon suboxide single- and multi-layers

Stress reduction in a-C:H coatings through the addition of nitrogen to the feed gas

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